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Title: Electrodeposition of nanometer-thick epitaxial films of silver onto single-crystal silicon wafers

Abstract

Silver films were deposited epitaxially for the first time onto low-index, single-crystal silicon wafers through an electrochemical method in an aqueous silver acetate bath.

Authors:
ORCiD logo [1]; ORCiD logo [1]
  1. Missouri University of Science & Technology, Department of Chemistry and Graduate Center for Materials Research, Rolla, USA
Publication Date:
Sponsoring Org.:
USDOE Office of Science (SC), Basic Energy Sciences (BES) (SC-22)
OSTI Identifier:
1491913
Grant/Contract Number:  
FG02-08ER46518
Resource Type:
Publisher's Accepted Manuscript
Journal Name:
Journal of Materials Chemistry C
Additional Journal Information:
Journal Name: Journal of Materials Chemistry C Journal Volume: 7 Journal Issue: 6; Journal ID: ISSN 2050-7526
Publisher:
Royal Society of Chemistry (RSC)
Country of Publication:
United Kingdom
Language:
English

Citation Formats

Chen, Qingzhi, and Switzer, Jay A. Electrodeposition of nanometer-thick epitaxial films of silver onto single-crystal silicon wafers. United Kingdom: N. p., 2019. Web. doi:10.1039/C8TC06002A.
Chen, Qingzhi, & Switzer, Jay A. Electrodeposition of nanometer-thick epitaxial films of silver onto single-crystal silicon wafers. United Kingdom. doi:10.1039/C8TC06002A.
Chen, Qingzhi, and Switzer, Jay A. Thu . "Electrodeposition of nanometer-thick epitaxial films of silver onto single-crystal silicon wafers". United Kingdom. doi:10.1039/C8TC06002A.
@article{osti_1491913,
title = {Electrodeposition of nanometer-thick epitaxial films of silver onto single-crystal silicon wafers},
author = {Chen, Qingzhi and Switzer, Jay A.},
abstractNote = {Silver films were deposited epitaxially for the first time onto low-index, single-crystal silicon wafers through an electrochemical method in an aqueous silver acetate bath.},
doi = {10.1039/C8TC06002A},
journal = {Journal of Materials Chemistry C},
number = 6,
volume = 7,
place = {United Kingdom},
year = {2019},
month = {2}
}

Journal Article:
Free Publicly Available Full Text
This content will become publicly available on January 12, 2020
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