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Title: Depth-graded Mo/Si multilayer coatings for hard x-rays

Abstract

This manuscript presents the first systematic study of non-periodic, broadband Mo/Si multilayer coatings with and without B 4C interface barrier layers for hard x-ray applications with large field of view. The photon energy of operation in this work is 17.4 keV, the Mo Kα emission line. The coatings involve layers with varying thicknesses in the nanometer scale and the behavior at the layer interfaces plays a crucial role in their performance. Reflectivity measurements and modeling at 8.05 keV and 17.4 keV, Transmission Electron Microscopy (TEM), as well as thin film stress measurements, are employed to examine and optimize the reflective performance of these coatings and the physics of their constituent layers and interfaces. Mo/Si with B 4C barrier layers on the Mo-on-Si interface is shown to produce the highest reflectivity among all design configurations considered in this work.

Authors:
 [1];  [1];  [1];  [1];  [2];  [1];  [1]
  1. Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)
  2. Rigaku Innovative Technologies, Inc., Auburn Hills, MI (United States)
Publication Date:
Research Org.:
Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)
Sponsoring Org.:
USDOE; LLNL Laboratory Directed Research and Development (LDRD) Program
OSTI Identifier:
1496913
Alternate Identifier(s):
OSTI ID: 1513155
Report Number(s):
LLNL-JRNL-760501
Journal ID: ISSN 1094-4087; 949088
Grant/Contract Number:  
AC52-07NA27344
Resource Type:
Published Article
Journal Name:
Optics Express
Additional Journal Information:
Journal Volume: 27; Journal Issue: 5; Journal ID: ISSN 1094-4087
Publisher:
Optical Society of America (OSA)
Country of Publication:
United States
Language:
English
Subject:
constructive interference; free electron lasers; hard x rays; laser beams; photon counting; thin films

Citation Formats

Burcklen, Catherine, Pardini, Tom, Alameda, Jennifer, Robinson, Jeff, Platonov, Yuriy, Walton, Chris, and Soufli, Regina. Depth-graded Mo/Si multilayer coatings for hard x-rays. United States: N. p., 2019. Web. doi:10.1364/OE.27.007291.
Burcklen, Catherine, Pardini, Tom, Alameda, Jennifer, Robinson, Jeff, Platonov, Yuriy, Walton, Chris, & Soufli, Regina. Depth-graded Mo/Si multilayer coatings for hard x-rays. United States. doi:10.1364/OE.27.007291.
Burcklen, Catherine, Pardini, Tom, Alameda, Jennifer, Robinson, Jeff, Platonov, Yuriy, Walton, Chris, and Soufli, Regina. Wed . "Depth-graded Mo/Si multilayer coatings for hard x-rays". United States. doi:10.1364/OE.27.007291.
@article{osti_1496913,
title = {Depth-graded Mo/Si multilayer coatings for hard x-rays},
author = {Burcklen, Catherine and Pardini, Tom and Alameda, Jennifer and Robinson, Jeff and Platonov, Yuriy and Walton, Chris and Soufli, Regina},
abstractNote = {This manuscript presents the first systematic study of non-periodic, broadband Mo/Si multilayer coatings with and without B4C interface barrier layers for hard x-ray applications with large field of view. The photon energy of operation in this work is 17.4 keV, the Mo Kα emission line. The coatings involve layers with varying thicknesses in the nanometer scale and the behavior at the layer interfaces plays a crucial role in their performance. Reflectivity measurements and modeling at 8.05 keV and 17.4 keV, Transmission Electron Microscopy (TEM), as well as thin film stress measurements, are employed to examine and optimize the reflective performance of these coatings and the physics of their constituent layers and interfaces. Mo/Si with B4C barrier layers on the Mo-on-Si interface is shown to produce the highest reflectivity among all design configurations considered in this work.},
doi = {10.1364/OE.27.007291},
journal = {Optics Express},
number = 5,
volume = 27,
place = {United States},
year = {2019},
month = {2}
}

Journal Article:
Free Publicly Available Full Text
Publisher's Version of Record
DOI: 10.1364/OE.27.007291

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Works referenced in this record:

X-Ray Interactions: Photoabsorption, Scattering, Transmission, and Reflection at E = 50-30,000 eV, Z = 1-92
journal, July 1993

  • Henke, B. L.; Gullikson, E. M.; Davis, J. C.
  • Atomic Data and Nuclear Data Tables, Vol. 54, Issue 2, p. 181-342
  • DOI: 10.1006/adnd.1993.1013