A perspective on two chemometrics tools: PCA and MCR, and introduction of a new one: Pattern recognition entropy (PRE), as applied to XPS and ToF-SIMS depth profiles of organic and inorganic materials
Journal Article
·
· Applied Surface Science
- Sponsoring Organization:
- USDOE
- OSTI ID:
- 1495645
- Journal Information:
- Applied Surface Science, Journal Name: Applied Surface Science Vol. 433 Journal Issue: C; ISSN 0169-4332
- Publisher:
- ElsevierCopyright Statement
- Country of Publication:
- Netherlands
- Language:
- English
Similar Records
ToF-SIMS Depth Profiling of Organic Delta Layers with Low-Energy Cesium Ions: Depth Resolution Assessment
A New Limitation of the Depth Resolution in TOF-SIMS Elemental Profiling: the Influence of a Probing Ion Beam
Argon Cluster Sputtering Source for ToF-SIMS Depth Profiling of Insulating Materials: High Sputter Rate and Accurate Interfacial Information
Journal Article
·
2019
· Journal of the American Society for Mass Spectrometry
·
OSTI ID:22925191
+1 more
A New Limitation of the Depth Resolution in TOF-SIMS Elemental Profiling: the Influence of a Probing Ion Beam
Journal Article
·
2018
· Technical Physics Letters
·
OSTI ID:22786481
+1 more
Argon Cluster Sputtering Source for ToF-SIMS Depth Profiling of Insulating Materials: High Sputter Rate and Accurate Interfacial Information
Journal Article
·
2015
· Journal of the American Society for Mass Spectrometry, 26(8):1283-1290
·
OSTI ID:1194287
+11 more