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Title: Scalable submicrometer additive manufacturing

Abstract

High-throughput fabrication techniques for generating arbitrarily complex three-dimensional structures with nanoscale features are desirable across a broad range of applications. Two-photon lithography (TPL)–based submicrometer additive manufacturing is a promising candidate to fill this gap. However, the serial point-by-point writing scheme of TPL is too slow for many applications. Attempts at parallelization either do not have submicrometer resolution or cannot pattern complex structures. We overcome these difficulties by spatially and temporally focusing an ultrafast laser to implement a projection-based layer-by-layer parallelization. This increases the throughput up to three orders of magnitude and expands the geometric design space. We demonstrate this by printing, within single-digit millisecond time scales, nanowires with widths smaller than 175 nanometers over an area one million times larger than the cross-sectional area.

Authors:
ORCiD logo; ORCiD logo; ORCiD logo; ORCiD logo; ; ORCiD logo
Publication Date:
Research Org.:
Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)
Sponsoring Org.:
USDOE National Nuclear Security Administration (NNSA)
OSTI Identifier:
1569311
Alternate Identifier(s):
OSTI ID: 1598950
Report Number(s):
LLNL-JRNL-770497
Journal ID: ISSN 0036-8075; /sci/366/6461/105.atom
Grant/Contract Number:  
LDRD-16-ERD-047; AC52-07NA27344
Resource Type:
Published Article
Journal Name:
Science
Additional Journal Information:
Journal Name: Science Journal Volume: 366 Journal Issue: 6461; Journal ID: ISSN 0036-8075
Publisher:
AAAS
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; Mechanical and civil engineering; Materials science; Nanoscience; Nanotechnology

Citation Formats

Saha, Sourabh K., Wang, Dien, Nguyen, Vu H., Chang, Yina, Oakdale, James S., and Chen, Shih-Chi. Scalable submicrometer additive manufacturing. United States: N. p., 2019. Web. doi:10.1126/science.aax8760.
Saha, Sourabh K., Wang, Dien, Nguyen, Vu H., Chang, Yina, Oakdale, James S., & Chen, Shih-Chi. Scalable submicrometer additive manufacturing. United States. doi:10.1126/science.aax8760.
Saha, Sourabh K., Wang, Dien, Nguyen, Vu H., Chang, Yina, Oakdale, James S., and Chen, Shih-Chi. Thu . "Scalable submicrometer additive manufacturing". United States. doi:10.1126/science.aax8760.
@article{osti_1569311,
title = {Scalable submicrometer additive manufacturing},
author = {Saha, Sourabh K. and Wang, Dien and Nguyen, Vu H. and Chang, Yina and Oakdale, James S. and Chen, Shih-Chi},
abstractNote = {High-throughput fabrication techniques for generating arbitrarily complex three-dimensional structures with nanoscale features are desirable across a broad range of applications. Two-photon lithography (TPL)–based submicrometer additive manufacturing is a promising candidate to fill this gap. However, the serial point-by-point writing scheme of TPL is too slow for many applications. Attempts at parallelization either do not have submicrometer resolution or cannot pattern complex structures. We overcome these difficulties by spatially and temporally focusing an ultrafast laser to implement a projection-based layer-by-layer parallelization. This increases the throughput up to three orders of magnitude and expands the geometric design space. We demonstrate this by printing, within single-digit millisecond time scales, nanowires with widths smaller than 175 nanometers over an area one million times larger than the cross-sectional area.},
doi = {10.1126/science.aax8760},
journal = {Science},
number = 6461,
volume = 366,
place = {United States},
year = {2019},
month = {10}
}

Journal Article:
Free Publicly Available Full Text
Publisher's Version of Record
DOI: 10.1126/science.aax8760

Citation Metrics:
Cited by: 25 works
Citation information provided by
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