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Title: Depth-graded Mo/Si multilayer coatings for hard x-rays

Journal Article · · Optics Express
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  1. Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)
  2. Rigaku Innovative Technologies, Inc., Auburn Hills, MI (United States)

This manuscript presents the first systematic study of non-periodic, broadband Mo/Si multilayer coatings with and without B4C interface barrier layers for hard x-ray applications with large field of view. The photon energy of operation in this work is 17.4 keV, the Mo Kα emission line. The coatings involve layers with varying thicknesses in the nanometer scale and the behavior at the layer interfaces plays a crucial role in their performance. Reflectivity measurements and modeling at 8.05 keV and 17.4 keV, Transmission Electron Microscopy (TEM), as well as thin film stress measurements, are employed to examine and optimize the reflective performance of these coatings and the physics of their constituent layers and interfaces. Mo/Si with B4C barrier layers on the Mo-on-Si interface is shown to produce the highest reflectivity among all design configurations considered in this work.

Research Organization:
Lawrence Livermore National Laboratory (LLNL), Livermore, CA (United States)
Sponsoring Organization:
USDOE; LLNL Laboratory Directed Research and Development (LDRD) Program
Grant/Contract Number:
AC52-07NA27344
OSTI ID:
1496913
Alternate ID(s):
OSTI ID: 1513155
Report Number(s):
LLNL-JRNL-760501; 949088
Journal Information:
Optics Express, Vol. 27, Issue 5; ISSN 1094-4087
Publisher:
Optical Society of America (OSA)Copyright Statement
Country of Publication:
United States
Language:
English
Citation Metrics:
Cited by: 7 works
Citation information provided by
Web of Science

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Figures / Tables (13)