skip to main content
DOE PAGES title logo U.S. Department of Energy
Office of Scientific and Technical Information

This content will become publicly available on May 3, 2020

Title: Absolute calibration of GafChromic film for very high flux laser driven ion beams

Authors:
ORCiD logo [1]; ORCiD logo [1];  [1];  [1]; ORCiD logo [1]; ORCiD logo [1]; ORCiD logo [1]; ORCiD logo [1]; ORCiD logo [2]; ORCiD logo [1]
  1. Lawrence Berkeley National Laboratory, 1 Cyclotron Road, Berkeley, California 94720, USA
  2. Lawrence Berkeley National Laboratory, 1 Cyclotron Road, Berkeley, California 94720, USA, Deutsches Elektronen-Synchrotron DESY, Notkestrasse 85, 22607 Hamburg, Germany
Publication Date:
Sponsoring Org.:
USDOE Office of Science (SC), Fusion Energy Sciences (FES) (SC-24)
OSTI Identifier:
1510550
Resource Type:
Publisher's Accepted Manuscript
Journal Name:
Review of Scientific Instruments
Additional Journal Information:
Journal Name: Review of Scientific Instruments Journal Volume: 90 Journal Issue: 5; Journal ID: ISSN 0034-6748
Publisher:
American Institute of Physics
Country of Publication:
United States
Language:
English

Citation Formats

Bin, J. H., Ji, Q., Seidl, P. A., Raftrey, D., Steinke, S., Persaud, A., Nakamura, K., Gonsalves, A., Leemans, W. P., and Schenkel, T. Absolute calibration of GafChromic film for very high flux laser driven ion beams. United States: N. p., 2019. Web. doi:10.1063/1.5086822.
Bin, J. H., Ji, Q., Seidl, P. A., Raftrey, D., Steinke, S., Persaud, A., Nakamura, K., Gonsalves, A., Leemans, W. P., & Schenkel, T. Absolute calibration of GafChromic film for very high flux laser driven ion beams. United States. doi:10.1063/1.5086822.
Bin, J. H., Ji, Q., Seidl, P. A., Raftrey, D., Steinke, S., Persaud, A., Nakamura, K., Gonsalves, A., Leemans, W. P., and Schenkel, T. Wed . "Absolute calibration of GafChromic film for very high flux laser driven ion beams". United States. doi:10.1063/1.5086822.
@article{osti_1510550,
title = {Absolute calibration of GafChromic film for very high flux laser driven ion beams},
author = {Bin, J. H. and Ji, Q. and Seidl, P. A. and Raftrey, D. and Steinke, S. and Persaud, A. and Nakamura, K. and Gonsalves, A. and Leemans, W. P. and Schenkel, T.},
abstractNote = {},
doi = {10.1063/1.5086822},
journal = {Review of Scientific Instruments},
number = 5,
volume = 90,
place = {United States},
year = {2019},
month = {5}
}

Journal Article:
Free Publicly Available Full Text
This content will become publicly available on May 3, 2020
Publisher's Version of Record

Save / Share: