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Title: Characterization of graphene-on-insulator films formed using plasma based surface chemistry

Authors:
; ; ; ;
Publication Date:
Sponsoring Org.:
USDOE
OSTI Identifier:
1496894
Grant/Contract Number:  
FEOO11300
Resource Type:
Publisher's Accepted Manuscript
Journal Name:
Carbon
Additional Journal Information:
Journal Name: Carbon Journal Volume: 99 Journal Issue: C; Journal ID: ISSN 0008-6223
Publisher:
Elsevier
Country of Publication:
United Kingdom
Language:
English

Citation Formats

Raghavan, S., Denig, T. J., Nelson, T. C., Chaudhari, S., and Stinespring, C. D. Characterization of graphene-on-insulator films formed using plasma based surface chemistry. United Kingdom: N. p., 2016. Web. doi:10.1016/j.carbon.2015.11.067.
Raghavan, S., Denig, T. J., Nelson, T. C., Chaudhari, S., & Stinespring, C. D. Characterization of graphene-on-insulator films formed using plasma based surface chemistry. United Kingdom. doi:10.1016/j.carbon.2015.11.067.
Raghavan, S., Denig, T. J., Nelson, T. C., Chaudhari, S., and Stinespring, C. D. Fri . "Characterization of graphene-on-insulator films formed using plasma based surface chemistry". United Kingdom. doi:10.1016/j.carbon.2015.11.067.
@article{osti_1496894,
title = {Characterization of graphene-on-insulator films formed using plasma based surface chemistry},
author = {Raghavan, S. and Denig, T. J. and Nelson, T. C. and Chaudhari, S. and Stinespring, C. D.},
abstractNote = {},
doi = {10.1016/j.carbon.2015.11.067},
journal = {Carbon},
number = C,
volume = 99,
place = {United Kingdom},
year = {2016},
month = {4}
}

Journal Article:
Free Publicly Available Full Text
Publisher's Version of Record
DOI: 10.1016/j.carbon.2015.11.067

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