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Title: Atomic layer deposition of 2D and 3D standards for synchrotron-based quantitative composition and structure analysis methods

Abstract

Atomic layer deposition (ALD) is a scalable deposition technique known for producing uniform, conformal films of a wide range of compounds on nearly any substrate material. These traits make it an ideal deposition method for producing films to replace the National Institute of Standards and Technology (NIST) standards and create Standard Reference Materials (SRMs) on a wide range of relevant two-dimensional and three-dimensional substrates. The use of SRM from NIST for quantitative analysis of chemical composition using synchrotron based x-ray fluorescence (SR-XRF) and scanning transmission x-ray microscopy (STXM) is common. Such standards, however, can suffer from inhomogeneity in chemical composition and thickness and often require further calculations, based on sample mounting and detector geometry, to obtain quantitative results. These inhomogeneities negatively impact the reproducibility of the measurements and the quantitative measure itself. Utilizing Rutherford backscattering, x-ray reflectivity, quartz crystal microbalance, STXM, and SR-XRF, the authors show here that ALD is capable of producing high quality standards that are homogenous over scales ranging from nanometers to 100s of micrometers.

Authors:
 [1];  [2];  [3];  [4];  [5];  [6];  [2];  [7]
  1. Illinois Inst. of Technology, Chicago, IL (United States). Physics Dept.
  2. Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States)
  3. European Synchrotron Radiation Facility (ESRF), Grenoble (France)
  4. Univ. of Chicago, Argonne, IL (United States). GSECARS
  5. Argonne National Lab. (ANL), Argonne, IL (United States). X-Ray Science Dept. Advanced Photon Source
  6. Argonne National Lab. (ANL), Argonne, IL (United States). Material Science Division
  7. Alternative Energies and Atomic Energy Commission (CEA), Saclay (France)
Publication Date:
Research Org.:
Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States); Argonne National Lab. (ANL), Argonne, IL (United States); Univ. of Chicago, Argonne, IL (United States)
Sponsoring Org.:
USDOE Office of Science (SC), High Energy Physics (HEP) (SC-25); USDOE Office of Science (SC), Basic Energy Sciences (BES) (SC-22); National Science Foundation (NSF)
OSTI Identifier:
1493253
Alternate Identifier(s):
OSTI ID: 1422434
Grant/Contract Number:  
AC02-05CH11231; AC02-06CH11357; FG02-94ER14466; EAR-1634415
Resource Type:
Accepted Manuscript
Journal Name:
Journal of Vacuum Science and Technology. A, Vacuum, Surfaces and Films
Additional Journal Information:
Journal Volume: 36; Journal Issue: 2; Journal ID: ISSN 0734-2101
Publisher:
American Vacuum Society
Country of Publication:
United States
Language:
English
Subject:
74 ATOMIC AND MOLECULAR PHYSICS; synchrotrons; Rutherford backscattering spectroscopy; X-ray microscopy; metal oxides; transition metals; multilayers; X-ray reflectivity; 3D printing; quartz crystal microbalance; atomic layer deposition

Citation Formats

Becker, Nicholas G., Butterworth, Anna L., Salome, Murielle, Sutton, Stephen R., De Andrade, Vincent, Sokolov, Andrey, Westphal, Andrew J., and Proslier, Thomas. Atomic layer deposition of 2D and 3D standards for synchrotron-based quantitative composition and structure analysis methods. United States: N. p., 2018. Web. doi:10.1116/1.5025240.
Becker, Nicholas G., Butterworth, Anna L., Salome, Murielle, Sutton, Stephen R., De Andrade, Vincent, Sokolov, Andrey, Westphal, Andrew J., & Proslier, Thomas. Atomic layer deposition of 2D and 3D standards for synchrotron-based quantitative composition and structure analysis methods. United States. doi:10.1116/1.5025240.
Becker, Nicholas G., Butterworth, Anna L., Salome, Murielle, Sutton, Stephen R., De Andrade, Vincent, Sokolov, Andrey, Westphal, Andrew J., and Proslier, Thomas. Fri . "Atomic layer deposition of 2D and 3D standards for synchrotron-based quantitative composition and structure analysis methods". United States. doi:10.1116/1.5025240. https://www.osti.gov/servlets/purl/1493253.
@article{osti_1493253,
title = {Atomic layer deposition of 2D and 3D standards for synchrotron-based quantitative composition and structure analysis methods},
author = {Becker, Nicholas G. and Butterworth, Anna L. and Salome, Murielle and Sutton, Stephen R. and De Andrade, Vincent and Sokolov, Andrey and Westphal, Andrew J. and Proslier, Thomas},
abstractNote = {Atomic layer deposition (ALD) is a scalable deposition technique known for producing uniform, conformal films of a wide range of compounds on nearly any substrate material. These traits make it an ideal deposition method for producing films to replace the National Institute of Standards and Technology (NIST) standards and create Standard Reference Materials (SRMs) on a wide range of relevant two-dimensional and three-dimensional substrates. The use of SRM from NIST for quantitative analysis of chemical composition using synchrotron based x-ray fluorescence (SR-XRF) and scanning transmission x-ray microscopy (STXM) is common. Such standards, however, can suffer from inhomogeneity in chemical composition and thickness and often require further calculations, based on sample mounting and detector geometry, to obtain quantitative results. These inhomogeneities negatively impact the reproducibility of the measurements and the quantitative measure itself. Utilizing Rutherford backscattering, x-ray reflectivity, quartz crystal microbalance, STXM, and SR-XRF, the authors show here that ALD is capable of producing high quality standards that are homogenous over scales ranging from nanometers to 100s of micrometers.},
doi = {10.1116/1.5025240},
journal = {Journal of Vacuum Science and Technology. A, Vacuum, Surfaces and Films},
number = 2,
volume = 36,
place = {United States},
year = {2018},
month = {2}
}

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