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Title: Filamentation of capacitively coupled plasmas in large magnetic fields

Authors:
 [1];  [1]; ORCiD logo [2]
  1. Department of Physics, Auburn University, Auburn, Alabama 36849-5311, USA
  2. Department of Electrical Engineering and Computer Science, University of Michigan, 1301 Beal Avenue, Ann Arbor, Michigan 48109-2122, USA
Publication Date:
Sponsoring Org.:
USDOE
OSTI Identifier:
1528675
Grant/Contract Number:  
SC0001939; SC0014132; SC0016330
Resource Type:
Publisher's Accepted Manuscript
Journal Name:
Physics of Plasmas
Additional Journal Information:
Journal Name: Physics of Plasmas Journal Volume: 26 Journal Issue: 6; Journal ID: ISSN 1070-664X
Publisher:
American Institute of Physics
Country of Publication:
United States
Language:
English

Citation Formats

Menati, Mohamad, Thomas, Edward, and Kushner, Mark J. Filamentation of capacitively coupled plasmas in large magnetic fields. United States: N. p., 2019. Web. doi:10.1063/1.5092600.
Menati, Mohamad, Thomas, Edward, & Kushner, Mark J. Filamentation of capacitively coupled plasmas in large magnetic fields. United States. doi:10.1063/1.5092600.
Menati, Mohamad, Thomas, Edward, and Kushner, Mark J. Sat . "Filamentation of capacitively coupled plasmas in large magnetic fields". United States. doi:10.1063/1.5092600.
@article{osti_1528675,
title = {Filamentation of capacitively coupled plasmas in large magnetic fields},
author = {Menati, Mohamad and Thomas, Edward and Kushner, Mark J.},
abstractNote = {},
doi = {10.1063/1.5092600},
journal = {Physics of Plasmas},
number = 6,
volume = 26,
place = {United States},
year = {2019},
month = {6}
}

Journal Article:
Free Publicly Available Full Text
This content will become publicly available on June 21, 2020
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