Patterning Si at the 1 nm Length Scale with Aberration-Corrected Electron-Beam Lithography: Tuning of Plasmonic Properties by Design

Manfrinato, Vitor R.; Camino, Fernando E.; Stein, Aaron; Zhang, Lihua; Lu, Ming; Stach, Eric A.; Black, Charles T.

doi:10.1002/adfm.201903429

Title: Patterning Si at the 1 nm Length Scale with Aberration-Corrected Electron-Beam Lithography: Tuning of Plasmonic Properties by Design

Journal Article · 08 July 2019 · Advanced Functional Materials

DOI: https://doi.org/10.1002/adfm.201903429 · OSTI ID:1546045

Manfrinato, Vitor R. ^[1];

^[1]; Stein, Aaron ^[1]; Zhang, Lihua ^[1]; Lu, Ming ^[1]; Stach, Eric A. ^[1]; Black, Charles T. ^[1]

Brookhaven National Lab. (BNL), Upton, NY (United States)

Patterning of materials at single nanometer resolution allows engineering of quantum confinement effects, as these effects are significant at these length scales, and yields direct control over electro-optical properties. Silicon is by far the most important material in electronics, and the ability to fabricate Si-based devices of the smallest dimensions for novel device engineering is highly desirable. Here, the work presented here uses aberration-corrected electron-beam lithography combined with dry reactive ion etching to achieve both: patterning of 1-nm features and surface and volume plasmon engineering in Si. The nanofabrication technique employed here produces nanowires with a line edge roughness (LER) of 1 nm (3σ). In addition, this work demonstrates tuning of the Si volume plasmon energy by 1.2 eV from the bulk value, which is one order of magnitude higher than previous attempts of volume plasmon engineering using lithographic methods.

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Research Organization:: Brookhaven National Laboratory (BNL), Upton, NY (United States)

Sponsoring Organization:: USDOE; USDOE Office of Science (SC), Basic Energy Sciences (BES) (SC-22)

Grant/Contract Number:: SC0012704

OSTI ID:: 1546045

Report Number(s):: BNL--211915-2019-JAAM

Journal Information:: Advanced Functional Materials, Journal Name: Advanced Functional Materials Journal Issue: 52 Vol. 29; ISSN 1616-301X

Publisher:: WileyCopyright Statement

Country of Publication:: United States

Language:: English

References (41)

Large-Area Metal Gaps and Their Optical Applications Bahk, Young-Mi; Kim, Dai-Sik; Park, Hyeong-Ryeol Advanced Optical Materials, Vol. 7, Issue 1 https://doi.org/10.1002/adom.201800426	journal	August 2018
Mechanistic Studies of Plasmon Chemistry on Metal Catalysts Kazuma, Emiko; Kim, Yousoo Angewandte Chemie, Vol. 131, Issue 15 https://doi.org/10.1002/ange.201811234	journal	April 2019
Mechanistic Studies of Plasmon Chemistry on Metal Catalysts Kazuma, Emiko; Kim, Yousoo Angewandte Chemie International Edition, Vol. 58, Issue 15 https://doi.org/10.1002/anie.201811234	journal	February 2019
From active plasmonic devices to plasmonic molecular electronics Lacroix, Jean‐Christophe; van Nguyen, Quynh; Ai, Yong Polymer International, Vol. 68, Issue 4 https://doi.org/10.1002/pi.5756	journal	October 2018
Electron Energy-Loss Spectroscopy in the Electron Microscope Egerton, R. F. https://doi.org/10.1007/978-1-4419-9583-4	book	January 2011
Electron Energy-Loss Spectroscopy in the Electron Microscope Egerton, Ray F. Springer New York, NY https://doi.org/10.1007/978-1-4615-6887-2	book	January 1995
Line shape of the volume plasmons of silicon and germanium Hinz, H. -J.; Raether, H. Thin Solid Films, Vol. 58, Issue 2 https://doi.org/10.1016/0040-6090(79)90249-9	journal	April 1979
Bulk and surface plasmons in solids Quinn, J. J. Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, Vol. 96, Issue 3-4 https://doi.org/10.1016/0168-583X(95)00246-4	journal	May 1995
Probing Nanoparticle Plasmons with Electron Energy Loss Spectroscopy Wu, Yueying; Li, Guoliang; Camden, Jon P. Chemical Reviews, Vol. 118, Issue 6 https://doi.org/10.1021/acs.chemrev.7b00354	journal	December 2017
High-Energy Surface and Volume Plasmons in Nanopatterned Sub-10 nm Aluminum Nanostructures Hobbs, Richard G.; Manfrinato, Vitor R.; Yang, Yujia Nano Letters, Vol. 16, Issue 7 https://doi.org/10.1021/acs.nanolett.6b01012	journal	June 2016
Aberration-Corrected Electron Beam Lithography at the One Nanometer Length Scale Manfrinato, Vitor R.; Stein, Aaron; Zhang, Lihua Nano Letters, Vol. 17, Issue 8 https://doi.org/10.1021/acs.nanolett.7b00514	journal	April 2017
Low-Magnetic-Field Regime of a Gate-Defined Constriction in High-Mobility Graphene Veyrat, Louis; Jordan, Anna; Zimmermann, Katrin Nano Letters, Vol. 19, Issue 2 https://doi.org/10.1021/acs.nanolett.8b02584	journal	January 2019
Atom-by-Atom Construction of a Cyclic Artificial Molecule in Silicon Wyrick, Jonathan; Wang, Xiqiao; Namboodiri, Pradeep Nano Letters, Vol. 18, Issue 12 https://doi.org/10.1021/acs.nanolett.8b02919	journal	November 2018
Approaching the Resolution Limit of Nanometer-Scale Electron Beam-Induced Deposition van Dorp, Willem F.; van Someren, Bob; Hagen, Cornelis W. Nano Letters, Vol. 5, Issue 7 https://doi.org/10.1021/nl050522i	journal	July 2005
Resolution Limits of Electron-Beam Lithography toward the Atomic Scale Manfrinato, Vitor R.; Zhang, Lihua; Su, Dong Nano Letters, Vol. 13, Issue 4 https://doi.org/10.1021/nl304715p	journal	March 2013
Chemically Enhancing Block Copolymers for Block-Selective Synthesis of Self-Assembled Metal Oxide Nanostructures Kamcev, Jovan; Germack, David S.; Nykypanchuk, Dmytro ACS Nano, Vol. 7, Issue 1 https://doi.org/10.1021/nn304122b	journal	December 2012
High-Yield, Ultrafast, Surface Plasmon-Enhanced, Au Nanorod Optical Field Electron Emitter Arrays Hobbs, Richard G.; Yang, Yujia; Fallahi, Arya ACS Nano, Vol. 8, Issue 11 https://doi.org/10.1021/nn504594g	journal	November 2014
Sub-50-nm self-assembled nanotextures for enhanced broadband antireflection in silicon solar cells Rahman, Atikur; Ashraf, Ahsan; Xin, Huolin Nature Communications, Vol. 6, Issue 1 https://doi.org/10.1038/ncomms6963	journal	January 2015
A single-atom transistor Fuechsle, Martin; Miwa, Jill A.; Mahapatra, Suddhasatta Nature Nanotechnology, Vol. 7, Issue 4 https://doi.org/10.1038/nnano.2012.21	journal	February 2012
Emerging nanofabrication and quantum confinement techniques for 2D materials beyond graphene Stanford, Michael G.; Rack, Philip D.; Jariwala, Deep npj 2D Materials and Applications, Vol. 2, Issue 1 https://doi.org/10.1038/s41699-018-0065-3	journal	July 2018
Ab initio energy loss spectra of Si and Ge nanowires Palummo, Maurizia; Hogan, Conor; Ossicini, Stefano Physical Chemistry Chemical Physics, Vol. 17, Issue 43 https://doi.org/10.1039/C5CP05074J	journal	January 2015
Discrete power spectrum of line width roughness Hiraiwa, A.; Nishida, A. Journal of Applied Physics, Vol. 106, Issue 7 https://doi.org/10.1063/1.3226883	journal	October 2009
Surface plasmons and breakdown in thin silicon dioxide films on silicon Kim, Jong-Hyun; Sanchez, Julian J.; DeMassa, Thomas A. Journal of Applied Physics, Vol. 84, Issue 3 https://doi.org/10.1063/1.368178	journal	August 1998
Unbiased line width roughness measurements with critical dimension scanning electron microscopy and critical dimension atomic force microscopy Azarnouche, L.; Pargon, E.; Menguelti, K. Journal of Applied Physics, Vol. 111, Issue 8 https://doi.org/10.1063/1.4705509	journal	April 2012
Optical absorption and emission of silicon nanocrystals: From single to collective response Guerra, Roberto; Cigarini, Francesco; Ossicini, Stefano Journal of Applied Physics, Vol. 113, Issue 14 https://doi.org/10.1063/1.4799394	journal	April 2013
Nanostructured metals for light-based technologies Gordon, Reuven Nanotechnology, Vol. 30, Issue 21 https://doi.org/10.1088/1361-6528/ab0435	journal	March 2019
Nonlocal effects in the plasmons of nanowires and nanocavities excited by fast electron beams Aizpurua, Javier; Rivacoba, Alberto Physical Review B, Vol. 78, Issue 3 https://doi.org/10.1103/PhysRevB.78.035404	journal	July 2008
From Si Nanowires to Porous Silicon: The Role of Excitonic Effects Bruno, Mauro; Palummo, Maurizia; Marini, Andrea Physical Review Letters, Vol. 98, Issue 3 https://doi.org/10.1103/PhysRevLett.98.036807	journal	January 2007
Intrinsic parameter fluctuations in decananometer mosfets introduced by gate line edge roughness Asenov, A.; Kaya, S.; Brown, A. R. IEEE Transactions on Electron Devices, Vol. 50, Issue 5 https://doi.org/10.1109/TED.2003.813457	journal	May 2003
Using high-contrast salty development of hydrogen silsesquioxane for sub-10-nm half-pitch lithography Yang, Joel K. W.; Berggren, Karl K. Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, Vol. 25, Issue 6 https://doi.org/10.1116/1.2801881	journal	January 2007
Atomic precision lithography on Si Randall, J. N.; Lyding, J. W.; Schmucker, S. Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, Vol. 27, Issue 6 https://doi.org/10.1116/1.3237096	journal	January 2009
I n s i t u vaporization of very low molecular weight resists using 1/2 nm diameter electron beams Isaacson, M.; Muray, A. Journal of Vacuum Science and Technology, Vol. 19, Issue 4 https://doi.org/10.1116/1.571180	journal	November 1981
Statistical- and image-noise effects on experimental spectrum of line-edge and line-width roughness Nishida, Akio Journal of Micro/Nanolithography, MEMS, and MOEMS, Vol. 9, Issue 4 https://doi.org/10.1117/1.3504358	journal	October 2010
Optical properties of nanostructured materials: a review Flory, François Journal of Nanophotonics, Vol. 5, Issue 1 https://doi.org/10.1117/1.3609266	journal	January 2011
Systematic errors in the measurement of power spectral density Mack, Chris A. Journal of Micro/Nanolithography, MEMS, and MOEMS, Vol. 12, Issue 3 https://doi.org/10.1117/1.JMM.12.3.033016	journal	July 2013
Determination of line edge roughness in low-dose top-down scanning electron microscopy images Verduin, Thomas; Kruit, Pieter; Hagen, Cornelis W. Journal of Micro/Nanolithography, MEMS, and MOEMS, Vol. 13, Issue 3 https://doi.org/10.1117/1.JMM.13.3.033009	journal	July 2014
Systematic errors in the measurement of power spectral density Mack, Chris A. SPIE Advanced Lithography, SPIE Proceedings https://doi.org/10.1117/12.2012022	conference	April 2013
Determination of line edge roughness in low dose top-down scanning electron microscopy images Verduin, T.; Kruit, P.; Hagen, C. W. SPIE Advanced Lithography, SPIE Proceedings https://doi.org/10.1117/12.2046493	conference	April 2014
Theoretical analysis of line-edge roughness using FFT techniques Ohfuji, Takeshi; Endo, Masayuki; Morimoto, Hiroaki Microlithography '99, SPIE Proceedings https://doi.org/10.1117/12.350261	conference	June 1999
About the influence of Line Edge Roughness on measured effective–CD Bilski, Bartosz; Frenner, Karsten; Osten, Wolfgang Optics Express, Vol. 19, Issue 21 https://doi.org/10.1364/OE.19.019967	journal	January 2011
Low Magnetic Field Regime of a Gate-Defined Constriction in High-Mobility Graphene Veyrat, Louis; Jordan, Anna; Zimmermann, Katrin arXiv https://doi.org/10.48550/arxiv.1806.10087	text	January 2018

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29 ENERGY PLANNING, POLICY, AND ECONOMY
EELS
aberration correction
atomic scale
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line edge roughness
nanofabrication
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silicon patterning
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Title: Patterning Si at the 1 nm Length Scale with Aberration-Corrected Electron-Beam Lithography: Tuning of Plasmonic Properties by Design

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