Chemical Vapor Deposition of Phase-Pure Uranium Dioxide Thin Films from Uranium(IV) Amidate Precursors
Abstract
We report that homoleptic uranium(IV) amidate complexes have been synthesized and applied as single-source molecular precursors for chemical vapor deposition of UO2 thin films. These precursors decompose by alkene elimination to give highly crystalline, phase-pure UO2 films with an unusual branched heterostructure.
- Authors:
-
[1];
- Univ. of California, Berkeley, CA (United States); Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States)
- Univ. of Cologne (Germany)
- Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States)
- Publication Date:
- Research Org.:
- University of California, Berkeley, CA (United States); Lawrence Berkeley National Laboratory (LBNL), Berkeley, CA (United States)
- Sponsoring Org.:
- USDOE Office of Science (SC), Basic Energy Sciences (BES). Chemical Sciences, Geosciences & Biosciences Division; USDOE
- OSTI Identifier:
- 1497487
- Alternate Identifier(s):
- OSTI ID: 1505866; OSTI ID: 1856499
- Grant/Contract Number:
- NA0003180; AC02-05CH11231
- Resource Type:
- Accepted Manuscript
- Journal Name:
- Angewandte Chemie (International Edition)
- Additional Journal Information:
- Journal Name: Angewandte Chemie (International Edition); Journal Volume: 58; Journal Issue: 17; Journal ID: ISSN 1433-7851
- Publisher:
- Wiley
- Country of Publication:
- United States
- Language:
- English
- Subject:
- 37 INORGANIC, ORGANIC, PHYSICAL, AND ANALYTICAL CHEMISTRY; 36 MATERIALS SCIENCE; uranium; inorganic materials; chemical vapor deposition; thin films; actinides
Citation Formats
Straub, Mark Daniel, Leduc, Jennifer, Frank, Michael, Raauf, Aida, Lohrey, Trevor D., Minasian, Stefan G., Arnold, John, and Mathur, Sanjay. Chemical Vapor Deposition of Phase-Pure Uranium Dioxide Thin Films from Uranium(IV) Amidate Precursors. United States: N. p., 2019.
Web. doi:10.1002/anie.201901924.
Straub, Mark Daniel, Leduc, Jennifer, Frank, Michael, Raauf, Aida, Lohrey, Trevor D., Minasian, Stefan G., Arnold, John, & Mathur, Sanjay. Chemical Vapor Deposition of Phase-Pure Uranium Dioxide Thin Films from Uranium(IV) Amidate Precursors. United States. https://doi.org/10.1002/anie.201901924
Straub, Mark Daniel, Leduc, Jennifer, Frank, Michael, Raauf, Aida, Lohrey, Trevor D., Minasian, Stefan G., Arnold, John, and Mathur, Sanjay. Thu .
"Chemical Vapor Deposition of Phase-Pure Uranium Dioxide Thin Films from Uranium(IV) Amidate Precursors". United States. https://doi.org/10.1002/anie.201901924. https://www.osti.gov/servlets/purl/1497487.
@article{osti_1497487,
title = {Chemical Vapor Deposition of Phase-Pure Uranium Dioxide Thin Films from Uranium(IV) Amidate Precursors},
author = {Straub, Mark Daniel and Leduc, Jennifer and Frank, Michael and Raauf, Aida and Lohrey, Trevor D. and Minasian, Stefan G. and Arnold, John and Mathur, Sanjay},
abstractNote = {We report that homoleptic uranium(IV) amidate complexes have been synthesized and applied as single-source molecular precursors for chemical vapor deposition of UO2 thin films. These precursors decompose by alkene elimination to give highly crystalline, phase-pure UO2 films with an unusual branched heterostructure.},
doi = {10.1002/anie.201901924},
journal = {Angewandte Chemie (International Edition)},
number = 17,
volume = 58,
place = {United States},
year = {Thu Feb 28 00:00:00 EST 2019},
month = {Thu Feb 28 00:00:00 EST 2019}
}
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Works referencing / citing this record:
Structural properties of ultra-small thorium and uranium dioxide nanoparticles embedded in a covalent organic framework
journal, January 2020
- Moreau, Liane M.; Herve, Alexandre; Straub, Mark D.
- Chemical Science, Vol. 11, Issue 18