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Title: Depth-graded Mo/Si multilayer coatings for hard x-rays

Abstract

This manuscript presents the first systematic study of non-periodic, broadband Mo/Si multilayer coatings with and without B4C interface barrier layers for hard x-ray applications with large field of view. The photon energy of operation in this work is 17.4 keV, the Mo Kα emission line. The coatings involve layers with varying thicknesses in the nanometer scale and the behavior at the layer interfaces plays a crucial role in their performance. Reflectivity measurements and modeling at 8.05 keV and 17.4 keV, Transmission Electron Microscopy (TEM), as well as thin film stress measurements, are employed to examine and optimize the reflective performance of these coatings and the physics of their constituent layers and interfaces. Mo/Si with B4C barrier layers on the Mo-on-Si interface is shown to produce the highest reflectivity among all design configurations considered in this work.

Authors:
; ; ; ; ; ;
Publication Date:
Research Org.:
Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)
Sponsoring Org.:
USDOE; LLNL Laboratory Directed Research and Development (LDRD) Program
OSTI Identifier:
1496913
Alternate Identifier(s):
OSTI ID: 1513155
Report Number(s):
LLNL-JRNL-760501
Journal ID: ISSN 1094-4087; OPEXFF
Grant/Contract Number:  
AC52-07NA27344
Resource Type:
Published Article
Journal Name:
Optics Express
Additional Journal Information:
Journal Name: Optics Express Journal Volume: 27 Journal Issue: 5; Journal ID: ISSN 1094-4087
Publisher:
Optical Society of America
Country of Publication:
United States
Language:
English
Subject:
47 OTHER INSTRUMENTATION; constructive interference; free electron lasers; hard x rays; laser beams; photon counting; thin films

Citation Formats

Burcklen, Catherine, Pardini, Tom, Alameda, Jennifer, Robinson, Jeff, Platonov, Yuriy, Walton, Chris, and Soufli, Regina. Depth-graded Mo/Si multilayer coatings for hard x-rays. United States: N. p., 2019. Web. doi:10.1364/OE.27.007291.
Burcklen, Catherine, Pardini, Tom, Alameda, Jennifer, Robinson, Jeff, Platonov, Yuriy, Walton, Chris, & Soufli, Regina. Depth-graded Mo/Si multilayer coatings for hard x-rays. United States. https://doi.org/10.1364/OE.27.007291
Burcklen, Catherine, Pardini, Tom, Alameda, Jennifer, Robinson, Jeff, Platonov, Yuriy, Walton, Chris, and Soufli, Regina. Wed . "Depth-graded Mo/Si multilayer coatings for hard x-rays". United States. https://doi.org/10.1364/OE.27.007291.
@article{osti_1496913,
title = {Depth-graded Mo/Si multilayer coatings for hard x-rays},
author = {Burcklen, Catherine and Pardini, Tom and Alameda, Jennifer and Robinson, Jeff and Platonov, Yuriy and Walton, Chris and Soufli, Regina},
abstractNote = {This manuscript presents the first systematic study of non-periodic, broadband Mo/Si multilayer coatings with and without B4C interface barrier layers for hard x-ray applications with large field of view. The photon energy of operation in this work is 17.4 keV, the Mo Kα emission line. The coatings involve layers with varying thicknesses in the nanometer scale and the behavior at the layer interfaces plays a crucial role in their performance. Reflectivity measurements and modeling at 8.05 keV and 17.4 keV, Transmission Electron Microscopy (TEM), as well as thin film stress measurements, are employed to examine and optimize the reflective performance of these coatings and the physics of their constituent layers and interfaces. Mo/Si with B4C barrier layers on the Mo-on-Si interface is shown to produce the highest reflectivity among all design configurations considered in this work.},
doi = {10.1364/OE.27.007291},
journal = {Optics Express},
number = 5,
volume = 27,
place = {United States},
year = {2019},
month = {2}
}

Journal Article:
Free Publicly Available Full Text
Publisher's Version of Record
https://doi.org/10.1364/OE.27.007291

Citation Metrics:
Cited by: 4 works
Citation information provided by
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Figures / Tables:

Figure 1 Figure 1: Reflectivity vs. incidence angle of Mo/Si multilayers (solid lines) at a photon energy of 17.4 keV. B4C barrier layers were inserted in some of the coatings at both interfaces (dashed lines) or at the Mo-on-Si interfaces only (dotted lines). All B4C barrier layers are 8 Å thick, exceptmore » for the samples marked with a dagger † (4 Å) or double dagger ‡ (6 Å). All black lines correspond to multilayers deposited at 2mTorr and all red lines to multilayers deposited at 1mTorr. The average reflectivity given here was calculated by extrapolating the model derived from 8.05 keV measurements. The three samples indicated with an asterisk* were also measured experimentally at 17.4 keV; their measurements are discussed in the following.« less

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