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Title: Viewpoint: Nanoscale chemistry and crystallography are both the obstacle and pathway to advanced radiation-tolerant materials

Authors:
; ;
Publication Date:
Sponsoring Org.:
USDOE
OSTI Identifier:
1550198
Grant/Contract Number:  
AC07-051D14517
Resource Type:
Publisher's Accepted Manuscript
Journal Name:
Scripta Materialia
Additional Journal Information:
Journal Name: Scripta Materialia Journal Volume: 143 Journal Issue: C; Journal ID: ISSN 1359-6462
Publisher:
Elsevier
Country of Publication:
United States
Language:
English

Citation Formats

Parish, Chad M., Wang, Kun, and Edmondson, Philip D. Viewpoint: Nanoscale chemistry and crystallography are both the obstacle and pathway to advanced radiation-tolerant materials. United States: N. p., 2018. Web. doi:10.1016/j.scriptamat.2017.05.014.
Parish, Chad M., Wang, Kun, & Edmondson, Philip D. Viewpoint: Nanoscale chemistry and crystallography are both the obstacle and pathway to advanced radiation-tolerant materials. United States. doi:10.1016/j.scriptamat.2017.05.014.
Parish, Chad M., Wang, Kun, and Edmondson, Philip D. Mon . "Viewpoint: Nanoscale chemistry and crystallography are both the obstacle and pathway to advanced radiation-tolerant materials". United States. doi:10.1016/j.scriptamat.2017.05.014.
@article{osti_1550198,
title = {Viewpoint: Nanoscale chemistry and crystallography are both the obstacle and pathway to advanced radiation-tolerant materials},
author = {Parish, Chad M. and Wang, Kun and Edmondson, Philip D.},
abstractNote = {},
doi = {10.1016/j.scriptamat.2017.05.014},
journal = {Scripta Materialia},
number = C,
volume = 143,
place = {United States},
year = {2018},
month = {1}
}

Journal Article:
Free Publicly Available Full Text
Publisher's Version of Record
DOI: 10.1016/j.scriptamat.2017.05.014

Citation Metrics:
Cited by: 4 works
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