On the kinetics of the removal of ligands from films of colloidal nanocrystals by plasmas

Shaw, Santosh; Silva, Tiago F.; Mohapatra, Pratyasha; Mendivelso-Perez, Deyny; Tian, Xinchun; Naab, Fabian; Rodrigues, Cleber L.; Smith, Emily A.; Cademartiri, Ludovico

doi:10.1039/C8CP06890A

Title: On the kinetics of the removal of ligands from films of colloidal nanocrystals by plasmas

Journal Article · 17 January 2019 · Physical Chemistry Chemical Physics. PCCP

DOI: https://doi.org/10.1039/C8CP06890A · OSTI ID:1489850

Shaw, Santosh ^[1]; Silva, Tiago F. ^[2]; Mohapatra, Pratyasha ^[1]; Mendivelso-Perez, Deyny ^[3]; Tian, Xinchun ^[1]; Naab, Fabian ^[4]; Rodrigues, Cleber L. ^[2];

^[3];

^[5]

Department of Materials Science & Engineering, Iowa State University of Science and Technology, Ames, USA
Instituto de Física da Universidade de São Paulo, 05508-090 São Paulo, Brazil
Department of Chemistry, Iowa State University of Science and Technology, Ames, USA
Michigan Ion Beam Laboratory, University of Michigan, Ann Arbor, USA
Department of Materials Science & Engineering, Iowa State University of Science and Technology, Ames, USA, Department of Chemical & Biological Engineering

This paper describes the kinetic limitations of etching ligands from colloidal nanocrystal assemblies (CNAs) by plasma processing.

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Sponsoring Organization:: USDOE Office of Science (SC), Basic Energy Sciences (BES)

Grant/Contract Number:: AC02-07CH11358

OSTI ID:: 1489850

Journal Information:: Physical Chemistry Chemical Physics. PCCP, Journal Name: Physical Chemistry Chemical Physics. PCCP Journal Issue: 3 Vol. 21; ISSN 1463-9076; ISSN PPCPFQ

Publisher:: Royal Society of Chemistry (RSC)Copyright Statement

Country of Publication:: United Kingdom

Language:: English

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