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This content will become publicly available on December 4, 2019

Title: Effect of processing conditions on additive DISC patterning of P3HT films

There is a critical need to develop a method to pattern semiconducting polymers for device applications on the sub-micrometer scale.
Authors:
ORCiD logo [1] ;  [1] ;  [1] ; ORCiD logo [1] ; ORCiD logo [1] ; ORCiD logo [2] ; ORCiD logo [2] ;  [3] ; ORCiD logo [3] ; ORCiD logo [1]
  1. Department of Chemical Engineering, University of California, Davis, USA
  2. Department of Materials Science and Engineering, University of California, Davis, USA
  3. Department of Chemistry, University of California, Davis, USA
Publication Date:
Grant/Contract Number:
SC0010419
Type:
Publisher's Accepted Manuscript
Journal Name:
Journal of Materials Chemistry C
Additional Journal Information:
Journal Name: Journal of Materials Chemistry C Journal Volume: 7 Journal Issue: 2; Journal ID: ISSN 2050-7526
Publisher:
Royal Society of Chemistry (RSC)
Sponsoring Org:
USDOE Office of Science (SC), Basic Energy Sciences (BES) (SC-22)
Country of Publication:
United Kingdom
Language:
English
OSTI Identifier:
1485730

Li, Jun, Holm, Daniella M., Guda, Shravya, Bedolla-Valdez, Zaira I., Gonel, Goktug, Jacobs, Ian E., Dettmann, Makena A., Saska, Jan, Mascal, Mark, and Moulé, Adam J.. Effect of processing conditions on additive DISC patterning of P3HT films. United Kingdom: N. p., Web. doi:10.1039/C8TC04519D.
Li, Jun, Holm, Daniella M., Guda, Shravya, Bedolla-Valdez, Zaira I., Gonel, Goktug, Jacobs, Ian E., Dettmann, Makena A., Saska, Jan, Mascal, Mark, & Moulé, Adam J.. Effect of processing conditions on additive DISC patterning of P3HT films. United Kingdom. doi:10.1039/C8TC04519D.
Li, Jun, Holm, Daniella M., Guda, Shravya, Bedolla-Valdez, Zaira I., Gonel, Goktug, Jacobs, Ian E., Dettmann, Makena A., Saska, Jan, Mascal, Mark, and Moulé, Adam J.. 2019. "Effect of processing conditions on additive DISC patterning of P3HT films". United Kingdom. doi:10.1039/C8TC04519D.
@article{osti_1485730,
title = {Effect of processing conditions on additive DISC patterning of P3HT films},
author = {Li, Jun and Holm, Daniella M. and Guda, Shravya and Bedolla-Valdez, Zaira I. and Gonel, Goktug and Jacobs, Ian E. and Dettmann, Makena A. and Saska, Jan and Mascal, Mark and Moulé, Adam J.},
abstractNote = {There is a critical need to develop a method to pattern semiconducting polymers for device applications on the sub-micrometer scale.},
doi = {10.1039/C8TC04519D},
journal = {Journal of Materials Chemistry C},
number = 2,
volume = 7,
place = {United Kingdom},
year = {2019},
month = {1}
}

Works referenced in this record:

Influence of Molecular Weight Distribution on the Gelation of P3HT and Its Impact on the Photovoltaic Performance
journal, July 2009
  • Koppe, Markus; Brabec, Christoph J.; Heiml, Sabrina
  • Macromolecules, Vol. 42, Issue 13, p. 4661-4666
  • DOI: 10.1021/ma9005445