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Title: Degradation of ultra-thin boron films in air

Corrosion of B films in air can limit their practical applications. Here, we study the evolution of the elemental composition, thickness, and morphology of 10–100-nm-thick amorphous B films sputter-deposited onto glassy carbon substrates and stored under different conditions. Results show that films with thicknesses of ≳55 nm have expected excellent corrosion resistance during storage in laboratory air at room temperature over several months. In contrast, ≲45-nm-thick films exhibit pronounced degradation upon air exposure, starting with a change in the composition to ~30 and ~50 at.% of O and H, respectively. After such an O and H uptake, the degradation proceeds via mass loss with a characteristic time constant of ~5 days in air at room temperature. In conclusion, a post-deposition annealing at 1000 °C in an inert atmosphere makes all the films corrosion resistant.
Authors:
 [1] ;  [1] ;  [1] ;  [1] ;  [1] ;  [1] ;  [1]
  1. Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)
Publication Date:
Report Number(s):
LLNL-JRNL-744456
Journal ID: ISSN 0169-4332; 898599
Grant/Contract Number:
AC52-07NA27344
Type:
Accepted Manuscript
Journal Name:
Applied Surface Science
Additional Journal Information:
Journal Volume: 448; Journal Issue: C; Journal ID: ISSN 0169-4332
Publisher:
Elsevier
Research Org:
Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)
Sponsoring Org:
USDOE National Nuclear Security Administration (NNSA)
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; Boron; Oxidation; Thin films; Rutherford backscattering spectroscopy; AFM
OSTI Identifier:
1488780

Bayu Aji, L. B., Baker, A. A., Bae, J. H., Hiszpanski, A. M., Stavrou, E., McCall, S. K., and Kucheyev, S. O.. Degradation of ultra-thin boron films in air. United States: N. p., Web. doi:10.1016/j.apsusc.2018.04.126.
Bayu Aji, L. B., Baker, A. A., Bae, J. H., Hiszpanski, A. M., Stavrou, E., McCall, S. K., & Kucheyev, S. O.. Degradation of ultra-thin boron films in air. United States. doi:10.1016/j.apsusc.2018.04.126.
Bayu Aji, L. B., Baker, A. A., Bae, J. H., Hiszpanski, A. M., Stavrou, E., McCall, S. K., and Kucheyev, S. O.. 2018. "Degradation of ultra-thin boron films in air". United States. doi:10.1016/j.apsusc.2018.04.126. https://www.osti.gov/servlets/purl/1488780.
@article{osti_1488780,
title = {Degradation of ultra-thin boron films in air},
author = {Bayu Aji, L. B. and Baker, A. A. and Bae, J. H. and Hiszpanski, A. M. and Stavrou, E. and McCall, S. K. and Kucheyev, S. O.},
abstractNote = {Corrosion of B films in air can limit their practical applications. Here, we study the evolution of the elemental composition, thickness, and morphology of 10–100-nm-thick amorphous B films sputter-deposited onto glassy carbon substrates and stored under different conditions. Results show that films with thicknesses of ≳55 nm have expected excellent corrosion resistance during storage in laboratory air at room temperature over several months. In contrast, ≲45-nm-thick films exhibit pronounced degradation upon air exposure, starting with a change in the composition to ~30 and ~50 at.% of O and H, respectively. After such an O and H uptake, the degradation proceeds via mass loss with a characteristic time constant of ~5 days in air at room temperature. In conclusion, a post-deposition annealing at 1000 °C in an inert atmosphere makes all the films corrosion resistant.},
doi = {10.1016/j.apsusc.2018.04.126},
journal = {Applied Surface Science},
number = C,
volume = 448,
place = {United States},
year = {2018},
month = {4}
}