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Title: Plasma-Enhanced Atomic Layer Deposition of TiAlN: Compositional and Optoelectronic Tunability

Abstract

Titanium nitride (TiN) is a unique refractory plasmonic material, the nanocomposites and alloys of which provide further opportunities to tailor its optical and photonic properties. We prepare TiAlN films of continuously variable compositions through the systematic variation of TiN versus AlN cycle ratio in plasma-enhanced atomic layer deposition (PEALD) and investigate the resulting thin-film composition, crystallinity, and optical properties. The resulting properties of TiAIN films are not simple linear combinations of the TiN and AlN films, which exhibit distinct metallic and dielectric properties, but instead are dramatically influenced by the local chemical environment of neighboring constituents. In situ spectroscopic ellipsometry further enables measurement of the varying optical properties of TiAlN films, which evolve over 10 s of nm of film thickness. The tunable optoelectronic properties of TiAlN films enable durable coatings of variable electrical resistance as well as high-temperature diffusion barriers and optical coatings with application to selective solar absorbers and emitters.

Authors:
ORCiD logo [1];  [2];  [1]; ORCiD logo [1]
  1. Argonne National Lab. (ANL), Argonne, IL (United States)
  2. Univ. of Notre Dame, IN (United States)
Publication Date:
Research Org.:
Argonne National Lab. (ANL), Argonne, IL (United States)
Sponsoring Org.:
USDOE Office of Science (SC)
OSTI Identifier:
1508363
Grant/Contract Number:  
AC02-06CH11357
Resource Type:
Accepted Manuscript
Journal Name:
ACS Applied Materials and Interfaces
Additional Journal Information:
Journal Volume: 11; Journal Issue: 12; Journal ID: ISSN 1944-8244
Publisher:
American Chemical Society (ACS)
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; dielectric functions; optical coating; plasma-enhanced atomic layer deposition; spectroscopic ellipsometry; titanium aluminum nitride

Citation Formats

Jeon, Nari, Lightcap, Ian, Mandia, David J., and Martinson, Alex B. F. Plasma-Enhanced Atomic Layer Deposition of TiAlN: Compositional and Optoelectronic Tunability. United States: N. p., 2019. Web. doi:10.1021/acsami.8b21461.
Jeon, Nari, Lightcap, Ian, Mandia, David J., & Martinson, Alex B. F. Plasma-Enhanced Atomic Layer Deposition of TiAlN: Compositional and Optoelectronic Tunability. United States. doi:10.1021/acsami.8b21461.
Jeon, Nari, Lightcap, Ian, Mandia, David J., and Martinson, Alex B. F. Fri . "Plasma-Enhanced Atomic Layer Deposition of TiAlN: Compositional and Optoelectronic Tunability". United States. doi:10.1021/acsami.8b21461.
@article{osti_1508363,
title = {Plasma-Enhanced Atomic Layer Deposition of TiAlN: Compositional and Optoelectronic Tunability},
author = {Jeon, Nari and Lightcap, Ian and Mandia, David J. and Martinson, Alex B. F.},
abstractNote = {Titanium nitride (TiN) is a unique refractory plasmonic material, the nanocomposites and alloys of which provide further opportunities to tailor its optical and photonic properties. We prepare TiAlN films of continuously variable compositions through the systematic variation of TiN versus AlN cycle ratio in plasma-enhanced atomic layer deposition (PEALD) and investigate the resulting thin-film composition, crystallinity, and optical properties. The resulting properties of TiAIN films are not simple linear combinations of the TiN and AlN films, which exhibit distinct metallic and dielectric properties, but instead are dramatically influenced by the local chemical environment of neighboring constituents. In situ spectroscopic ellipsometry further enables measurement of the varying optical properties of TiAlN films, which evolve over 10 s of nm of film thickness. The tunable optoelectronic properties of TiAlN films enable durable coatings of variable electrical resistance as well as high-temperature diffusion barriers and optical coatings with application to selective solar absorbers and emitters.},
doi = {10.1021/acsami.8b21461},
journal = {ACS Applied Materials and Interfaces},
number = 12,
volume = 11,
place = {United States},
year = {2019},
month = {3}
}

Journal Article:
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This content will become publicly available on March 1, 2020
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