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Title: Highly Uniform Resistive Switching in HfO 2 Films Embedded with Ordered Metal Nanoisland Arrays

ORCiD logo [1]; ORCiD logo [2]; ORCiD logo [2]; ORCiD logo [3]; ORCiD logo [1]
  1. Department of Mechanical and Industrial EngineeringUniversity of Massachusetts Amherst MA 01003 USA
  2. Department of Materials Science and EngineeringUniversity of California Irvine CA 92697 USA
  3. Department of Materials Science and EngineeringUniversity of California Irvine CA 92697 USA, Department of Physics and AstronomyUniversity of California Irvine CA 92697 USA
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Publisher's Accepted Manuscript
Journal Name:
Advanced Functional Materials
Additional Journal Information:
Journal Name: Advanced Functional Materials Journal Volume: 29 Journal Issue: 25; Journal ID: ISSN 1616-301X
Wiley Blackwell (John Wiley & Sons)
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Citation Formats

Wang, Jiaying, Li, Linze, Huyan, Huaixun, Pan, Xiaoqing, and Nonnenmann, Stephen S. Highly Uniform Resistive Switching in HfO 2 Films Embedded with Ordered Metal Nanoisland Arrays. Germany: N. p., 2019. Web. doi:10.1002/adfm.201808430.
Wang, Jiaying, Li, Linze, Huyan, Huaixun, Pan, Xiaoqing, & Nonnenmann, Stephen S. Highly Uniform Resistive Switching in HfO 2 Films Embedded with Ordered Metal Nanoisland Arrays. Germany. doi:10.1002/adfm.201808430.
Wang, Jiaying, Li, Linze, Huyan, Huaixun, Pan, Xiaoqing, and Nonnenmann, Stephen S. Mon . "Highly Uniform Resistive Switching in HfO 2 Films Embedded with Ordered Metal Nanoisland Arrays". Germany. doi:10.1002/adfm.201808430.
title = {Highly Uniform Resistive Switching in HfO 2 Films Embedded with Ordered Metal Nanoisland Arrays},
author = {Wang, Jiaying and Li, Linze and Huyan, Huaixun and Pan, Xiaoqing and Nonnenmann, Stephen S.},
abstractNote = {},
doi = {10.1002/adfm.201808430},
journal = {Advanced Functional Materials},
number = 25,
volume = 29,
place = {Germany},
year = {2019},
month = {4}

Journal Article:
Free Publicly Available Full Text
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DOI: 10.1002/adfm.201808430

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