Thin film confinement reduces compatibility in symmetric ternary block copolymer/homopolymer blends

Uddin, Md Fakar; Jiang, Zhang; Raymond, Andrew; Goodson, Amy D.; Lwoya, Baraka S.; Albert, Julie N. L.

doi:10.1002/polb.24732

Title: Thin film confinement reduces compatibility in symmetric ternary block copolymer/homopolymer blends

Journal Article · 22 September 2018 · Journal of Polymer Science. Part B, Polymer Physics

DOI: https://doi.org/10.1002/polb.24732 · OSTI ID:1490075

Uddin, Md Fakar ^[1]; Jiang, Zhang ^[2]; Raymond, Andrew ^[1]; Goodson, Amy D. ^[1]; Lwoya, Baraka S. ^[1];

^[1]

Tulane Univ., New Orleans, LA (United States)
Argonne National Lab. (ANL), Argonne, IL (United States)

Here, the thin film phase behavior of ternary blends consisting of symmetric poly(styrene) (PS)–b–poly(dimethylsiloxane)(PDMS), PS, and PDMS was investigated using X–ray reflectivity (XRR) and atomic force microscopy (AFM). This system is strongly segregated, and the homopolymers are approximately the same length as the corresponding blocks of the copolymer. The XRR and AFM data are used to quantify changes in domain spacing (L) and morphology evolution with increasing homopolymer content (Φ _H). In 100 nm thick films, from Φ _H = 0 to 0.20, the system maintains a perfect parallel lamellar structure and domains swell as predicted based on theory; however, from Φ _H = 0.30 to 0.50, a morphology transition to a “dot pattern” morphology (tentatively identified as perforated lamellae) and mixed morphologies were observed before macrophase separation. In thicker films, dot patterns were observed for a broad range of Φ _H before macrophase separation. The absence of the bicontinuous microemulsion phase reported for bulk blends and thin films of perpendicular lamellae and the presence of dot patterns/perforated lamellae are attributed to preferential migration of the PDMS homopolymer to the wetting layers located at the substrate and free air interfaces, which leads to an asymmetric composition within the film and morphology transition.

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Research Organization:: Argonne National Lab. (ANL), Argonne, IL (United States)

Sponsoring Organization:: USDOE Office of Science (SC), Basic Energy Sciences (BES) (SC-22)

Grant/Contract Number:: AC02-06CH11357

OSTI ID:: 1490075

Alternate ID(s):: OSTI ID: 1472190

Journal Information:: Journal of Polymer Science. Part B, Polymer Physics, Journal Name: Journal of Polymer Science. Part B, Polymer Physics Journal Issue: 21 Vol. 56; ISSN 0887-6266

Publisher:: WileyCopyright Statement

Country of Publication:: United States

Language:: English

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