Epitaxial integration and properties of SrRuO3 on silicon
Abstract
We report the integration of SrRuO3, one of the most widely used oxide electrode materials in functional oxide heterostructures, with silicon using molecular-beam epitaxy and an SrTiO3 buffer layer. The resulting SrRuO3 film has a rocking curve full width at half maximum of 0.01°, a resistivity at room temperature of 250 μΩ cm, a residual resistivity ratio (ρ300 K/ρ4 K) of 11, and a paramagnetic-to-ferromagnetic transition temperature of ~160 K. These structural, electrical, and magnetic properties compare favorably to the best reported values for SrRuO3 films on silicon and rival those of epitaxial SrRuO3 films produced directly on SrTiO3 single crystals by thin film growth techniques other than molecular-beam epitaxy. These high quality SrRuO3 films with metallic conductivity on silicon are relevant to integrating multi-functional oxides with the workhorse of semiconductor technology, silicon.
- Authors:
-
- Cornell Univ., Ithaca, NY (United States). School of Applied and Engineering Physics
- Cornell Univ., Ithaca, NY (United States). Dept. of Materials Science and Engineering
- Samsung Electronics, Milpitas, CA (United States). 3New Memory Technology Lab, Semiconductor R&D Center
- Samsung Electronics, Yeongtong-gu, Suwon-si (South Korea). Samsung Advanced Inst. of Technology (SAIT), Platform Technology Lab.
- Samsung Semiconductor R&D Center 1, Samsungjeonja-ro, Hwaseong-si (South Korea)
- Cornell Univ., Ithaca, NY (United States). School of Applied and Engineering Physics; Kavli Inst. at Cornell for Nanoscale Science, Ithaca, NY (United States)
- Cornell Univ., Ithaca, NY (United States). Dept. of Materials Science and Engineering; Kavli Inst. at Cornell for Nanoscale Science, Ithaca, NY (United States)
- Publication Date:
- Research Org.:
- Krell Institute, Inc., Ames, IA (United States)
- Sponsoring Org.:
- USDOE
- OSTI Identifier:
- 1501523
- Grant/Contract Number:
- FG02-97ER25308
- Resource Type:
- Accepted Manuscript
- Journal Name:
- APL Materials
- Additional Journal Information:
- Journal Volume: 6; Journal Issue: 8; Journal ID: ISSN 2166-532X
- Publisher:
- American Institute of Physics (AIP)
- Country of Publication:
- United States
- Language:
- English
- Subject:
- 36 MATERIALS SCIENCE
Citation Formats
Wang, Zhe, Nair, Hari P., Correa, Gabriela C., Jeong, Jaewoo, Lee, Kiyoung, Kim, Eun Sun, H., Ariel Seidner, Lee, Chang Seung, Lim, Han Jin, Muller, David A., and Schlom, Darrell G. Epitaxial integration and properties of SrRuO3 on silicon. United States: N. p., 2018.
Web. doi:10.1063/1.5041940.
Wang, Zhe, Nair, Hari P., Correa, Gabriela C., Jeong, Jaewoo, Lee, Kiyoung, Kim, Eun Sun, H., Ariel Seidner, Lee, Chang Seung, Lim, Han Jin, Muller, David A., & Schlom, Darrell G. Epitaxial integration and properties of SrRuO3 on silicon. United States. https://doi.org/10.1063/1.5041940
Wang, Zhe, Nair, Hari P., Correa, Gabriela C., Jeong, Jaewoo, Lee, Kiyoung, Kim, Eun Sun, H., Ariel Seidner, Lee, Chang Seung, Lim, Han Jin, Muller, David A., and Schlom, Darrell G. Thu .
"Epitaxial integration and properties of SrRuO3 on silicon". United States. https://doi.org/10.1063/1.5041940. https://www.osti.gov/servlets/purl/1501523.
@article{osti_1501523,
title = {Epitaxial integration and properties of SrRuO3 on silicon},
author = {Wang, Zhe and Nair, Hari P. and Correa, Gabriela C. and Jeong, Jaewoo and Lee, Kiyoung and Kim, Eun Sun and H., Ariel Seidner and Lee, Chang Seung and Lim, Han Jin and Muller, David A. and Schlom, Darrell G.},
abstractNote = {We report the integration of SrRuO3, one of the most widely used oxide electrode materials in functional oxide heterostructures, with silicon using molecular-beam epitaxy and an SrTiO3 buffer layer. The resulting SrRuO3 film has a rocking curve full width at half maximum of 0.01°, a resistivity at room temperature of 250 μΩ cm, a residual resistivity ratio (ρ300 K/ρ4 K) of 11, and a paramagnetic-to-ferromagnetic transition temperature of ~160 K. These structural, electrical, and magnetic properties compare favorably to the best reported values for SrRuO3 films on silicon and rival those of epitaxial SrRuO3 films produced directly on SrTiO3 single crystals by thin film growth techniques other than molecular-beam epitaxy. These high quality SrRuO3 films with metallic conductivity on silicon are relevant to integrating multi-functional oxides with the workhorse of semiconductor technology, silicon.},
doi = {10.1063/1.5041940},
journal = {APL Materials},
number = 8,
volume = 6,
place = {United States},
year = {Thu Aug 02 00:00:00 EDT 2018},
month = {Thu Aug 02 00:00:00 EDT 2018}
}
Web of Science
Figures / Tables:
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