A perspective on two chemometrics tools: PCA and MCR, and introduction of a new one: Pattern recognition entropy (PRE), as applied to XPS and ToF-SIMS depth profiles of organic and inorganic materials

Chatterjee, Shiladitya; Singh, Bhupinder; Diwan, Anubhav; Lee, Zheng Rong; Engelhard, Mark H.; Terry, Jeff; Tolley, H. Dennis; Gallagher, Neal B.; Linford, Matthew R.

doi:10.1016/j.apsusc.2017.09.210

Title: A perspective on two chemometrics tools: PCA and MCR, and introduction of a new one: Pattern recognition entropy (PRE), as applied to XPS and ToF-SIMS depth profiles of organic and inorganic materials

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Authors:: Chatterjee, Shiladitya; Singh, Bhupinder; Diwan, Anubhav; Lee, Zheng Rong; Engelhard, Mark H.; Terry, Jeff; Tolley, H. Dennis; Gallagher, Neal B.; Linford, Matthew R.

Publication Date:: 2018-03-01

Sponsoring Org.:: USDOE

OSTI Identifier:: 1495645

Resource Type:: Publisher's Accepted Manuscript

Journal Name:: Applied Surface Science

Additional Journal Information:: Journal Name: Applied Surface Science Journal Volume: 433 Journal Issue: C; Journal ID: ISSN 0169-4332

Publisher:: Elsevier

Country of Publication:: Netherlands

Language:: English

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                    Chatterjee, Shiladitya, Singh, Bhupinder, Diwan, Anubhav, Lee, Zheng Rong, Engelhard, Mark H., Terry, Jeff, Tolley, H. Dennis, Gallagher, Neal B., and Linford, Matthew R. A perspective on two chemometrics tools: PCA and MCR, and introduction of a new one: Pattern recognition entropy (PRE), as applied to XPS and ToF-SIMS depth profiles of organic and inorganic materials.  Netherlands: N. p., 2018. 
Web.  doi:10.1016/j.apsusc.2017.09.210.

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                    Chatterjee, Shiladitya, Singh, Bhupinder, Diwan, Anubhav, Lee, Zheng Rong, Engelhard, Mark H., Terry, Jeff, Tolley, H. Dennis, Gallagher, Neal B., & Linford, Matthew R. A perspective on two chemometrics tools: PCA and MCR, and introduction of a new one: Pattern recognition entropy (PRE), as applied to XPS and ToF-SIMS depth profiles of organic and inorganic materials.  Netherlands.  https://doi.org/10.1016/j.apsusc.2017.09.210

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                    Chatterjee, Shiladitya, Singh, Bhupinder, Diwan, Anubhav, Lee, Zheng Rong, Engelhard, Mark H., Terry, Jeff, Tolley, H. Dennis, Gallagher, Neal B., and Linford, Matthew R. Thu .  
"A perspective on two chemometrics tools: PCA and MCR, and introduction of a new one: Pattern recognition entropy (PRE), as applied to XPS and ToF-SIMS depth profiles of organic and inorganic materials".  Netherlands.  https://doi.org/10.1016/j.apsusc.2017.09.210.

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@article{osti_1495645,

  title        = {A perspective on two chemometrics tools: PCA and MCR, and introduction of a new one: Pattern recognition entropy (PRE), as applied to XPS and ToF-SIMS depth profiles of organic and inorganic materials},

  author       = {Chatterjee, Shiladitya and Singh, Bhupinder and Diwan, Anubhav and Lee, Zheng Rong and Engelhard, Mark H. and Terry, Jeff and Tolley, H. Dennis and Gallagher, Neal B. and Linford, Matthew R.},

  abstractNote = {},

  doi          = {10.1016/j.apsusc.2017.09.210},

  journal      = {Applied Surface Science},

  number       = C,

  volume       = 433,

  place        = {Netherlands},

  year         = {2018},

  month        = {3}

}

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