Scaling Relations on Basal Plane Vacancies of Transition Metal Dichalcogenides for CO2 Reduction
Transition metal dichalcogenides (TMDs) have shown promising electrocatalytic performance for CO2 reduction (CO2R) recently. However, the development of efficient and selective catalysts remains a major challenge. Although recent studies have suggested the importance of activation energies as activity descriptors for CO2R beyond CO, the scaling of intermediate binding energies presents the first step in computational catalyst screening. Here, we investigate the basal vacancy on 2H and 1T/1T' phase group V, VI, and X TMDs for CO2 reduction. We find that the change of oxophicility and carbophilicity on each group of TMDs follows different trends, which leads to different scaling relations amongst key intermediates. Our thermochemical analysis also suggests group V and VI TMDs to be either selective for hydrogen evolution reaction or prone to OH poisoning. Furthermore, the initial analysis suggests group X TMDs to be possible candidates for active and selective CO2 reduction without suffering from OH poisoning, which motivates further theoretical kinetic studies. We furthermore find that their reaction energetics can be tuned by the density of the basal vacancies.
- Research Organization:
- SLAC National Accelerator Laboratory (SLAC), Menlo Park, CA (United States)
- Sponsoring Organization:
- USDOE Office of Science (SC), Basic Energy Sciences (BES) (SC-22)
- Grant/Contract Number:
- AC02-76SF00515; SC0008685
- OSTI ID:
- 1506851
- Journal Information:
- Journal of Physical Chemistry. C, Journal Name: Journal of Physical Chemistry. C Journal Issue: 7 Vol. 123; ISSN 1932-7447
- Publisher:
- American Chemical SocietyCopyright Statement
- Country of Publication:
- United States
- Language:
- English
Transition Metal Dichalcogenides for the Application of Pollution Reduction: A Review
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journal | May 2020 |
Photoelectrochemical Hydrogen Evolution and CO2 Reduction over MoS2/Si and MoSe2/Si Nanostructures by Combined Photoelectrochemical Deposition and Rapid-Thermal Annealing Process
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journal | May 2019 |
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