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Title: A perspective on two chemometrics tools: PCA and MCR, and introduction of a new one: Pattern recognition entropy (PRE), as applied to XPS and ToF-SIMS depth profiles of organic and inorganic materials

Authors:
; ; ; ; ; ; ; ;
Publication Date:
Sponsoring Org.:
USDOE
OSTI Identifier:
1495645
Resource Type:
Publisher's Accepted Manuscript
Journal Name:
Applied Surface Science
Additional Journal Information:
Journal Name: Applied Surface Science Journal Volume: 433 Journal Issue: C; Journal ID: ISSN 0169-4332
Publisher:
Elsevier
Country of Publication:
Netherlands
Language:
English

Citation Formats

Chatterjee, Shiladitya, Singh, Bhupinder, Diwan, Anubhav, Lee, Zheng Rong, Engelhard, Mark H., Terry, Jeff, Tolley, H. Dennis, Gallagher, Neal B., and Linford, Matthew R. A perspective on two chemometrics tools: PCA and MCR, and introduction of a new one: Pattern recognition entropy (PRE), as applied to XPS and ToF-SIMS depth profiles of organic and inorganic materials. Netherlands: N. p., 2018. Web. doi:10.1016/j.apsusc.2017.09.210.
Chatterjee, Shiladitya, Singh, Bhupinder, Diwan, Anubhav, Lee, Zheng Rong, Engelhard, Mark H., Terry, Jeff, Tolley, H. Dennis, Gallagher, Neal B., & Linford, Matthew R. A perspective on two chemometrics tools: PCA and MCR, and introduction of a new one: Pattern recognition entropy (PRE), as applied to XPS and ToF-SIMS depth profiles of organic and inorganic materials. Netherlands. doi:10.1016/j.apsusc.2017.09.210.
Chatterjee, Shiladitya, Singh, Bhupinder, Diwan, Anubhav, Lee, Zheng Rong, Engelhard, Mark H., Terry, Jeff, Tolley, H. Dennis, Gallagher, Neal B., and Linford, Matthew R. Thu . "A perspective on two chemometrics tools: PCA and MCR, and introduction of a new one: Pattern recognition entropy (PRE), as applied to XPS and ToF-SIMS depth profiles of organic and inorganic materials". Netherlands. doi:10.1016/j.apsusc.2017.09.210.
@article{osti_1495645,
title = {A perspective on two chemometrics tools: PCA and MCR, and introduction of a new one: Pattern recognition entropy (PRE), as applied to XPS and ToF-SIMS depth profiles of organic and inorganic materials},
author = {Chatterjee, Shiladitya and Singh, Bhupinder and Diwan, Anubhav and Lee, Zheng Rong and Engelhard, Mark H. and Terry, Jeff and Tolley, H. Dennis and Gallagher, Neal B. and Linford, Matthew R.},
abstractNote = {},
doi = {10.1016/j.apsusc.2017.09.210},
journal = {Applied Surface Science},
number = C,
volume = 433,
place = {Netherlands},
year = {2018},
month = {3}
}

Journal Article:
Free Publicly Available Full Text
Publisher's Version of Record
DOI: 10.1016/j.apsusc.2017.09.210

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