Measurement of sputtered beryllium yield and angular distribution during nanostructure growth in a helium plasma

Hollmann, E. M.; Alegre, D.; Baldwin, M. J.; Chrobak, C. P.; Doerner, R. P.; Miyamoto, M.; Nishijima, D.

doi:10.1063/1.5002114

Title: Measurement of sputtered beryllium yield and angular distribution during nanostructure growth in a helium plasma

Journal Article · 18 September 2017 · Journal of Applied Physics

DOI: https://doi.org/10.1063/1.5002114 · OSTI ID:1535345

Hollmann, E. M. ^[1];

^[2]; Baldwin, M. J. ^[1]; Chrobak, C. P. ^[1]; Doerner, R. P. ^[1]; Miyamoto, M. ^[3]; Nishijima, D. ^[1]

Univ. of California, San Diego, La Jolla, CA (United States)
Universidad Nacional de Educación a Distancia (UNED), Madrid (Spain); Laboratorio Nacional de Fusion, Ciemat, Madrid (Spain)
Shimane Univ., Matsue (Japan)

Here, the angular distribution and sputtering yield of beryllium exposed to helium plasma are estimated from analysis of line-integrated 2D imaging of Be-I line emission in a steady-state linear plasma device. As the surface nanostructure forms during plasma exposure on a ~100 s timescale (corresponding to a fluence of order 10²⁰/cm²) from nearly mono-energetic ion bombardment, a narrowing of the beryllium sputtering angle and a significant (~5×) drop in sputtering yield are observed. Lastly, these trends are found to be qualitatively consistent with modeling taking into account the effect of the surface morphology on sputtering yield and angular distribution.

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Research Organization:: Univ. of California, San Diego, CA (United States)

Sponsoring Organization:: USDOE Office of Science (SC)

Grant/Contract Number:: FG02-07ER54912

OSTI ID:: 1535345

Alternate ID(s):: OSTI ID: 1392681

Journal Information:: Journal of Applied Physics, Vol. 122, Issue 11; ISSN 0021-8979

Publisher:: American Institute of Physics (AIP)Copyright Statement

Country of Publication:: United States

Language:: English

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Cited by: 1 work

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