Atomic layer deposition of SnOx onto mesoporous, nanocrsytalline TiO2 and SnO2 thin films

Mortelliti, Michael J.; Wang, Annie N.; Dempsey, Jillian L.

doi:10.1016/j.poly.2019.07.021

Title: Atomic layer deposition of SnOx onto mesoporous, nanocrsytalline TiO2 and SnO2 thin films

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Authors:

; Wang, Annie N.;

Publication Date:: Tue Oct 01 00:00:00 EDT 2019

Sponsoring Org.:: USDOE

OSTI Identifier:: 1563059

Resource Type:: Publisher's Accepted Manuscript

Journal Name:: Polyhedron

Additional Journal Information:: Journal Name: Polyhedron Journal Volume: 171 Journal Issue: C; Journal ID: ISSN 0277-5387

Publisher:: Elsevier

Country of Publication:: United Kingdom

Language:: English

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                    Mortelliti, Michael J., Wang, Annie N., and Dempsey, Jillian L. Atomic layer deposition of SnOx onto mesoporous, nanocrsytalline TiO2 and SnO2 thin films.  United Kingdom: N. p., 2019. 
Web.  doi:10.1016/j.poly.2019.07.021.

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                    Mortelliti, Michael J., Wang, Annie N., & Dempsey, Jillian L. Atomic layer deposition of SnOx onto mesoporous, nanocrsytalline TiO2 and SnO2 thin films.  United Kingdom.  https://doi.org/10.1016/j.poly.2019.07.021

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                    Mortelliti, Michael J., Wang, Annie N., and Dempsey, Jillian L. Tue .  
"Atomic layer deposition of SnOx onto mesoporous, nanocrsytalline TiO2 and SnO2 thin films".  United Kingdom.  https://doi.org/10.1016/j.poly.2019.07.021.

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@article{osti_1563059,

  title        = {Atomic layer deposition of SnOx onto mesoporous, nanocrsytalline TiO2 and SnO2 thin films},

  author       = {Mortelliti, Michael J. and Wang, Annie N. and Dempsey, Jillian L.},

  abstractNote = {},

  doi          = {10.1016/j.poly.2019.07.021},

  journal      = {Polyhedron},

  number       = C,

  volume       = 171,

  place        = {United Kingdom},

  year         = {Tue Oct 01 00:00:00 EDT 2019},

  month        = {Tue Oct 01 00:00:00 EDT 2019}

}

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https://doi.org/10.1016/j.poly.2019.07.021

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