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Title: Structurally Stable Manganese Alkoxide Films Grown by Hybrid Molecular Layer Deposition for Electrochemical Applications

Abstract

Hybrid molecular layer deposition (MLD) has significant potential for the creation of ultrathin electrochemically active materials, due to its ability to combine organic and inorganic species to modulate film properties. However, only a limited number of hybrid MLD processes are demonstrated with electrochemically relevant elements, such as manganese. In this work, a “manganicone” manganese hybrid MLD chemistry is developed using the precursors bis(ethylcyclopentadienyl)manganese and ethylene glycol. The resulting manganese alkoxide coordination networks are shown to have many interesting properties, including the ability to seamlessly fill high aspect ratio vias and the chemical conversion into manganese carboxylate in air over several hours at room temperature. Linear, self-saturating growth is reported. Importantly, hybrid manganicone films annealed to 480 °C in air demonstrate a greater stability to restructuring during electrochemical testing than their inorganic counterparts grown by atomic layer deposition, without reducing the activity of the reactive sites on the manganese surface. Therefore, hybrid manganese films grown by MLD have significant promise for use as catalysts for the oxygen evolution reaction and as electrodes in thin film batteries.

Authors:
ORCiD logo [1];  [1]; ORCiD logo [1];  [1];  [1];  [1];  [2];  [2]; ORCiD logo [1]
  1. Stanford Univ., CA (United States)
  2. Applied Materials, Sunnyvale, CA (United States)
Publication Date:
Research Org.:
SLAC National Accelerator Lab., Menlo Park, CA (United States)
Sponsoring Org.:
USDOE Office of Science (SC), Basic Energy Sciences (BES)
OSTI Identifier:
1560677
Alternate Identifier(s):
OSTI ID: 1557372
Grant/Contract Number:  
AC02‐76SF00515; CHE‐1607339; CHE‐1213879; ECCS‐1542152
Resource Type:
Accepted Manuscript
Journal Name:
Advanced Functional Materials
Additional Journal Information:
Journal Volume: 29; Journal Issue: 43; Journal ID: ISSN 1616-301X
Publisher:
Wiley
Country of Publication:
United States
Language:
English
Subject:
37 INORGANIC, ORGANIC, PHYSICAL, AND ANALYTICAL CHEMISTRY; 36 MATERIALS SCIENCE; catalysis; functional coatings; hybrid materials; surface modification; thin films

Citation Formats

Bergsman, David S., Baker, Jon G., Closser, Richard G., MacIsaac, Callisto, Lillethorup, Mie, Strickler, Alaina L., Azarnouche, Laurent, Godet, Ludovic, and Bent, Stacey F. Structurally Stable Manganese Alkoxide Films Grown by Hybrid Molecular Layer Deposition for Electrochemical Applications. United States: N. p., 2019. Web. doi:10.1002/adfm.201904129.
Bergsman, David S., Baker, Jon G., Closser, Richard G., MacIsaac, Callisto, Lillethorup, Mie, Strickler, Alaina L., Azarnouche, Laurent, Godet, Ludovic, & Bent, Stacey F. Structurally Stable Manganese Alkoxide Films Grown by Hybrid Molecular Layer Deposition for Electrochemical Applications. United States. https://doi.org/10.1002/adfm.201904129
Bergsman, David S., Baker, Jon G., Closser, Richard G., MacIsaac, Callisto, Lillethorup, Mie, Strickler, Alaina L., Azarnouche, Laurent, Godet, Ludovic, and Bent, Stacey F. Thu . "Structurally Stable Manganese Alkoxide Films Grown by Hybrid Molecular Layer Deposition for Electrochemical Applications". United States. https://doi.org/10.1002/adfm.201904129. https://www.osti.gov/servlets/purl/1560677.
@article{osti_1560677,
title = {Structurally Stable Manganese Alkoxide Films Grown by Hybrid Molecular Layer Deposition for Electrochemical Applications},
author = {Bergsman, David S. and Baker, Jon G. and Closser, Richard G. and MacIsaac, Callisto and Lillethorup, Mie and Strickler, Alaina L. and Azarnouche, Laurent and Godet, Ludovic and Bent, Stacey F.},
abstractNote = {Hybrid molecular layer deposition (MLD) has significant potential for the creation of ultrathin electrochemically active materials, due to its ability to combine organic and inorganic species to modulate film properties. However, only a limited number of hybrid MLD processes are demonstrated with electrochemically relevant elements, such as manganese. In this work, a “manganicone” manganese hybrid MLD chemistry is developed using the precursors bis(ethylcyclopentadienyl)manganese and ethylene glycol. The resulting manganese alkoxide coordination networks are shown to have many interesting properties, including the ability to seamlessly fill high aspect ratio vias and the chemical conversion into manganese carboxylate in air over several hours at room temperature. Linear, self-saturating growth is reported. Importantly, hybrid manganicone films annealed to 480 °C in air demonstrate a greater stability to restructuring during electrochemical testing than their inorganic counterparts grown by atomic layer deposition, without reducing the activity of the reactive sites on the manganese surface. Therefore, hybrid manganese films grown by MLD have significant promise for use as catalysts for the oxygen evolution reaction and as electrodes in thin film batteries.},
doi = {10.1002/adfm.201904129},
journal = {Advanced Functional Materials},
number = 43,
volume = 29,
place = {United States},
year = {2019},
month = {8}
}

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