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Title: Electrodeposition of nanometer-thick epitaxial films of silver onto single-crystal silicon wafers

Abstract

Silver films were deposited epitaxially for the first time onto low-index, single-crystal silicon wafers through an electrochemical method in an aqueous silver acetate bath.

Authors:
ORCiD logo [1]; ORCiD logo [1]
  1. Missouri University of Science & Technology, Department of Chemistry and Graduate Center for Materials Research, Rolla, USA
Publication Date:
Sponsoring Org.:
USDOE Office of Science (SC), Basic Energy Sciences (BES) (SC-22)
OSTI Identifier:
1491913
Grant/Contract Number:  
FG02-08ER46518
Resource Type:
Publisher's Accepted Manuscript
Journal Name:
Journal of Materials Chemistry C
Additional Journal Information:
Journal Name: Journal of Materials Chemistry C Journal Volume: 7 Journal Issue: 6; Journal ID: ISSN 2050-7526
Publisher:
Royal Society of Chemistry (RSC)
Country of Publication:
United Kingdom
Language:
English

Citation Formats

Chen, Qingzhi, and Switzer, Jay A. Electrodeposition of nanometer-thick epitaxial films of silver onto single-crystal silicon wafers. United Kingdom: N. p., 2019. Web. doi:10.1039/C8TC06002A.
Chen, Qingzhi, & Switzer, Jay A. Electrodeposition of nanometer-thick epitaxial films of silver onto single-crystal silicon wafers. United Kingdom. doi:10.1039/C8TC06002A.
Chen, Qingzhi, and Switzer, Jay A. Thu . "Electrodeposition of nanometer-thick epitaxial films of silver onto single-crystal silicon wafers". United Kingdom. doi:10.1039/C8TC06002A.
@article{osti_1491913,
title = {Electrodeposition of nanometer-thick epitaxial films of silver onto single-crystal silicon wafers},
author = {Chen, Qingzhi and Switzer, Jay A.},
abstractNote = {Silver films were deposited epitaxially for the first time onto low-index, single-crystal silicon wafers through an electrochemical method in an aqueous silver acetate bath.},
doi = {10.1039/C8TC06002A},
journal = {Journal of Materials Chemistry C},
number = 6,
volume = 7,
place = {United Kingdom},
year = {2019},
month = {2}
}

Journal Article:
Free Publicly Available Full Text
Publisher's Version of Record
DOI: 10.1039/C8TC06002A

Citation Metrics:
Cited by: 2 works
Citation information provided by
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Works referenced in this record:

Nanometer-Thick Gold on Silicon as a Proxy for Single-Crystal Gold for the Electrodeposition of Epitaxial Cuprous Oxide Thin Films
journal, June 2016

  • Switzer, Jay A.; Hill, James C.; Mahenderkar, Naveen K.
  • ACS Applied Materials & Interfaces, Vol. 8, Issue 24
  • DOI: 10.1021/acsami.6b04552

Epitaxial Growth of Gold on HSi(111): The Determining Role of Hydrogen Evolution
journal, August 2010

  • Prodhomme, Patricia; Warren, Samantha; Cortès, Robert
  • ChemPhysChem, Vol. 11, Issue 13
  • DOI: 10.1002/cphc.201000236

A diffraction study of a heteroepitaxial system-Ag/Si(111)
journal, July 1991

  • Mckenna, D. C.; Wang, G. C.; Rajan, K.
  • Journal of Electronic Materials, Vol. 20, Issue 7
  • DOI: 10.1007/BF02665961

Plasmonic Nanolaser Using Epitaxially Grown Silver Film
journal, July 2012


Electrochemical growth of gold on well-defined vicinal H–Si(111) surfaces studied by AFM and XRD
journal, July 2003


Copper(I), silver(I) and gold(I) carboxylate complexes as precursors in chemical vapour deposition of thin metallic films
journal, November 2005

  • Grodzicki, A.; Łakomska, I.; Piszczek, P.
  • Coordination Chemistry Reviews, Vol. 249, Issue 21-22
  • DOI: 10.1016/j.ccr.2005.05.026

Morphology and grain structure evolution during epitaxial growth of Ag films on native-oxide-covered Si surface
journal, May 2008

  • Hur, Tae-Bong; Kim, Hong Koo; Perello, David
  • Journal of Applied Physics, Vol. 103, Issue 10
  • DOI: 10.1063/1.2924323

Intrinsic Optical Properties and Enhanced Plasmonic Response of Epitaxial Silver
journal, June 2014

  • Wu, Yanwen; Zhang, Chengdong; Estakhri, N. Mohammadi
  • Advanced Materials, Vol. 26, Issue 35
  • DOI: 10.1002/adma.201401474

The development of epitaxy of nanoclusters on lattice-mismatched substrates: Ag on H–Si surfaces
journal, November 2002


Epitaxy of (100) Cu on (100) Si by evaporation near room temperatures: In‐plane epitaxial relation and channeling analysis
journal, November 1990

  • Chang, Chin‐An; Liu, Joyce C.; Angilello, Joseph
  • Applied Physics Letters, Vol. 57, Issue 21
  • DOI: 10.1063/1.103902

Silver Deposition onto Modified Silicon Substrates
journal, March 2017

  • Duan, Yichen; Rani, Sana; Zhang, Yuying
  • The Journal of Physical Chemistry C, Vol. 121, Issue 13
  • DOI: 10.1021/acs.jpcc.6b12896

Engineering Epitaxial-Nanospiral Metal Films Using Dynamic Oblique Angle Deposition
journal, April 2013

  • Chen, Liang; Andrea, Luke; Timalsina, Yukta P.
  • Crystal Growth & Design, Vol. 13, Issue 5
  • DOI: 10.1021/cg400142g

Epitaxial growth of silver nanoislands on the surface of silicon nanowires in ambient air
journal, October 2014


Surface-selective deposition of palladium and silver films from metal-organic precursors: a novel metal-organic chemical vapor deposition redox transmetalation process
journal, December 1993

  • Lin, Wenbin; Warren, Timothy H.; Nuzzo, Ralph G.
  • Journal of the American Chemical Society, Vol. 115, Issue 24
  • DOI: 10.1021/ja00077a092

Photoelectrochemistry of Ultrathin, Semitransparent, and Catalytic Gold Films Electrodeposited Epitaxially onto n-Silicon (111)
journal, June 2018

  • Chen, Qingzhi; Switzer, Jay A.
  • ACS Applied Materials & Interfaces, Vol. 10, Issue 25
  • DOI: 10.1021/acsami.8b06388

Interface characterization of epitaxial Ag Films on Si(100) and Si(111) grown by molecular beam epitaxy
journal, September 1990

  • Park, K. -H.; Smith, G. A.; Rajan, K.
  • Metallurgical Transactions A, Vol. 21, Issue 9
  • DOI: 10.1007/BF02646979

Interpreting plasmonic response of epitaxial Ag/Si(100) island ensembles
journal, December 2015

  • Kong, Dexin; Jiang, Liying; Drucker, Jeff
  • Journal of Applied Physics, Vol. 118, Issue 21
  • DOI: 10.1063/1.4936620

Electrodeposited Epitaxial Cu(100) on Si(100) and Lift-Off of Single Crystal-like Cu(100) Foils
journal, October 2018

  • Hull, Caleb M.; Switzer, Jay A.
  • ACS Applied Materials & Interfaces, Vol. 10, Issue 44
  • DOI: 10.1021/acsami.8b13188

Role of Hydrogen Evolution during Epitaxial Electrodeposition of Fe on GaAs
journal, December 2017

  • Leistner, Karin; Duschek, Kenny; Zehner, Jonas
  • Journal of The Electrochemical Society, Vol. 165, Issue 4
  • DOI: 10.1149/2.0071804jes

First principles electronic structure of coincidence site epitaxial Ag/Si(111) interface
journal, December 2012

  • Abdul Wasey, A. H. M.; Batabyal, R.; Mahato, J. C.
  • physica status solidi (b), Vol. 250, Issue 7
  • DOI: 10.1002/pssb.201248542

Growth of Ag nanostructures on high-index Si (5 5 12) surfaces under UHV conditions: effect of prior surface treatment before deposition
journal, March 2016


Electrochemical growth of ultraflat Au(111) epitaxial buffer layers on H–Si(111)
journal, October 2008

  • Prod’homme, P.; Maroun, F.; Cortès, R.
  • Applied Physics Letters, Vol. 93, Issue 17
  • DOI: 10.1063/1.3006064

Differential expression of microRNAs during fiber development between fuzzless-lintless mutant and its wild-type allotetraploid cotton
journal, January 2017


Epitaxial growth of Ag films on native-oxide-covered Si substrates
journal, May 2007