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Title: Chemical Vapor Deposition of Phase-Pure Uranium Dioxide Thin Films from Uranium(IV) Amidate Precursors

Abstract

Homoleptic uranium(IV) amidate complexes have been synthesized and applied as single-source molecular precursors for chemical vapor deposition of UO 2 thin films. These precursors decompose by alkene elimination to give highly crystalline, phase-pure UO 2 films with an unusual branched heterostructure.

Authors:
ORCiD logo [1];  [2];  [2];  [2];  [1];  [3];  [1];  [2]
  1. Univ. of California, Berkeley, CA (United States). Dept. of Chemistry; Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States). Heavy Element Chemistry Group, Chemical Sciences Division
  2. Univ. of Cologne (Germany). Inst. of Inorganic Chemistry
  3. Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States). Heavy Element Chemistry Group, Chemical Sciences Division
Publication Date:
Research Org.:
Univ. of California, Berkeley, CA (United States)
Sponsoring Org.:
USDOE
OSTI Identifier:
1497487
Alternate Identifier(s):
OSTI ID: 1505866
Grant/Contract Number:  
NA0003180; AC02-05CH11231
Resource Type:
Accepted Manuscript
Journal Name:
Angewandte Chemie (International Edition)
Additional Journal Information:
Journal Name: Angewandte Chemie (International Edition); Journal ID: ISSN 1433-7851
Publisher:
Wiley
Country of Publication:
United States
Language:
English
Subject:
37 INORGANIC, ORGANIC, PHYSICAL, AND ANALYTICAL CHEMISTRY; 36 MATERIALS SCIENCE

Citation Formats

Straub, Mark Daniel, Leduc, Jennifer, Frank, Michael, Raauf, Aida, Lohrey, Trevor, Minasian, Stefan, Arnold, John, and Mathur, Sanjay. Chemical Vapor Deposition of Phase-Pure Uranium Dioxide Thin Films from Uranium(IV) Amidate Precursors. United States: N. p., 2019. Web. doi:10.1002/anie.201901924.
Straub, Mark Daniel, Leduc, Jennifer, Frank, Michael, Raauf, Aida, Lohrey, Trevor, Minasian, Stefan, Arnold, John, & Mathur, Sanjay. Chemical Vapor Deposition of Phase-Pure Uranium Dioxide Thin Films from Uranium(IV) Amidate Precursors. United States. doi:10.1002/anie.201901924.
Straub, Mark Daniel, Leduc, Jennifer, Frank, Michael, Raauf, Aida, Lohrey, Trevor, Minasian, Stefan, Arnold, John, and Mathur, Sanjay. Thu . "Chemical Vapor Deposition of Phase-Pure Uranium Dioxide Thin Films from Uranium(IV) Amidate Precursors". United States. doi:10.1002/anie.201901924.
@article{osti_1497487,
title = {Chemical Vapor Deposition of Phase-Pure Uranium Dioxide Thin Films from Uranium(IV) Amidate Precursors},
author = {Straub, Mark Daniel and Leduc, Jennifer and Frank, Michael and Raauf, Aida and Lohrey, Trevor and Minasian, Stefan and Arnold, John and Mathur, Sanjay},
abstractNote = {Homoleptic uranium(IV) amidate complexes have been synthesized and applied as single-source molecular precursors for chemical vapor deposition of UO2 thin films. These precursors decompose by alkene elimination to give highly crystalline, phase-pure UO2 films with an unusual branched heterostructure.},
doi = {10.1002/anie.201901924},
journal = {Angewandte Chemie (International Edition)},
number = ,
volume = ,
place = {United States},
year = {2019},
month = {2}
}

Journal Article:
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This content will become publicly available on February 28, 2020
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