Measurement of sputtered beryllium yield and angular distribution during nanostructure growth in a helium plasma
Abstract
The angular distribution and sputtering yield of beryllium exposed to helium plasma are estimated from analysis of line-integrated 2D imaging of Be-I line emission in a steady-state linear plasma device. As the surface nanostructure forms during plasma exposure on a ∼100 s timescale (corresponding to a fluence of order 1020/cm2) from nearly mono-energetic ion bombardment, a narrowing of the beryllium sputtering angle and a significant (∼5×) drop in sputtering yield are observed. These trends are found to be qualitatively consistent with modeling taking into account the effect of the surface morphology on sputtering yield and angular distribution.
- Authors:
-
[2];
- University of California, San Diego, 9500 Gilman Dr., La Jolla, California 92093-0417, USA
- Departamento de Ingeniería Energética, UNED, C/Juan del Rosal 12, 28040 Madrid, Spain; Laboratorio Nacional de Fusion, Ciemat, Avenida Complutense 22, 28040 Madrid, Spain
- Department of Material Science, Shimane University, 1060 Nishikawatsu, Matsue 680-8605 Japan
- Publication Date:
- Research Org.:
- Univ. of California, San Diego, CA (United States)
- Sponsoring Org.:
- USDOE Office of Science (SC)
- OSTI Identifier:
- 1535345
- Alternate Identifier(s):
- OSTI ID: 1392681
- Grant/Contract Number:
- FG02-07ER54912
- Resource Type:
- Accepted Manuscript
- Journal Name:
- Journal of Applied Physics
- Additional Journal Information:
- Journal Volume: 122; Journal Issue: 11; Journal ID: ISSN 0021-8979
- Publisher:
- American Institute of Physics (AIP)
- Country of Publication:
- United States
- Language:
- English
- Subject:
- Physics
Citation Formats
Hollmann, E. M., Alegre, D., Baldwin, M. J., Chrobak, C. P., Doerner, R. P., Miyamoto, M., and Nishijima, D. Measurement of sputtered beryllium yield and angular distribution during nanostructure growth in a helium plasma. United States: N. p., 2017.
Web. doi:10.1063/1.5002114.
Hollmann, E. M., Alegre, D., Baldwin, M. J., Chrobak, C. P., Doerner, R. P., Miyamoto, M., & Nishijima, D. Measurement of sputtered beryllium yield and angular distribution during nanostructure growth in a helium plasma. United States. doi:10.1063/1.5002114.
Hollmann, E. M., Alegre, D., Baldwin, M. J., Chrobak, C. P., Doerner, R. P., Miyamoto, M., and Nishijima, D. Thu .
"Measurement of sputtered beryllium yield and angular distribution during nanostructure growth in a helium plasma". United States. doi:10.1063/1.5002114. https://www.osti.gov/servlets/purl/1535345.
@article{osti_1535345,
title = {Measurement of sputtered beryllium yield and angular distribution during nanostructure growth in a helium plasma},
author = {Hollmann, E. M. and Alegre, D. and Baldwin, M. J. and Chrobak, C. P. and Doerner, R. P. and Miyamoto, M. and Nishijima, D.},
abstractNote = {The angular distribution and sputtering yield of beryllium exposed to helium plasma are estimated from analysis of line-integrated 2D imaging of Be-I line emission in a steady-state linear plasma device. As the surface nanostructure forms during plasma exposure on a ∼100 s timescale (corresponding to a fluence of order 1020/cm2) from nearly mono-energetic ion bombardment, a narrowing of the beryllium sputtering angle and a significant (∼5×) drop in sputtering yield are observed. These trends are found to be qualitatively consistent with modeling taking into account the effect of the surface morphology on sputtering yield and angular distribution.},
doi = {10.1063/1.5002114},
journal = {Journal of Applied Physics},
number = 11,
volume = 122,
place = {United States},
year = {2017},
month = {9}
}
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Works referenced in this record:
A Monte Carlo computer program for the transport of energetic ions in amorphous targets
journal, August 1980
- Biersack, J. P.; Haggmark, L. G.
- Nuclear Instruments and Methods, Vol. 174, Issue 1-2, p. 257-269