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Title: Tuning Ultrafast Photoinduced Strain in Ferroelectric‐Based Devices

Authors:
ORCiD logo [1];  [1];  [1];  [2];  [3];  [3];  [1];  [4];  [5];  [1];  [1];  [6]
  1. Center for Nanoscience and Nanotechnology (C2N)UMR CNRS – University of Paris‐Sud 10 boulevard Thomas Gobert 91120 Palaiseau France
  2. Center for Memory and Recording ResearchUniversity of California‐San Diego La Jolla CA 92093‐0401 USA, Department of PhysicsUniversity of California‐San Diego La Jolla CA 92093‐0317 USA
  3. Advanced Photon SourceArgonne National Laboratory Argonne IL 60439 USA
  4. Department of PhysicsUniversity of California‐San Diego La Jolla CA 92093‐0317 USA
  5. Center for Memory and Recording ResearchUniversity of California‐San Diego La Jolla CA 92093‐0401 USA
  6. Department of Materials Science and EngineeringUniversity of California Davis Davis CA 95616 USA
Publication Date:
Sponsoring Org.:
USDOE
OSTI Identifier:
1510342
Grant/Contract Number:  
DE‐SC0012375; DE‐AC02‐06CH11357
Resource Type:
Publisher's Accepted Manuscript
Journal Name:
Advanced Electronic Materials
Additional Journal Information:
Journal Name: Advanced Electronic Materials; Journal ID: ISSN 2199-160X
Publisher:
Wiley Blackwell (John Wiley & Sons)
Country of Publication:
United States
Language:
English

Citation Formats

Matzen, Sylvia, Guillemot, Loïc, Maroutian, Thomas, Patel, Sheena K. K., Wen, Haidan, DiChiara, Anthony D., Agnus, Guillaume, Shpyrko, Oleg G., Fullerton, Eric E., Ravelosona, Dafiné, Lecoeur, Philippe, and Kukreja, Roopali. Tuning Ultrafast Photoinduced Strain in Ferroelectric‐Based Devices. United States: N. p., 2019. Web. doi:10.1002/aelm.201800709.
Matzen, Sylvia, Guillemot, Loïc, Maroutian, Thomas, Patel, Sheena K. K., Wen, Haidan, DiChiara, Anthony D., Agnus, Guillaume, Shpyrko, Oleg G., Fullerton, Eric E., Ravelosona, Dafiné, Lecoeur, Philippe, & Kukreja, Roopali. Tuning Ultrafast Photoinduced Strain in Ferroelectric‐Based Devices. United States. doi:10.1002/aelm.201800709.
Matzen, Sylvia, Guillemot, Loïc, Maroutian, Thomas, Patel, Sheena K. K., Wen, Haidan, DiChiara, Anthony D., Agnus, Guillaume, Shpyrko, Oleg G., Fullerton, Eric E., Ravelosona, Dafiné, Lecoeur, Philippe, and Kukreja, Roopali. Thu . "Tuning Ultrafast Photoinduced Strain in Ferroelectric‐Based Devices". United States. doi:10.1002/aelm.201800709.
@article{osti_1510342,
title = {Tuning Ultrafast Photoinduced Strain in Ferroelectric‐Based Devices},
author = {Matzen, Sylvia and Guillemot, Loïc and Maroutian, Thomas and Patel, Sheena K. K. and Wen, Haidan and DiChiara, Anthony D. and Agnus, Guillaume and Shpyrko, Oleg G. and Fullerton, Eric E. and Ravelosona, Dafiné and Lecoeur, Philippe and Kukreja, Roopali},
abstractNote = {},
doi = {10.1002/aelm.201800709},
journal = {Advanced Electronic Materials},
number = ,
volume = ,
place = {United States},
year = {2019},
month = {5}
}

Journal Article:
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This content will become publicly available on May 1, 2020
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