Area-Selective Atomic Layer Deposition of Metal Oxides on Noble Metals through Catalytic Oxygen Activation

Singh, Joseph A.; Thissen, Nick F.  W.; Kim, Woo-Hee; Johnson, Hannah; Kessels, Wilhelmus M.  M.; Bol, Ageeth A.; Bent, Stacey F.; Mackus, Adriaan J.  M.

doi:10.1021/acs.chemmater.7b03818

Title: Area-Selective Atomic Layer Deposition of Metal Oxides on Noble Metals through Catalytic Oxygen Activation

Journal Article · 30 January 2018 · Chemistry of Materials

DOI: https://doi.org/10.1021/acs.chemmater.7b03818 · OSTI ID:1499117

^[1]; Thissen, Nick F. W. ^[2]; Kim, Woo-Hee ^[3]; Johnson, Hannah ^[4];

^[2];

^[5];

^[6]

Stanford Univ., CA (United States). Dept. of Chemistry
Eindhoven Univ. of Technology (Netherlands). Dept. of Applied Physics
Chonbuk National Univ., Jeonju (Korea, Republic of). Division of Advanced Materials Engineering; Stanford Univ., CA (United States). Dept. of Chemical Engineering
Toyota Motor Europe NV/SA, Zaventem (Belgium). Advanced Technology 1
Stanford Univ., CA (United States). Dept. of Chemical Engineering
Eindhoven Univ. of Technology (Netherlands). Dept. of Applied Physics; Stanford Univ., CA (United States). Dept. of Chemical Engineering

Area-selective atomic layer deposition (ALD) is envisioned to play a key role in next-generation semiconductor processing and can also provide new opportunities in the field of catalysis. In this work, we developed an approach for the area-selective deposition of metal oxides on noble metals. Using O₂ gas as co-reactant, area-selective ALD has been achieved by relying on the catalytic dissociation of the oxygen molecules on the noble metal surface, while no deposition takes place on inert surfaces that do not dissociate oxygen (i.e., SiO₂, Al2O₃, Au). The process is demonstrated for selective deposition of iron oxide and nickel oxide on platinum and iridium substrates. Characterization by in situ spectroscopic ellipsometry, transmission electron microscopy, scanning Auger electron spectroscopy, and X-ray photoelectron spectroscopy confirms a very high degree of selectivity, with a constant ALD growth rate on the catalytic metal substrates and no deposition on inert substrates, even after 300 ALD cycles. We demonstrate the area-selective ALD approach on planar and patterned substrates and use it to prepare Pt/Fe₂O₃ core/shell nanoparticles. Finally, the approach is proposed to be extendable beyond the materials presented here, specifically to other metal oxide ALD processes for which the precursor requires a strong oxidizing agent for growth.

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Research Organization:: Stanford Univ., CA (United States)

Sponsoring Organization:: USDOE Office of Science (SC), Basic Energy Sciences (BES)

Grant/Contract Number:: SC0004782

OSTI ID:: 1499117

Alternate ID(s):: OSTI ID: 1508272

Journal Information:: Chemistry of Materials, Vol. 30, Issue 3; ISSN 0897-4756

Publisher:: American Chemical Society (ACS)Copyright Statement

Country of Publication:: United States

Language:: English

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Cited by: 86 works

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References (100)

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Stoichiometry of Nickel Oxide Films Prepared by ALD Bachmann, Julien; Zolotaryov, Andriy; Albrecht, Ole Chemical Vapor Deposition, Vol. 17, Issue 7-9 https://doi.org/10.1002/cvde.201004300	journal	September 2011
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Synthesis of vertically aligned single-walled carbon nanotubes with metallic chirality through facet control of catalysts Ohashi, Toshiyuki; Shima, Toshiyuki Carbon, Vol. 87 https://doi.org/10.1016/j.carbon.2015.02.051	journal	June 2015
Environmental transmission electron microscopy investigations of Pt-Fe2O3 nanoparticles for nucleating carbon nanotubes He, Maoshuai; Jin, Hua; Zhang, Lili Carbon, Vol. 110 https://doi.org/10.1016/j.carbon.2016.09.026	journal	December 2016
Electrocatalytic activity of atomic layer deposited Pt–Ru catalysts onto N-doped carbon nanotubes Johansson, Anne-Charlotte; Larsen, Jackie V.; Verheijen, Marcel A. Journal of Catalysis, Vol. 311 https://doi.org/10.1016/j.jcat.2014.01.001	journal	March 2014
Precisely-controlled synthesis of Au@Pd core–shell bimetallic catalyst via atomic layer deposition for selective oxidation of benzyl alcohol Wang, Hengwei; Wang, Chunlei; Yan, Huan Journal of Catalysis, Vol. 324 https://doi.org/10.1016/j.jcat.2015.01.019	journal	April 2015
Conformal ZnO coatings on high surface area silica gel using atomic layer deposition Libera, J. A.; Elam, J. W.; Pellin, M. J. Thin Solid Films, Vol. 516, Issue 18 https://doi.org/10.1016/j.tsf.2007.11.044	journal	July 2008
Atomic Layer Deposition of Wet-Etch Resistant Silicon Nitride Using Di( sec -butylamino)silane and N ₂ Plasma on Planar and 3D Substrate Topographies Faraz, Tahsin; van Drunen, Maarten; Knoops, Harm C. M. ACS Applied Materials & Interfaces, Vol. 9, Issue 2 https://doi.org/10.1021/acsami.6b12267	journal	January 2017
Inhibiting Metal Oxide Atomic Layer Deposition: Beyond Zinc Oxide Sampson, Matthew D.; Emery, Jonathan D.; Pellin, Michael J. ACS Applied Materials & Interfaces, Vol. 9, Issue 39 https://doi.org/10.1021/acsami.7b01410	journal	April 2017
Self-Correcting Process for High Quality Patterning by Atomic Layer Deposition Minaye Hashemi, Fatemeh Sadat; Prasittichai, Chaiya; Bent, Stacey F. ACS Nano, Vol. 9, Issue 9 https://doi.org/10.1021/acsnano.5b03125	journal	July 2015
Area-Selective Atomic Layer Deposition: Conformal Coating, Subnanometer Thickness Control, and Smart Positioning Fang, Ming; Ho, Johnny C. ACS Nano, Vol. 9, Issue 9 https://doi.org/10.1021/acsnano.5b05249	journal	September 2015
Catalytic Combustion and Dehydrogenation Reactions during Atomic Layer Deposition of Platinum Mackus, Adriaan J. M.; Leick, Noémi; Baker, Layton Chemistry of Materials, Vol. 24, Issue 10 https://doi.org/10.1021/cm203812v	journal	May 2012
Supported Core/Shell Bimetallic Nanoparticles Synthesis by Atomic Layer Deposition Weber, Matthieu J.; Mackus, Adriaan J. M.; Verheijen, Marcel A. Chemistry of Materials, Vol. 24, Issue 15 https://doi.org/10.1021/cm301206e	journal	August 2012
Catalyst Design with Atomic Layer Deposition O’Neill, Brandon J.; Jackson, David H. K.; Lee, Jechan ACS Catalysis, Vol. 5, Issue 3 https://doi.org/10.1021/cs501862h	journal	February 2015
Atomic Layer Deposition of Fe₂O₃ Using Ferrocene and Ozone Martinson, Alex B. F.; DeVries, Michael J.; Libera, Joseph A. The Journal of Physical Chemistry C, Vol. 115, Issue 10, p. 4333-4339 https://doi.org/10.1021/jp110203x	journal	February 2011
Direct-Write Atomic Layer Deposition of High-Quality Pt Nanostructures: Selective Growth Conditions and Seed Layer Requirements Mackus, A. J. M.; Thissen, N. F. W.; Mulders, J. J. L. The Journal of Physical Chemistry C, Vol. 117, Issue 20 https://doi.org/10.1021/jp402260j	journal	May 2013
A New Resist for Area Selective Atomic and Molecular Layer Deposition on Metal–Dielectric Patterns Hashemi, Fatemeh Sadat Minaye; Prasittichai, Chaiya; Bent, Stacey F. The Journal of Physical Chemistry C, Vol. 118, Issue 20 https://doi.org/10.1021/jp502669f	journal	May 2014
Reactant-Promoted Oxygen Dissociation on Gold Clusters Lyalin, Andrey; Taketsugu, Tetsuya The Journal of Physical Chemistry Letters, Vol. 1, Issue 12 https://doi.org/10.1021/jz100503j	journal	May 2010
Oriented Catalytic Platinum Nanoparticles on High Surface Area Strontium Titanate Nanocuboids Enterkin, James A.; Poeppelmeier, Kenneth R.; Marks, Laurence D. Nano Letters, Vol. 11, Issue 3 https://doi.org/10.1021/nl104263j	journal	March 2011
Toward atomically-precise synthesis of supported bimetallic nanoparticles using atomic layer deposition Lu, Junling; Low, Ke-Bin; Lei, Yu Nature Communications, Vol. 5, Issue 1 https://doi.org/10.1038/ncomms4264	journal	February 2014
Trends in electrocatalysis on extended and nanoscale Pt-bimetallic alloy surfaces Stamenkovic, Vojislav R.; Mun, Bongjin Simon; Arenz, Matthias Nature Materials, Vol. 6, Issue 3, p. 241-247 https://doi.org/10.1038/nmat1840	journal	February 2007
Controlled Synthesis of Pd/Pt Core Shell Nanoparticles Using Area-selective Atomic Layer Deposition Cao, Kun; Zhu, Qianqian; Shan, Bin Scientific Reports, Vol. 5, Issue 1 https://doi.org/10.1038/srep08470	journal	February 2015
Chemical synthesis of magnetic nanoparticles Hyeon, Taeghwan Chemical Communications, Issue 8 https://doi.org/10.1039/b207789b	journal	December 2002
Wall-number selective growth of vertically aligned carbon nanotubes from FePt catalysts: a comparative study with Fe catalysts Li, Shisheng; Hou, Pengxiang; Liu, Chang Journal of Materials Chemistry, Vol. 22, Issue 28 https://doi.org/10.1039/c2jm32270f	journal	January 2012
Surface reactions during atomic layer deposition of Pt derived from gas phase infrared spectroscopy Kessels, W. M. M.; Knoops, H. C. M.; Dielissen, S. A. F. Applied Physics Letters, Vol. 95, Issue 1 https://doi.org/10.1063/1.3176946	journal	July 2009
Local deposition of high-purity Pt nanostructures by combining electron beam induced deposition and atomic layer deposition Mackus, A. J. M.; Mulders, J. J. L.; van de Sanden, M. C. M. Journal of Applied Physics, Vol. 107, Issue 11 https://doi.org/10.1063/1.3431351	journal	June 2010
Atomic and molecular oxygen adsorbed on (111) transition metal surfaces: Cu and Ni López-Moreno, S.; Romero, A. H. The Journal of Chemical Physics, Vol. 142, Issue 15 https://doi.org/10.1063/1.4917259	journal	April 2015
In situ spectroscopic ellipsometry as a versatile tool for studying atomic layer deposition Langereis, E.; Heil, S. B. S.; Knoops, H. C. M. Journal of Physics D: Applied Physics, Vol. 42, Issue 7 https://doi.org/10.1088/0022-3727/42/7/073001	journal	March 2009
Selectivity of metal oxide atomic layer deposition on hydrogen terminated and oxidized Si(001)-(2×1) surface Longo, Roberto C.; McDonnell, Stephen; Dick, D. Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena, Vol. 32, Issue 3 https://doi.org/10.1116/1.4864619	journal	May 2014
Selective deposition of Ta 2 O 5 by adding plasma etching super-cycles in plasma enhanced atomic layer deposition steps Vallat, Rémi; Gassilloud, Rémy; Eychenne, Brice Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Vol. 35, Issue 1 https://doi.org/10.1116/1.4965966	journal	January 2017
Nanoengineering Heterogeneous Catalysts by Atomic Layer Deposition Singh, Joseph A.; Yang, Nuoya; Bent, Stacey F. Annual Review of Chemical and Biomolecular Engineering, Vol. 8, Issue 1 https://doi.org/10.1146/annurev-chembioeng-060816-101547	journal	June 2017
Reaction Mechanism Studies on Atomic Layer Deposition of Ruthenium and Platinum Aaltonen, Titta; Rahtu, Antti; Ritala, Mikko Electrochemical and Solid-State Letters, Vol. 6, Issue 9 https://doi.org/10.1149/1.1595312	journal	January 2003
Low-Temperature Deposition of TiN by Plasma-Assisted Atomic Layer Deposition Heil, S. B. S.; Langereis, E.; Roozeboom, F. Journal of The Electrochemical Society, Vol. 153, Issue 11 https://doi.org/10.1149/1.2344843	journal	January 2006
Remote Plasma Atomic Layer Deposition of Co ₃ O ₄ Thin Films Donders, Merijn E.; Knoops, Harm; Van de Sanden, M. C. ECS Transactions, Vol. 25, Issue 4 https://doi.org/10.1149/1.3205041	journal	September 2009

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