Deposition of Colloidal Particles during the Evaporation of Sessile Drops: Dilute Colloidal Dispersions

Sung, Pei-Fang; Wang, Lihui; Harris, Michael T.

doi:10.1155/2019/7954965

Title: Deposition of Colloidal Particles during the Evaporation of Sessile Drops: Dilute Colloidal Dispersions

Journal Article · 03 October 2019 · International Journal of Chemical Engineering

DOI: https://doi.org/10.1155/2019/7954965 · OSTI ID:1569104

Sung, Pei-Fang ^[1];

^[1];

^[1]

Davidson School of Chemical Engineering, Purdue University, West Lafayette, Indiana, USA

The deposition of colloidal silica particles during the evaporation of sessile drops on a smooth substrate has been modeled by the simultaneous solution of the Navier–Stokes equations, the convective-diffusive equation for particles, and the diffusion equation for evaporated vapor in the gas phase. Isothermal conditions were assumed. A mapping was created to show the conditions for various deposition patterns for very dilute suspensions. Based on values of the Peclet (Pe) number and Damkholer numbers (Da and Da ₋₁ ), the effects of adsorption and desorption were discussed according to the map. Simulations were also done for suspensions with a high particle concentration to form a solid phase during the evaporation by using a packing criterion. The simulations predicted the height and width of the ring deposit near the contact line, and the results compared favorably to experimental particle deposition patterns.

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Sponsoring Organization:: USDOE Office of Science (SC), Basic Energy Sciences (BES)

Grant/Contract Number:: FG02-02ER45975; FG02-02ER45976

OSTI ID:: 1569104

Journal Information:: International Journal of Chemical Engineering, Journal Name: International Journal of Chemical Engineering Vol. 2019; ISSN 1687-806X

Publisher:: Hindawi Publishing CorporationCopyright Statement

Country of Publication:: Egypt

Language:: English

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