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Title: Patterning Si at the 1 nm Length Scale with Aberration‐Corrected Electron‐Beam Lithography: Tuning of Plasmonic Properties by Design

Authors:
 [1]; ORCiD logo [1];  [1];  [1];  [1];  [1];  [1]
  1. Center for Functional NanomaterialsBrookhaven National Laboratory Upton NY 11973 USA
Publication Date:
Sponsoring Org.:
USDOE
OSTI Identifier:
1532423
Grant/Contract Number:  
DE‐SC0012704
Resource Type:
Publisher's Accepted Manuscript
Journal Name:
Advanced Functional Materials
Additional Journal Information:
Journal Name: Advanced Functional Materials; Journal ID: ISSN 1616-301X
Publisher:
Wiley Blackwell (John Wiley & Sons)
Country of Publication:
Germany
Language:
English

Citation Formats

Manfrinato, Vitor R., Camino, Fernando E., Stein, Aaron, Zhang, Lihua, Lu, Ming, Stach, Eric A., and Black, Charles T. Patterning Si at the 1 nm Length Scale with Aberration‐Corrected Electron‐Beam Lithography: Tuning of Plasmonic Properties by Design. Germany: N. p., 2019. Web. doi:10.1002/adfm.201903429.
Manfrinato, Vitor R., Camino, Fernando E., Stein, Aaron, Zhang, Lihua, Lu, Ming, Stach, Eric A., & Black, Charles T. Patterning Si at the 1 nm Length Scale with Aberration‐Corrected Electron‐Beam Lithography: Tuning of Plasmonic Properties by Design. Germany. doi:10.1002/adfm.201903429.
Manfrinato, Vitor R., Camino, Fernando E., Stein, Aaron, Zhang, Lihua, Lu, Ming, Stach, Eric A., and Black, Charles T. Mon . "Patterning Si at the 1 nm Length Scale with Aberration‐Corrected Electron‐Beam Lithography: Tuning of Plasmonic Properties by Design". Germany. doi:10.1002/adfm.201903429.
@article{osti_1532423,
title = {Patterning Si at the 1 nm Length Scale with Aberration‐Corrected Electron‐Beam Lithography: Tuning of Plasmonic Properties by Design},
author = {Manfrinato, Vitor R. and Camino, Fernando E. and Stein, Aaron and Zhang, Lihua and Lu, Ming and Stach, Eric A. and Black, Charles T.},
abstractNote = {},
doi = {10.1002/adfm.201903429},
journal = {Advanced Functional Materials},
number = ,
volume = ,
place = {Germany},
year = {2019},
month = {7}
}

Journal Article:
Free Publicly Available Full Text
This content will become publicly available on July 7, 2020
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