Characterization of graphene-on-insulator films formed using plasma based surface chemistry
- Authors:
- Publication Date:
- Sponsoring Org.:
- USDOE
- OSTI Identifier:
- 1496894
- Grant/Contract Number:
- FEOO11300
- Resource Type:
- Publisher's Accepted Manuscript
- Journal Name:
- Carbon
- Additional Journal Information:
- Journal Name: Carbon Journal Volume: 99 Journal Issue: C; Journal ID: ISSN 0008-6223
- Publisher:
- Elsevier
- Country of Publication:
- United Kingdom
- Language:
- English
Citation Formats
Raghavan, S., Denig, T. J., Nelson, T. C., Chaudhari, S., and Stinespring, C. D. Characterization of graphene-on-insulator films formed using plasma based surface chemistry. United Kingdom: N. p., 2016.
Web. doi:10.1016/j.carbon.2015.11.067.
Raghavan, S., Denig, T. J., Nelson, T. C., Chaudhari, S., & Stinespring, C. D. Characterization of graphene-on-insulator films formed using plasma based surface chemistry. United Kingdom. https://doi.org/10.1016/j.carbon.2015.11.067
Raghavan, S., Denig, T. J., Nelson, T. C., Chaudhari, S., and Stinespring, C. D. Fri .
"Characterization of graphene-on-insulator films formed using plasma based surface chemistry". United Kingdom. https://doi.org/10.1016/j.carbon.2015.11.067.
@article{osti_1496894,
title = {Characterization of graphene-on-insulator films formed using plasma based surface chemistry},
author = {Raghavan, S. and Denig, T. J. and Nelson, T. C. and Chaudhari, S. and Stinespring, C. D.},
abstractNote = {},
doi = {10.1016/j.carbon.2015.11.067},
journal = {Carbon},
number = C,
volume = 99,
place = {United Kingdom},
year = {Fri Apr 01 00:00:00 EDT 2016},
month = {Fri Apr 01 00:00:00 EDT 2016}
}
Free Publicly Available Full Text
Publisher's Version of Record
https://doi.org/10.1016/j.carbon.2015.11.067
https://doi.org/10.1016/j.carbon.2015.11.067
Other availability
Cited by: 4 works
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