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Title: The Effects of Plating Current, Grain Size, and Electrolyte on Stress Evolution in Electrodeposited Ni

Journal Article · · Journal of the Electrochemical Society

Not Available

Sponsoring Organization:
USDOE National Nuclear Security Administration (NNSA)
Grant/Contract Number:
NA0003525
OSTI ID:
1484836
Journal Information:
Journal of the Electrochemical Society, Journal Name: Journal of the Electrochemical Society Journal Issue: 1 Vol. 166; ISSN 0013-4651
Publisher:
The Electrochemical SocietyCopyright Statement
Country of Publication:
United States
Language:
English

References (28)

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Measurements of the intrinsic stress in thin metal films journal January 1990
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Grain growth and complex stress evolution during Volmer–Weber growth of polycrystalline thin films journal April 2014
Mechanics of compressive stress evolution during thin film growth journal November 2003
Origins of residual stress in thin films: Interaction between microstructure and growth kinetics journal November 2016
Influence of lower current densities on the residual stress and structure of thick nickel electrodeposits journal March 2011
A kinetic analysis of residual stress evolution in polycrystalline thin films journal December 2012
Thin Film Materials book July 2010
Mechanisms inducing compressive stress during electrodeposition of Ni journal January 2005
Measurements of stress during vapor deposition of copper and silver thin films and multilayers journal December 1996
Tutorial: Understanding residual stress in polycrystalline thin films through real-time measurements and physical models journal May 2016
Kinetic model for thin film stress including the effect of grain growth journal May 2018
Stresses and deformation processes in thin films on substrates journal January 1988
The intrinsic stress of polycrystalline and epitaxial thin metal films journal November 1994
Compressive Stress Generation in Sn Thin Films and the Role of Grain Boundary Diffusion journal July 2009
Origin of Compressive Residual Stress in Polycrystalline Thin Films journal March 2002
Compressive Stress in Polycrystalline Volmer-Weber Films journal April 2005
Influence of apparatus geometry and deposition conditions on the structure and topography of thick sputtered coatings journal July 1974
Grain Growth and Stress Relief in Thin Films journal January 1972
Microstructural evolution during film growth journal September 2003
Boric Acid as a Catalyst in Nickel Plating Solutions journal January 1987
On the Role of Boric Acid in the Watts Bath journal January 1986
Effects of Process Conditions on Properties of Electroplated Ni Thin Films for Microsystem Applications journal January 2006
Microstructural Origins of Saccharin-Induced Stress Reduction in Electrodeposited Ni journal January 2009
Residual Stress in Electrodeposited Cu Thin Films: Understanding the Combined Effects of Growth Rate and Grain Size journal January 2017

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