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Title: Intrinsic Conductance of Domain Walls in BiFeO 3

Authors:
ORCiD logo [1];  [2];  [1];  [3];  [1];  [4];  [1];  [5];  [6];  [7];  [3];  [2];  [8]
  1. Department of Materials Science and EngineeringUniversity of California Irvine Irvine CA 92697 USA
  2. Department of Physics and Astronomy &, Nebraska Center for Materials and NanoscienceUniversity of Nebraska Lincoln NE 68588 USA
  3. Department of Materials Science and EngineeringPennsylvania State University State College PA 16802 USA
  4. Irvine Materials Research InstituteUniversity of California Irvine CA 92697 USA
  5. Department of Materials Science and EngineeringCornell University Ithaca NY 14850 USA
  6. Department of Applied PhysicsThe Hong Kong Polytechnic University Hung Hom Kowloon 999077 Hong Kong
  7. Department of Materials Science and EngineeringCornell University Ithaca NY 14850 USA, Kavli Institute at Cornell for Nanoscale Science Ithaca NY 14853 USA
  8. Department of Materials Science and EngineeringUniversity of California Irvine Irvine CA 92697 USA, Department of Physics and AstronomyUniversity of California Irvine CA 92697 USA
Publication Date:
Sponsoring Org.:
USDOE
OSTI Identifier:
1545391
Grant/Contract Number:  
DE‐SC0014430; DE‐FG02‐07ER46417
Resource Type:
Publisher's Accepted Manuscript
Journal Name:
Advanced Materials
Additional Journal Information:
Journal Name: Advanced Materials; Journal ID: ISSN 0935-9648
Publisher:
Wiley Blackwell (John Wiley & Sons)
Country of Publication:
Germany
Language:
English

Citation Formats

Zhang, Yi, Lu, Haidong, Yan, Xingxu, Cheng, Xiaoxing, Xie, Lin, Aoki, Toshihiro, Li, Linze, Heikes, Colin, Lau, Shu Ping, Schlom, Darrell G., Chen, Longqing, Gruverman, Alexei, and Pan, Xiaoqing. Intrinsic Conductance of Domain Walls in BiFeO 3. Germany: N. p., 2019. Web. doi:10.1002/adma.201902099.
Zhang, Yi, Lu, Haidong, Yan, Xingxu, Cheng, Xiaoxing, Xie, Lin, Aoki, Toshihiro, Li, Linze, Heikes, Colin, Lau, Shu Ping, Schlom, Darrell G., Chen, Longqing, Gruverman, Alexei, & Pan, Xiaoqing. Intrinsic Conductance of Domain Walls in BiFeO 3. Germany. doi:10.1002/adma.201902099.
Zhang, Yi, Lu, Haidong, Yan, Xingxu, Cheng, Xiaoxing, Xie, Lin, Aoki, Toshihiro, Li, Linze, Heikes, Colin, Lau, Shu Ping, Schlom, Darrell G., Chen, Longqing, Gruverman, Alexei, and Pan, Xiaoqing. Sun . "Intrinsic Conductance of Domain Walls in BiFeO 3". Germany. doi:10.1002/adma.201902099.
@article{osti_1545391,
title = {Intrinsic Conductance of Domain Walls in BiFeO 3},
author = {Zhang, Yi and Lu, Haidong and Yan, Xingxu and Cheng, Xiaoxing and Xie, Lin and Aoki, Toshihiro and Li, Linze and Heikes, Colin and Lau, Shu Ping and Schlom, Darrell G. and Chen, Longqing and Gruverman, Alexei and Pan, Xiaoqing},
abstractNote = {},
doi = {10.1002/adma.201902099},
journal = {Advanced Materials},
number = ,
volume = ,
place = {Germany},
year = {2019},
month = {7}
}

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Works referenced in this record:

Domain Wall Conductivity in La-Doped BiFeO 3
journal, November 2010


Intermittency, quasiperiodicity and chaos in probe-induced ferroelectric domain switching
journal, November 2013

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