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Title: Atomic layer deposition of SnOx onto mesoporous, nanocrsytalline TiO2 and SnO2 thin films

Authors:
ORCiD logo; ; ORCiD logo
Publication Date:
Sponsoring Org.:
USDOE
OSTI Identifier:
1563059
Resource Type:
Publisher's Accepted Manuscript
Journal Name:
Polyhedron
Additional Journal Information:
Journal Name: Polyhedron Journal Volume: 171 Journal Issue: C; Journal ID: ISSN 0277-5387
Publisher:
Elsevier
Country of Publication:
United Kingdom
Language:
English

Citation Formats

Mortelliti, Michael J., Wang, Annie N., and Dempsey, Jillian L. Atomic layer deposition of SnOx onto mesoporous, nanocrsytalline TiO2 and SnO2 thin films. United Kingdom: N. p., 2019. Web. doi:10.1016/j.poly.2019.07.021.
Mortelliti, Michael J., Wang, Annie N., & Dempsey, Jillian L. Atomic layer deposition of SnOx onto mesoporous, nanocrsytalline TiO2 and SnO2 thin films. United Kingdom. doi:10.1016/j.poly.2019.07.021.
Mortelliti, Michael J., Wang, Annie N., and Dempsey, Jillian L. Tue . "Atomic layer deposition of SnOx onto mesoporous, nanocrsytalline TiO2 and SnO2 thin films". United Kingdom. doi:10.1016/j.poly.2019.07.021.
@article{osti_1563059,
title = {Atomic layer deposition of SnOx onto mesoporous, nanocrsytalline TiO2 and SnO2 thin films},
author = {Mortelliti, Michael J. and Wang, Annie N. and Dempsey, Jillian L.},
abstractNote = {},
doi = {10.1016/j.poly.2019.07.021},
journal = {Polyhedron},
number = C,
volume = 171,
place = {United Kingdom},
year = {2019},
month = {10}
}

Journal Article:
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This content will become publicly available on August 16, 2020
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