Ultraviolet/ozone and oxygen plasma treatments for improving the contact of carbon nanotube thin film transistors
- Authors:
- Publication Date:
- Sponsoring Org.:
- USDOE Office of Electricity (OE), Advanced Grid Research & Development. Power Systems Engineering Research
- OSTI Identifier:
- 1562957
- Grant/Contract Number:
- 2016YFA0201902
- Resource Type:
- Publisher's Accepted Manuscript
- Journal Name:
- Science Bulletin
- Additional Journal Information:
- Journal Name: Science Bulletin Journal Volume: 63 Journal Issue: 12; Journal ID: ISSN 2095-9273
- Publisher:
- Elsevier
- Country of Publication:
- China
- Language:
- English
Citation Formats
Huang, Qi, Xia, Jiye, Zhao, Jie, Dong, Guodong, Liu, Fang, Meng, Hu, and Liang, Xuelei. Ultraviolet/ozone and oxygen plasma treatments for improving the contact of carbon nanotube thin film transistors. China: N. p., 2018.
Web. doi:10.1016/j.scib.2018.05.029.
Huang, Qi, Xia, Jiye, Zhao, Jie, Dong, Guodong, Liu, Fang, Meng, Hu, & Liang, Xuelei. Ultraviolet/ozone and oxygen plasma treatments for improving the contact of carbon nanotube thin film transistors. China. https://doi.org/10.1016/j.scib.2018.05.029
Huang, Qi, Xia, Jiye, Zhao, Jie, Dong, Guodong, Liu, Fang, Meng, Hu, and Liang, Xuelei. Fri .
"Ultraviolet/ozone and oxygen plasma treatments for improving the contact of carbon nanotube thin film transistors". China. https://doi.org/10.1016/j.scib.2018.05.029.
@article{osti_1562957,
title = {Ultraviolet/ozone and oxygen plasma treatments for improving the contact of carbon nanotube thin film transistors},
author = {Huang, Qi and Xia, Jiye and Zhao, Jie and Dong, Guodong and Liu, Fang and Meng, Hu and Liang, Xuelei},
abstractNote = {},
doi = {10.1016/j.scib.2018.05.029},
journal = {Science Bulletin},
number = 12,
volume = 63,
place = {China},
year = {2018},
month = {6}
}
Free Publicly Available Full Text
Publisher's Version of Record
https://doi.org/10.1016/j.scib.2018.05.029
https://doi.org/10.1016/j.scib.2018.05.029
Other availability
Cited by: 5 works
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