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Title: Structurally Stable Manganese Alkoxide Films Grown by Hybrid Molecular Layer Deposition for Electrochemical Applications

Authors:
ORCiD logo [1];  [1]; ORCiD logo [2];  [2];  [1];  [1];  [3];  [3]; ORCiD logo [1]
  1. Department of Chemical EngineeringStanford University 443 Via Ortega Stanford CA 94305 USA
  2. Department of ChemistryStanford University 443 Via Ortega Stanford CA 94305 USA
  3. Applied Materials 974 East Avenue, M/S 81280 Sunnyvale CA 94085 USA
Publication Date:
Sponsoring Org.:
USDOE
OSTI Identifier:
1557372
Grant/Contract Number:  
DE‐AC02‐76SF00515
Resource Type:
Publisher's Accepted Manuscript
Journal Name:
Advanced Functional Materials
Additional Journal Information:
Journal Name: Advanced Functional Materials; Journal ID: ISSN 1616-301X
Publisher:
Wiley Blackwell (John Wiley & Sons)
Country of Publication:
Germany
Language:
English

Citation Formats

Bergsman, David S., Baker, Jon G., Closser, Richard G., MacIsaac, Callisto, Lillethorup, Mie, Strickler, Alaina L., Azarnouche, Laurent, Godet, Ludovic, and Bent, Stacey F. Structurally Stable Manganese Alkoxide Films Grown by Hybrid Molecular Layer Deposition for Electrochemical Applications. Germany: N. p., 2019. Web. doi:10.1002/adfm.201904129.
Bergsman, David S., Baker, Jon G., Closser, Richard G., MacIsaac, Callisto, Lillethorup, Mie, Strickler, Alaina L., Azarnouche, Laurent, Godet, Ludovic, & Bent, Stacey F. Structurally Stable Manganese Alkoxide Films Grown by Hybrid Molecular Layer Deposition for Electrochemical Applications. Germany. doi:10.1002/adfm.201904129.
Bergsman, David S., Baker, Jon G., Closser, Richard G., MacIsaac, Callisto, Lillethorup, Mie, Strickler, Alaina L., Azarnouche, Laurent, Godet, Ludovic, and Bent, Stacey F. Thu . "Structurally Stable Manganese Alkoxide Films Grown by Hybrid Molecular Layer Deposition for Electrochemical Applications". Germany. doi:10.1002/adfm.201904129.
@article{osti_1557372,
title = {Structurally Stable Manganese Alkoxide Films Grown by Hybrid Molecular Layer Deposition for Electrochemical Applications},
author = {Bergsman, David S. and Baker, Jon G. and Closser, Richard G. and MacIsaac, Callisto and Lillethorup, Mie and Strickler, Alaina L. and Azarnouche, Laurent and Godet, Ludovic and Bent, Stacey F.},
abstractNote = {},
doi = {10.1002/adfm.201904129},
journal = {Advanced Functional Materials},
number = ,
volume = ,
place = {Germany},
year = {2019},
month = {8}
}

Journal Article:
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This content will become publicly available on August 14, 2020
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Works referenced in this record:

A Bifunctional Nonprecious Metal Catalyst for Oxygen Reduction and Water Oxidation
journal, October 2010

  • Gorlin, Yelena; Jaramillo, Thomas F.
  • Journal of the American Chemical Society, Vol. 132, Issue 39, p. 13612-13614
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Crystallinity of inorganic films grown by atomic layer deposition: Overview and general trends
journal, January 2013

  • Miikkulainen, Ville; Leskelä, Markku; Ritala, Mikko
  • Journal of Applied Physics, Vol. 113, Issue 2, Article No. 021301
  • DOI: 10.1063/1.4757907