Control of dopant crystallinity in electrochemically treated cuprate thin films
- Univ. of California, San Diego, CA (United States). Dept. of Physics; Univ. of California, Berkeley, CA (United States). Dept. of Physics
- Max Planck Inst. for Solid State Research, Stuttgart (Germany); Helmholtz-Zentrum Berlin für Materialien und Energie (HZB), (Germany). Wilhelm-Conrad-Röntgen-Campus BESSY II
- Univ. of California, Berkeley, CA (United States). Dept. of Physics
- Max Planck Inst. for Solid State Research, Stuttgart (Germany)
- SLAC National Accelerator Lab., Menlo Park, CA (United States). Stanford Synchrotron Radiation Lightsource (SSRL)
- Brookhaven National Lab. (BNL), Upton, NY (United States). Condensed Matter Physics and Materials Science Dept.
We present a methodology based on ex situ (postgrowth) electrochemistry to control the oxygen concentration in thin films of the superconducting oxide La2CuO4+y grown epitaxially on substrates of isostructural LaSrAlO4. The superconducting transition temperature, which depends on the oxygen concentration, can be tuned by adjusting the pH level of the base solution used for the electrochemical reaction. As our main finding, we demonstrate that the dopant oxygens can either occupy the interstitial layer in an orientationally disordered state or organize into a crystalline phase via a mechanism in which dopant oxygens are inserted into the substrate, changing the lattice symmetry of both the substrate and the epitaxial film. Finally, we discuss this mechanism, and we describe the resulting methodology as a platform to be explored in thin films of other transition-metal oxides.
- Research Organization:
- Brookhaven National Laboratory (BNL), Upton, NY (United States)
- Sponsoring Organization:
- USDOE Office of Science (SC), Basic Energy Sciences (BES) (SC-22)
- Grant/Contract Number:
- SC0012704
- OSTI ID:
- 1543398
- Report Number(s):
- BNL--211824-2019-JAAM
- Journal Information:
- Physical Review Materials, Journal Name: Physical Review Materials Journal Issue: 6 Vol. 3; ISSN PRMHAR; ISSN 2475-9953
- Publisher:
- American Physical Society (APS)Copyright Statement
- Country of Publication:
- United States
- Language:
- English
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