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Title: Review of Recent Advances in Applications of Vapor-Phase Material Infiltration Based on Atomic Layer Deposition

Abstract

Polymer–inorganic hybrid nanocomposites exhibit enhanced material properties, combining the advantages of both their organic and inorganic subcomponents. Extensive research is being carried out to functionalize polymers towards various improved physicochemical characteristics such as electrical, optical, and mechanical properties for various applications. Vapor-phase material infiltration is an emerging hybridization route, derived from atomic layer deposition, which facilitates uniform incorporation of inorganic entities into a polymer matrix, leading to novel applications in fields such as microelectronics, energy storage, smart coatings, and smart fabrics. Recent advances in employing vapor-phase material infiltration as a hybridization and nanopatterning technique for various application avenues are reviewed.

Authors:
 [1];  [2]; ORCiD logo [3]
  1. Stony Brook Univ., NY (United States). Dept. of Materials Science and Chemical Engineering
  2. Brookhaven National Lab. (BNL), Upton, NY (United States). Center for Functional Nanomaterials
  3. Stony Brook Univ., NY (United States). Dept. of Materials Science and Chemical Engineering; Brookhaven National Lab. (BNL), Upton, NY (United States). Center for Functional Nanomaterials
Publication Date:
Research Org.:
Brookhaven National Lab. (BNL), Upton, NY (United States)
Sponsoring Org.:
USDOE Office of Science (SC), Basic Energy Sciences (BES) (SC-22)
OSTI Identifier:
1491681
Report Number(s):
BNL-210906-2019-JAAM
Journal ID: ISSN 1047-4838
Grant/Contract Number:  
SC0012704
Resource Type:
Accepted Manuscript
Journal Name:
JOM. Journal of the Minerals, Metals & Materials Society
Additional Journal Information:
Journal Volume: 71; Journal Issue: 1; Journal ID: ISSN 1047-4838
Publisher:
Springer
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE

Citation Formats

Subramanian, Ashwanth, Tiwale, Nikhil, and Nam, Chang-Yong. Review of Recent Advances in Applications of Vapor-Phase Material Infiltration Based on Atomic Layer Deposition. United States: N. p., 2018. Web. doi:10.1007/s11837-018-3141-4.
Subramanian, Ashwanth, Tiwale, Nikhil, & Nam, Chang-Yong. Review of Recent Advances in Applications of Vapor-Phase Material Infiltration Based on Atomic Layer Deposition. United States. doi:10.1007/s11837-018-3141-4.
Subramanian, Ashwanth, Tiwale, Nikhil, and Nam, Chang-Yong. Mon . "Review of Recent Advances in Applications of Vapor-Phase Material Infiltration Based on Atomic Layer Deposition". United States. doi:10.1007/s11837-018-3141-4. https://www.osti.gov/servlets/purl/1491681.
@article{osti_1491681,
title = {Review of Recent Advances in Applications of Vapor-Phase Material Infiltration Based on Atomic Layer Deposition},
author = {Subramanian, Ashwanth and Tiwale, Nikhil and Nam, Chang-Yong},
abstractNote = {Polymer–inorganic hybrid nanocomposites exhibit enhanced material properties, combining the advantages of both their organic and inorganic subcomponents. Extensive research is being carried out to functionalize polymers towards various improved physicochemical characteristics such as electrical, optical, and mechanical properties for various applications. Vapor-phase material infiltration is an emerging hybridization route, derived from atomic layer deposition, which facilitates uniform incorporation of inorganic entities into a polymer matrix, leading to novel applications in fields such as microelectronics, energy storage, smart coatings, and smart fabrics. Recent advances in employing vapor-phase material infiltration as a hybridization and nanopatterning technique for various application avenues are reviewed.},
doi = {10.1007/s11837-018-3141-4},
journal = {JOM. Journal of the Minerals, Metals & Materials Society},
number = 1,
volume = 71,
place = {United States},
year = {2018},
month = {9}
}

Journal Article:
Free Publicly Available Full Text
Publisher's Version of Record

Citation Metrics:
Cited by: 7 works
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Figures / Tables:

Fig. 1 Fig. 1: Schematic descriptions of temporal pressure profiles comparing the normal ALD (top), SIS (Middle), and SVI processes (Bottom), respectively. A (red) and B (blue) denote organometallic precursors and counter reactants (e.g., oxidants), respectively.

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    Works referencing / citing this record:

    Advancing next generation nanolithography with infiltration synthesis of hybrid nanocomposite resists
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