Vapor chambers with hydrophobic and biphilic evaporators in moderate to high heat flux applications
- Publication Date:
- Sponsoring Org.:
- USDOE
- OSTI Identifier:
- 1549076
- Grant/Contract Number:
- 1235867; SC0011317
- Resource Type:
- Publisher's Accepted Manuscript
- Journal Name:
- Applied Thermal Engineering
- Additional Journal Information:
- Journal Name: Applied Thermal Engineering Journal Volume: 130 Journal Issue: C; Journal ID: ISSN 1359-4311
- Publisher:
- Elsevier
- Country of Publication:
- United Kingdom
- Language:
- English
Citation Formats
Shaeri, Mohammad Reza, Attinger, Daniel, and Bonner, III, Richard W. Vapor chambers with hydrophobic and biphilic evaporators in moderate to high heat flux applications. United Kingdom: N. p., 2018.
Web. doi:10.1016/j.applthermaleng.2017.11.051.
Shaeri, Mohammad Reza, Attinger, Daniel, & Bonner, III, Richard W. Vapor chambers with hydrophobic and biphilic evaporators in moderate to high heat flux applications. United Kingdom. https://doi.org/10.1016/j.applthermaleng.2017.11.051
Shaeri, Mohammad Reza, Attinger, Daniel, and Bonner, III, Richard W. Thu .
"Vapor chambers with hydrophobic and biphilic evaporators in moderate to high heat flux applications". United Kingdom. https://doi.org/10.1016/j.applthermaleng.2017.11.051.
@article{osti_1549076,
title = {Vapor chambers with hydrophobic and biphilic evaporators in moderate to high heat flux applications},
author = {Shaeri, Mohammad Reza and Attinger, Daniel and Bonner, III, Richard W.},
abstractNote = {},
doi = {10.1016/j.applthermaleng.2017.11.051},
journal = {Applied Thermal Engineering},
number = C,
volume = 130,
place = {United Kingdom},
year = {Thu Feb 01 00:00:00 EST 2018},
month = {Thu Feb 01 00:00:00 EST 2018}
}
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https://doi.org/10.1016/j.applthermaleng.2017.11.051
https://doi.org/10.1016/j.applthermaleng.2017.11.051
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