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Title: Measurement of sputtered beryllium yield and angular distribution during nanostructure growth in a helium plasma

Abstract

Here, the angular distribution and sputtering yield of beryllium exposed to helium plasma are estimated from analysis of line-integrated 2D imaging of Be-I line emission in a steady-state linear plasma device. As the surface nanostructure forms during plasma exposure on a ~100 s timescale (corresponding to a fluence of order 1020/cm2) from nearly mono-energetic ion bombardment, a narrowing of the beryllium sputtering angle and a significant (~5×) drop in sputtering yield are observed. Lastly, these trends are found to be qualitatively consistent with modeling taking into account the effect of the surface morphology on sputtering yield and angular distribution.

Authors:
 [1]; ORCiD logo [2];  [1];  [1];  [1];  [3];  [1]
  1. Univ. of California, San Diego, La Jolla, CA (United States)
  2. Universidad Nacional de Educación a Distancia (UNED), Madrid (Spain); Laboratorio Nacional de Fusion, Ciemat, Madrid (Spain)
  3. Shimane Univ., Matsue (Japan)
Publication Date:
Research Org.:
Univ. of California, San Diego, CA (United States)
Sponsoring Org.:
USDOE Office of Science (SC)
OSTI Identifier:
1535345
Alternate Identifier(s):
OSTI ID: 1392681
Grant/Contract Number:  
FG02-07ER54912
Resource Type:
Accepted Manuscript
Journal Name:
Journal of Applied Physics
Additional Journal Information:
Journal Volume: 122; Journal Issue: 11; Journal ID: ISSN 0021-8979
Publisher:
American Institute of Physics (AIP)
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; 70 PLASMA PHYSICS AND FUSION TECHNOLOGY

Citation Formats

Hollmann, E. M., Alegre, D., Baldwin, M. J., Chrobak, C. P., Doerner, R. P., Miyamoto, M., and Nishijima, D. Measurement of sputtered beryllium yield and angular distribution during nanostructure growth in a helium plasma. United States: N. p., 2017. Web. doi:10.1063/1.5002114.
Hollmann, E. M., Alegre, D., Baldwin, M. J., Chrobak, C. P., Doerner, R. P., Miyamoto, M., & Nishijima, D. Measurement of sputtered beryllium yield and angular distribution during nanostructure growth in a helium plasma. United States. doi:10.1063/1.5002114.
Hollmann, E. M., Alegre, D., Baldwin, M. J., Chrobak, C. P., Doerner, R. P., Miyamoto, M., and Nishijima, D. Mon . "Measurement of sputtered beryllium yield and angular distribution during nanostructure growth in a helium plasma". United States. doi:10.1063/1.5002114. https://www.osti.gov/servlets/purl/1535345.
@article{osti_1535345,
title = {Measurement of sputtered beryllium yield and angular distribution during nanostructure growth in a helium plasma},
author = {Hollmann, E. M. and Alegre, D. and Baldwin, M. J. and Chrobak, C. P. and Doerner, R. P. and Miyamoto, M. and Nishijima, D.},
abstractNote = {Here, the angular distribution and sputtering yield of beryllium exposed to helium plasma are estimated from analysis of line-integrated 2D imaging of Be-I line emission in a steady-state linear plasma device. As the surface nanostructure forms during plasma exposure on a ~100 s timescale (corresponding to a fluence of order 1020/cm2) from nearly mono-energetic ion bombardment, a narrowing of the beryllium sputtering angle and a significant (~5×) drop in sputtering yield are observed. Lastly, these trends are found to be qualitatively consistent with modeling taking into account the effect of the surface morphology on sputtering yield and angular distribution.},
doi = {10.1063/1.5002114},
journal = {Journal of Applied Physics},
number = 11,
volume = 122,
place = {United States},
year = {2017},
month = {9}
}

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    Works referencing / citing this record:

    Observation of increased nanostructure cone growth on Cr due to grazing-incidence Ta seed atom deposition in a He plasma
    journal, August 2019

    • Hollmann, E. M.; Nishijima, D.; Patino, M. I.
    • Journal of Applied Physics, Vol. 126, Issue 7
    • DOI: 10.1063/1.5110298