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Title: Thick Er-doped silica films sintered using CO2 laser for scintillation applications

Authors:
; ; ; ; ; ; ; ; ; ; ;
Publication Date:
Sponsoring Org.:
USDOE
OSTI Identifier:
1550458
Grant/Contract Number:  
FE00012272
Resource Type:
Publisher's Accepted Manuscript
Journal Name:
Optical Materials
Additional Journal Information:
Journal Name: Optical Materials Journal Volume: 68 Journal Issue: C; Journal ID: ISSN 0925-3467
Publisher:
Elsevier
Country of Publication:
Netherlands
Language:
English

Citation Formats

Lei, Jincheng, Trofimov, Artem A., Chen, Jie, Chen, Zhaoxi, Hong, Yuzhe, Yuan, Lei, Zhu, Wenge, Zhang, Qi, Jacobsohn, Luiz G., Peng, Fei, Bordia, Rajendra K., and Xiao, Hai. Thick Er-doped silica films sintered using CO2 laser for scintillation applications. Netherlands: N. p., 2017. Web. doi:10.1016/j.optmat.2017.03.035.
Lei, Jincheng, Trofimov, Artem A., Chen, Jie, Chen, Zhaoxi, Hong, Yuzhe, Yuan, Lei, Zhu, Wenge, Zhang, Qi, Jacobsohn, Luiz G., Peng, Fei, Bordia, Rajendra K., & Xiao, Hai. Thick Er-doped silica films sintered using CO2 laser for scintillation applications. Netherlands. doi:10.1016/j.optmat.2017.03.035.
Lei, Jincheng, Trofimov, Artem A., Chen, Jie, Chen, Zhaoxi, Hong, Yuzhe, Yuan, Lei, Zhu, Wenge, Zhang, Qi, Jacobsohn, Luiz G., Peng, Fei, Bordia, Rajendra K., and Xiao, Hai. Thu . "Thick Er-doped silica films sintered using CO2 laser for scintillation applications". Netherlands. doi:10.1016/j.optmat.2017.03.035.
@article{osti_1550458,
title = {Thick Er-doped silica films sintered using CO2 laser for scintillation applications},
author = {Lei, Jincheng and Trofimov, Artem A. and Chen, Jie and Chen, Zhaoxi and Hong, Yuzhe and Yuan, Lei and Zhu, Wenge and Zhang, Qi and Jacobsohn, Luiz G. and Peng, Fei and Bordia, Rajendra K. and Xiao, Hai},
abstractNote = {},
doi = {10.1016/j.optmat.2017.03.035},
journal = {Optical Materials},
number = C,
volume = 68,
place = {Netherlands},
year = {2017},
month = {6}
}

Journal Article:
Free Publicly Available Full Text
Publisher's Version of Record
DOI: 10.1016/j.optmat.2017.03.035

Citation Metrics:
Cited by: 1 work
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