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Title: Vapor chambers with hydrophobic and biphilic evaporators in moderate to high heat flux applications

Authors:
; ORCiD logo;
Publication Date:
Sponsoring Org.:
USDOE
OSTI Identifier:
1549076
Grant/Contract Number:  
SC0011317
Resource Type:
Publisher's Accepted Manuscript
Journal Name:
Applied Thermal Engineering
Additional Journal Information:
Journal Name: Applied Thermal Engineering Journal Volume: 130 Journal Issue: C; Journal ID: ISSN 1359-4311
Publisher:
Elsevier
Country of Publication:
United Kingdom
Language:
English

Citation Formats

Shaeri, Mohammad Reza, Attinger, Daniel, and Bonner, III, Richard W. Vapor chambers with hydrophobic and biphilic evaporators in moderate to high heat flux applications. United Kingdom: N. p., 2018. Web. doi:10.1016/j.applthermaleng.2017.11.051.
Shaeri, Mohammad Reza, Attinger, Daniel, & Bonner, III, Richard W. Vapor chambers with hydrophobic and biphilic evaporators in moderate to high heat flux applications. United Kingdom. doi:10.1016/j.applthermaleng.2017.11.051.
Shaeri, Mohammad Reza, Attinger, Daniel, and Bonner, III, Richard W. Thu . "Vapor chambers with hydrophobic and biphilic evaporators in moderate to high heat flux applications". United Kingdom. doi:10.1016/j.applthermaleng.2017.11.051.
@article{osti_1549076,
title = {Vapor chambers with hydrophobic and biphilic evaporators in moderate to high heat flux applications},
author = {Shaeri, Mohammad Reza and Attinger, Daniel and Bonner, III, Richard W.},
abstractNote = {},
doi = {10.1016/j.applthermaleng.2017.11.051},
journal = {Applied Thermal Engineering},
number = C,
volume = 130,
place = {United Kingdom},
year = {2018},
month = {2}
}

Journal Article:
Free Publicly Available Full Text
Publisher's Version of Record
DOI: 10.1016/j.applthermaleng.2017.11.051

Citation Metrics:
Cited by: 3 works
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