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Title: On the kinetics of the removal of ligands from films of colloidal nanocrystals by plasmas

Abstract

This paper describes the kinetic limitations of etching ligands from colloidal nanocrystal assemblies (CNAs) by plasma processing.

Authors:
 [1];  [2];  [1];  [3];  [1];  [4];  [2]; ORCiD logo [3]; ORCiD logo [5]
  1. Department of Materials Science & Engineering, Iowa State University of Science and Technology, Ames, USA
  2. Instituto de Física da Universidade de São Paulo, 05508-090 São Paulo, Brazil
  3. Department of Chemistry, Iowa State University of Science and Technology, Ames, USA
  4. Michigan Ion Beam Laboratory, University of Michigan, Ann Arbor, USA
  5. Department of Materials Science & Engineering, Iowa State University of Science and Technology, Ames, USA, Department of Chemical & Biological Engineering
Publication Date:
Sponsoring Org.:
USDOE Office of Science (SC), Basic Energy Sciences (BES) (SC-22)
OSTI Identifier:
1489850
Grant/Contract Number:  
AC02-07CH11358
Resource Type:
Publisher's Accepted Manuscript
Journal Name:
Physical Chemistry Chemical Physics. PCCP (Print)
Additional Journal Information:
Journal Name: Physical Chemistry Chemical Physics. PCCP (Print) Journal Volume: 21 Journal Issue: 3; Journal ID: ISSN 1463-9076
Publisher:
Royal Society of Chemistry (RSC)
Country of Publication:
United Kingdom
Language:
English

Citation Formats

Shaw, Santosh, Silva, Tiago F., Mohapatra, Pratyasha, Mendivelso-Perez, Deyny, Tian, Xinchun, Naab, Fabian, Rodrigues, Cleber L., Smith, Emily A., and Cademartiri, Ludovico. On the kinetics of the removal of ligands from films of colloidal nanocrystals by plasmas. United Kingdom: N. p., 2019. Web. doi:10.1039/C8CP06890A.
Shaw, Santosh, Silva, Tiago F., Mohapatra, Pratyasha, Mendivelso-Perez, Deyny, Tian, Xinchun, Naab, Fabian, Rodrigues, Cleber L., Smith, Emily A., & Cademartiri, Ludovico. On the kinetics of the removal of ligands from films of colloidal nanocrystals by plasmas. United Kingdom. doi:10.1039/C8CP06890A.
Shaw, Santosh, Silva, Tiago F., Mohapatra, Pratyasha, Mendivelso-Perez, Deyny, Tian, Xinchun, Naab, Fabian, Rodrigues, Cleber L., Smith, Emily A., and Cademartiri, Ludovico. Thu . "On the kinetics of the removal of ligands from films of colloidal nanocrystals by plasmas". United Kingdom. doi:10.1039/C8CP06890A.
@article{osti_1489850,
title = {On the kinetics of the removal of ligands from films of colloidal nanocrystals by plasmas},
author = {Shaw, Santosh and Silva, Tiago F. and Mohapatra, Pratyasha and Mendivelso-Perez, Deyny and Tian, Xinchun and Naab, Fabian and Rodrigues, Cleber L. and Smith, Emily A. and Cademartiri, Ludovico},
abstractNote = {This paper describes the kinetic limitations of etching ligands from colloidal nanocrystal assemblies (CNAs) by plasma processing.},
doi = {10.1039/C8CP06890A},
journal = {Physical Chemistry Chemical Physics. PCCP (Print)},
number = 3,
volume = 21,
place = {United Kingdom},
year = {2019},
month = {1}
}

Journal Article:
Free Publicly Available Full Text
Publisher's Version of Record
DOI: 10.1039/C8CP06890A

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Cited by: 1 work
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