skip to main content
DOE PAGES title logo U.S. Department of Energy
Office of Scientific and Technical Information

Title: Investigating the factors that influence resistance rise of PIM-1 membranes in nonaqueous electrolytes

Authors:
ORCiD logo; ; ; ORCiD logo; ORCiD logo;
Publication Date:
Sponsoring Org.:
USDOE
OSTI Identifier:
1558175
Resource Type:
Published Article
Journal Name:
Electrochemistry Communications
Additional Journal Information:
Journal Name: Electrochemistry Communications Journal Volume: 107 Journal Issue: C; Journal ID: ISSN 1388-2481
Publisher:
Elsevier
Country of Publication:
Netherlands
Language:
English

Citation Formats

Gigli, Matteo, Kowalski, Jeffrey A., Neyhouse, Bertrand J., D'Epifanio, Alessandra, Brushett, Fikile R., and Licoccia, Silvia. Investigating the factors that influence resistance rise of PIM-1 membranes in nonaqueous electrolytes. Netherlands: N. p., 2019. Web. doi:10.1016/j.elecom.2019.106530.
Gigli, Matteo, Kowalski, Jeffrey A., Neyhouse, Bertrand J., D'Epifanio, Alessandra, Brushett, Fikile R., & Licoccia, Silvia. Investigating the factors that influence resistance rise of PIM-1 membranes in nonaqueous electrolytes. Netherlands. doi:10.1016/j.elecom.2019.106530.
Gigli, Matteo, Kowalski, Jeffrey A., Neyhouse, Bertrand J., D'Epifanio, Alessandra, Brushett, Fikile R., and Licoccia, Silvia. Tue . "Investigating the factors that influence resistance rise of PIM-1 membranes in nonaqueous electrolytes". Netherlands. doi:10.1016/j.elecom.2019.106530.
@article{osti_1558175,
title = {Investigating the factors that influence resistance rise of PIM-1 membranes in nonaqueous electrolytes},
author = {Gigli, Matteo and Kowalski, Jeffrey A. and Neyhouse, Bertrand J. and D'Epifanio, Alessandra and Brushett, Fikile R. and Licoccia, Silvia},
abstractNote = {},
doi = {10.1016/j.elecom.2019.106530},
journal = {Electrochemistry Communications},
number = C,
volume = 107,
place = {Netherlands},
year = {2019},
month = {10}
}

Journal Article:
Free Publicly Available Full Text
Publisher's Version of Record
DOI: 10.1016/j.elecom.2019.106530

Save / Share: