Deep reactive ion etching of commercial PMMA in O 2 /CHF 3 , and O 2 /Ar-based discharges
|
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|
March 2004 |
Directed self-assembly of block copolymers for nanocircuitry fabrication
|
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January 2015 |
Infiltrated Zinc Oxide in Poly(methyl methacrylate): An Atomic Cycle Growth Study
|
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|
December 2016 |
Sub-10-nm high aspect ratio patterning of ZnO in a 500 μm main field
- Saifullah, M. S. M.; Subramanian, K. R. V.; Anderson, D.
-
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, Vol. 24, Issue 3
https://doi.org/10.1116/1.2192545
|
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|
January 2006 |
Boehmite filled hybrid sol–gel system as directly writable hard etching mask for pattern transfer
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August 2011 |
Platinum and palladium oxalates: positive-tone extreme ultraviolet resists
|
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October 2015 |
High aspect ratio etched sub-micron structures in silicon obtained by cryogenic plasma deep-etching through perforated polymer thin films
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November 2018 |
Chemical and Structural Investigation of High-Resolution Patterning with HafSOx
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February 2014 |
High-index nanocomposite photoresist for 193-nm lithography
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conference
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March 2009 |
Mechanistic understanding of tungsten oxide in-plane nanostructure growth via sequential infiltration synthesis
|
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January 2018 |
Organosilicate polymer e-beam resists with high resolution, sensitivity and stability: Organosilicate polymer e-beam resists
|
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October 2013 |
Enhanced Lithographic Imaging Layer Meets Semiconductor Manufacturing Specification a Decade Early
|
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April 2012 |
High sensitive negative silylation process for 193nm lithography
|
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|
June 2000 |
Three-dimensional electroactive ZnO nanomesh directly derived from hierarchically self-assembled block copolymer thin films
|
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|
January 2019 |
Extreme Carrier Depletion and Superlinear Photoconductivity in Ultrathin Parallel-Aligned ZnO Nanowire Array Photodetectors Fabricated by Infiltration Synthesis
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November 2017 |
Low temperature development of PMMA for sub-10-nm electron beam lithography
|
conference
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January 2003 |
Novel polymeric anionic photoacid generators (PAGs) and corresponding polymers for 193 nm lithography
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journal
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January 2006 |
Imaging results for resist films exposed to EUV radiation
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July 2002 |
Photo-induced Fragmentation of a Tin-oxo Cage Compound
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January 2018 |
Direct patterning of high density sub-15 nm gold dot arrays using ultrahigh contrast electron beam lithography process on positive tone resist
|
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January 2013 |
Ultrahigh Elastic Strain Energy Storage in Metal-Oxide-Infiltrated Patterned Hybrid Polymer Nanocomposites
|
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November 2017 |
Effect of Nanostructured Domains in Self-Assembled Block Copolymer Films on Sequential Infiltration Synthesis
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November 2017 |
Ultrathin photoresists for 193-nm lithography
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conference
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June 2003 |
Antimony photoresists for EUV lithography: mechanistic studies
|
conference
|
March 2017 |
A Top Surface Imaging Method Using Area Selective ALD on Chemically Amplified Polymer Photoresist Films
|
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|
January 2006 |
Approaches to deep ultraviolet photolithography utilizing acid hardened resin photoresist systems
- Thackeray, James W.; Orsula, George W.; Bohland, John F.
-
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, Vol. 7, Issue 6, Article No. 1620
https://doi.org/10.1116/1.584502
|
journal
|
November 1989 |
Chemical Semi-Amplified positive E-beam Resist (CSAR 62) for highest resolution
|
conference
|
October 2013 |
Extreme ultraviolet resist materials for sub-7 nm patterning
|
journal
|
January 2017 |
Sub-10 nm electron and helium ion beam lithography using a recently developed alumina resist
|
journal
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June 2018 |
Negative hybrid sol–gel resist as hard etching mask for pattern transfer with dry etching
|
journal
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October 2012 |
Optimized surface silylation of chemically amplified epoxidized photoresists for micromachining applications
|
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|
April 2010 |
Chemical Modification Mechanisms in Hybrid Hafnium Oxo-methacrylate Nanocluster Photoresists for Extreme Ultraviolet Patterning
|
journal
|
August 2018 |
Surface imaging techniques
|
journal
|
March 1991 |
Hydrogen silsesquioxane (HSQ): a perfect negative tone resist for developing nanostructure patterns on a silicon platform
|
conference
|
February 2011 |
Metal-carbonyl organometallic polymers, PFpP, as resists for high-resolution positive and negative electron beam lithography
|
journal
|
January 2015 |
Sub-10 nm High-Aspect-Ratio Patterning of ZnO Using an Electron Beam
|
journal
|
July 2005 |
Systematic studies of functionalized calixarenes as negative tone electron beam
|
journal
|
March 1998 |
Review of Recent Advances in Applications of Vapor-Phase Material Infiltration Based on Atomic Layer Deposition
|
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|
September 2018 |
Negative resist image by dry etching: a novel surface imaging resist scheme
|
journal
|
June 2003 |
High resolution spin-on electron beam lithography resist with exceptional dry etching resistance
|
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|
November 2015 |
Directed self-assembly of block copolymers for use in bit patterned media fabrication
|
journal
|
November 2013 |
Effect of chelating agents on high resolution electron beam nanolithography of spin-coatable Al/sub 2/O/sub 3/ gel films
- Saifullah, M. S. M.; Namatsu, H.; Yamaguchi, T.
-
Digest of Papers. Microprocesses and Nanotechnology '99. 1999 International Microprocesses and Nanotechnology Conference
https://doi.org/10.1109/IMNC.1999.797526
|
conference
|
January 1999 |
Water soluble and metal-containing electron beam resist poly(sodium 4-styrenesulfonate)
|
journal
|
November 2014 |
Novel Hybrid Organic-Inorganic Spin-on Resist for Electron- or Photon-Based Nanolithography with Outstanding Resistance to Dry Etching
|
journal
|
August 2013 |
Application of Plasmask R resist and the DESIRE process to lithography at 248 nm
|
journal
|
November 1990 |
Silylated acid hardened resist process: A deep ultraviolet surface imaging technique
|
journal
|
November 1990 |
Vapor phase infiltration (VPI) for transforming polymers into organic–inorganic hybrid materials: a critical review of current progress and future challenges
|
journal
|
January 2017 |
Combination photo and electron beam lithography with polymethyl methacrylate (PMMA) resist
|
journal
|
October 2017 |
Sub-10 nm Electron Beam Nanolithography Using Spin-Coatable TiO 2 Resists
|
journal
|
November 2003 |
Aberration-Corrected Electron Beam Lithography at the One Nanometer Length Scale
|
journal
|
April 2017 |
Spin-coatable HfO2 resist for optical and electron beam lithographies
- Saifullah, M. S. M.; Khan, M. Z. R.; Hasko, David G.
-
Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena, Vol. 28, Issue 1
https://doi.org/10.1116/1.3273536
|
journal
|
January 2010 |
New Positive EB Resist with Strong Resistance to Plasma Damage
|
journal
|
January 1992 |
Studying the Mechanism of Hybrid Nanoparticle Photoresists: Effect of Particle Size on Photopatterning
|
journal
|
July 2015 |
Electron beam lithography process for T- and Γ-shaped gate fabrication using chemically amplified DUV resists and PMMA
- Chen, Y.; Macintyre, D.; Thoms, S.
-
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, Vol. 17, Issue 6
https://doi.org/10.1116/1.591119
|
journal
|
January 1999 |
Study of nanometer resolution resist slope for the UVIII chemically amplified resist
|
journal
|
May 1999 |
Lithography and Other Patterning Techniques for Future Electronics
|
journal
|
February 2008 |
Direct e-beam writing of dense and high aspect ratio nanostructures in thick layers of PMMA for electroplating
|
journal
|
July 2010 |
10nm lines and spaces written in HSQ, using electron beam lithography
|
journal
|
May 2007 |
Nanoparticle Photoresists: Ligand Exchange as a New, Sensitive EUV Patterning Mechanism
|
journal
|
January 2013 |
Reactivity of metal-oxalate EUV resists as a function of the central metal
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conference
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March 2017 |
New hybrid organic–inorganic sol–gel positive resist
|
journal
|
May 2010 |
New Insight into the Mechanism of Sequential Infiltration Synthesis from Infrared Spectroscopy
|
journal
|
October 2014 |
Improved etch resistance of ZEP 520A in reactive ion etching through heat and ultraviolet light treatment
- Czaplewski, David A.; Tallant, David R.; Patrizi, Gary A.
-
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, Vol. 27, Issue 2
https://doi.org/10.1116/1.3086721
|
journal
|
January 2009 |
Metal methacrylates as sensitizers for poly methyl methacrylate electron resists
|
journal
|
November 1979 |
PRIME process for deep UV and E-beam lithography
|
journal
|
April 1990 |
Chemically Enhancing Block Copolymers for Block-Selective Synthesis of Self-Assembled Metal Oxide Nanostructures
|
journal
|
December 2012 |
High aspect ratio silicon etch: A review
|
journal
|
September 2010 |
Alternatives to chemical amplification for 193nm lithography
|
conference
|
March 2010 |
Fabrication of Sub-10 nm Metallic Lines of Low Line-Width Roughness by Hydrogen Reduction of Patterned Metal-Organic Materials
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journal
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June 2010 |
Electron Beam Nanolithography of -Ketoester Modified Aluminium Tri-Sec-Butoxide
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journal
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January 2004 |
Elemental depth profiles and plasma etching rates of positive-tone electron beam resists after sequential infiltration synthesis of alumina
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journal
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May 2018 |
Direct writing of ZrO 2 on a sub-10 nm scale using an electron beam
|
journal
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November 2003 |
PRIME process with Shipley SPR505A resist—simulations and experiments
|
journal
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July 2002 |
Effects of Residual Solvent Molecules Facilitating the Infiltration Synthesis of ZnO in a Nonreactive Polymer
|
journal
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May 2017 |
Solubility studies of inorganic–organic hybrid nanoparticle photoresists with different surface functional groups
|
journal
|
January 2016 |
Resists for sub-20-nm electron beam lithography with a focus on HSQ: state of the art
|
journal
|
July 2009 |
Novel Hybrid Organic-Inorganic Spin-on Resist for Electron- or Photon-Based Nanolithography with Outstanding Resistance to Dry Etching
|
journal
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February 2014 |