skip to main content
DOE PAGES title logo U.S. Department of Energy
Office of Scientific and Technical Information

This content will become publicly available on March 28, 2020

Title: Evolution of photoresist layer structure and surface morphology under fluorocarbon‐based plasma exposure

Authors:
ORCiD logo [1];  [2];  [3];  [1]
  1. Department of Materials Science and Engineering, Institute for Research in Electronics and Applied PhysicsUniversity of Maryland College Park Maryland
  2. Department of Chemistry and BiochemistryUniversity of Maryland College Park Maryland
  3. Department of Chemistry and BiochemistryUniversity of Maryland College Park Maryland, Institute for Physical Science and TechnologyUniversity of Maryland College Park Maryland, Center for Nanophysics and Advanced MaterialsUniversity of Maryland College Park Maryland
Publication Date:
Sponsoring Org.:
USDOE Office of Science (SC), Fusion Energy Sciences (FES) (SC-24)
OSTI Identifier:
1504283
Grant/Contract Number:  
DE‐SC0001939
Resource Type:
Publisher's Accepted Manuscript
Journal Name:
Plasma Processes and Polymers
Additional Journal Information:
Journal Name: Plasma Processes and Polymers Journal Volume: 16 Journal Issue: 9; Journal ID: ISSN 1612-8850
Publisher:
Wiley Blackwell (John Wiley & Sons)
Country of Publication:
Germany
Language:
English

Citation Formats

Pranda, Adam, Gutierrez Razo, Sandra A., Fourkas, John T., and Oehrlein, Gottlieb S. Evolution of photoresist layer structure and surface morphology under fluorocarbon‐based plasma exposure. Germany: N. p., 2019. Web. doi:10.1002/ppap.201900026.
Pranda, Adam, Gutierrez Razo, Sandra A., Fourkas, John T., & Oehrlein, Gottlieb S. Evolution of photoresist layer structure and surface morphology under fluorocarbon‐based plasma exposure. Germany. doi:10.1002/ppap.201900026.
Pranda, Adam, Gutierrez Razo, Sandra A., Fourkas, John T., and Oehrlein, Gottlieb S. Fri . "Evolution of photoresist layer structure and surface morphology under fluorocarbon‐based plasma exposure". Germany. doi:10.1002/ppap.201900026.
@article{osti_1504283,
title = {Evolution of photoresist layer structure and surface morphology under fluorocarbon‐based plasma exposure},
author = {Pranda, Adam and Gutierrez Razo, Sandra A. and Fourkas, John T. and Oehrlein, Gottlieb S.},
abstractNote = {},
doi = {10.1002/ppap.201900026},
journal = {Plasma Processes and Polymers},
number = 9,
volume = 16,
place = {Germany},
year = {2019},
month = {3}
}

Journal Article:
Free Publicly Available Full Text
This content will become publicly available on March 28, 2020
Publisher's Version of Record

Save / Share: