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Title: Scanning Probe Lithography Patterning of Monolayer Semiconductors and Application in Quantifying Edge Recombination

Authors:
 [1];  [2];  [1];  [1];  [1];  [1];  [1]; ORCiD logo [1]
  1. Electrical Engineering and Computer SciencesUniversity of California at Berkeley Berkeley CA 94720 USA, Materials Sciences DivisionLawrence Berkeley National Laboratory Berkeley CA 94720 USA
  2. Electrical Engineering and Computer SciencesUniversity of California at Berkeley Berkeley CA 94720 USA
Publication Date:
Sponsoring Org.:
USDOE Office of Science (SC), Basic Energy Sciences (BES) (SC-22)
OSTI Identifier:
1566196
Grant/Contract Number:  
DE‐AC02‐05Ch11231
Resource Type:
Publisher's Accepted Manuscript
Journal Name:
Advanced Materials
Additional Journal Information:
Journal Name: Advanced Materials; Journal ID: ISSN 0935-9648
Publisher:
Wiley Blackwell (John Wiley & Sons)
Country of Publication:
Germany
Language:
English

Citation Formats

Zhao, Peida, Wang, Ruixuan, Lien, Der‐Hsien, Zhao, Yingbo, Kim, Hyungjin, Cho, Joy, Ahn, Geun Ho, and Javey, Ali. Scanning Probe Lithography Patterning of Monolayer Semiconductors and Application in Quantifying Edge Recombination. Germany: N. p., 2019. Web. doi:10.1002/adma.201900136.
Zhao, Peida, Wang, Ruixuan, Lien, Der‐Hsien, Zhao, Yingbo, Kim, Hyungjin, Cho, Joy, Ahn, Geun Ho, & Javey, Ali. Scanning Probe Lithography Patterning of Monolayer Semiconductors and Application in Quantifying Edge Recombination. Germany. doi:10.1002/adma.201900136.
Zhao, Peida, Wang, Ruixuan, Lien, Der‐Hsien, Zhao, Yingbo, Kim, Hyungjin, Cho, Joy, Ahn, Geun Ho, and Javey, Ali. Tue . "Scanning Probe Lithography Patterning of Monolayer Semiconductors and Application in Quantifying Edge Recombination". Germany. doi:10.1002/adma.201900136.
@article{osti_1566196,
title = {Scanning Probe Lithography Patterning of Monolayer Semiconductors and Application in Quantifying Edge Recombination},
author = {Zhao, Peida and Wang, Ruixuan and Lien, Der‐Hsien and Zhao, Yingbo and Kim, Hyungjin and Cho, Joy and Ahn, Geun Ho and Javey, Ali},
abstractNote = {},
doi = {10.1002/adma.201900136},
journal = {Advanced Materials},
number = ,
volume = ,
place = {Germany},
year = {2019},
month = {9}
}

Journal Article:
Free Publicly Available Full Text
This content will become publicly available on September 23, 2020
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