Gallium, neon and helium focused ion beam milling of thin films demonstrated for polymeric materials: study of implantation artifacts

Allen, Frances I.; Velez, Nathan R.; Thayer, Rachel C.; Patel, Nipam H.; Jones, Mary Ann; Meyers, Gregory F.; Minor, Andrew M.

doi:10.1039/C8NR08224C

Title: Gallium, neon and helium focused ion beam milling of thin films demonstrated for polymeric materials: study of implantation artifacts

Journal Article · 16 January 2019 · Nanoscale

DOI: https://doi.org/10.1039/C8NR08224C · OSTI ID:1489414

^[1]; Velez, Nathan R. ^[1]; Thayer, Rachel C. ^[2]; Patel, Nipam H. ^[3]; Jones, Mary Ann ^[4]; Meyers, Gregory F. ^[4]; Minor, Andrew M. ^[1]

Department of Materials Science and Engineering, Berkeley, USA, National Center for Electron Microscopy, Molecular Foundry
Department of Integrative Biology, Berkeley, USA
Department of Integrative Biology, Berkeley, USA, Department of Molecular and Cell Biology, Berkeley
Core R&D - Analytical Sciences, The Dow Chemical Company, Midland, USA

The focused helium ion beam is ideally suited to precision milling of thin films avoiding implantation artifacts.

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Sponsoring Organization:: USDOE

Grant/Contract Number:: AC02-05CH11231

OSTI ID:: 1489414

Journal Information:: Nanoscale, Journal Name: Nanoscale Journal Issue: 3 Vol. 11; ISSN NANOHL; ISSN 2040-3364

Publisher:: Royal Society of Chemistry (RSC)Copyright Statement

Country of Publication:: United Kingdom

Language:: English

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