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Title: Measurement of sputtered beryllium yield and angular distribution during nanostructure growth in a helium plasma

Abstract

The angular distribution and sputtering yield of beryllium exposed to helium plasma are estimated from analysis of line-integrated 2D imaging of Be-I line emission in a steady-state linear plasma device. As the surface nanostructure forms during plasma exposure on a ∼100 s timescale (corresponding to a fluence of order 1020/cm2) from nearly mono-energetic ion bombardment, a narrowing of the beryllium sputtering angle and a significant (∼5×) drop in sputtering yield are observed. These trends are found to be qualitatively consistent with modeling taking into account the effect of the surface morphology on sputtering yield and angular distribution.

Authors:
 [1]; ORCiD logo [2];  [1];  [1];  [1];  [3];  [1]
  1. University of California, San Diego, 9500 Gilman Dr., La Jolla, California 92093-0417, USA
  2. Departamento de Ingeniería Energética, UNED, C/Juan del Rosal 12, 28040 Madrid, Spain; Laboratorio Nacional de Fusion, Ciemat, Avenida Complutense 22, 28040 Madrid, Spain
  3. Department of Material Science, Shimane University, 1060 Nishikawatsu, Matsue 680-8605 Japan
Publication Date:
Research Org.:
Univ. of California, San Diego, CA (United States)
Sponsoring Org.:
USDOE Office of Science (SC)
OSTI Identifier:
1535345
Alternate Identifier(s):
OSTI ID: 1392681
Grant/Contract Number:  
FG02-07ER54912
Resource Type:
Accepted Manuscript
Journal Name:
Journal of Applied Physics
Additional Journal Information:
Journal Volume: 122; Journal Issue: 11; Journal ID: ISSN 0021-8979
Publisher:
American Institute of Physics (AIP)
Country of Publication:
United States
Language:
English
Subject:
Physics

Citation Formats

Hollmann, E. M., Alegre, D., Baldwin, M. J., Chrobak, C. P., Doerner, R. P., Miyamoto, M., and Nishijima, D. Measurement of sputtered beryllium yield and angular distribution during nanostructure growth in a helium plasma. United States: N. p., 2017. Web. doi:10.1063/1.5002114.
Hollmann, E. M., Alegre, D., Baldwin, M. J., Chrobak, C. P., Doerner, R. P., Miyamoto, M., & Nishijima, D. Measurement of sputtered beryllium yield and angular distribution during nanostructure growth in a helium plasma. United States. doi:10.1063/1.5002114.
Hollmann, E. M., Alegre, D., Baldwin, M. J., Chrobak, C. P., Doerner, R. P., Miyamoto, M., and Nishijima, D. Thu . "Measurement of sputtered beryllium yield and angular distribution during nanostructure growth in a helium plasma". United States. doi:10.1063/1.5002114. https://www.osti.gov/servlets/purl/1535345.
@article{osti_1535345,
title = {Measurement of sputtered beryllium yield and angular distribution during nanostructure growth in a helium plasma},
author = {Hollmann, E. M. and Alegre, D. and Baldwin, M. J. and Chrobak, C. P. and Doerner, R. P. and Miyamoto, M. and Nishijima, D.},
abstractNote = {The angular distribution and sputtering yield of beryllium exposed to helium plasma are estimated from analysis of line-integrated 2D imaging of Be-I line emission in a steady-state linear plasma device. As the surface nanostructure forms during plasma exposure on a ∼100 s timescale (corresponding to a fluence of order 1020/cm2) from nearly mono-energetic ion bombardment, a narrowing of the beryllium sputtering angle and a significant (∼5×) drop in sputtering yield are observed. These trends are found to be qualitatively consistent with modeling taking into account the effect of the surface morphology on sputtering yield and angular distribution.},
doi = {10.1063/1.5002114},
journal = {Journal of Applied Physics},
number = 11,
volume = 122,
place = {United States},
year = {2017},
month = {9}
}

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Works referenced in this record:

A Monte Carlo computer program for the transport of energetic ions in amorphous targets
journal, August 1980