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Title: Thickness scaling of pyroelectric response in thin ferroelectric Hf 1-xZr xO2 films

Abstract

In this study, the scaling of polarization and pyroelectric response across a thickness series (5–20 nm) of Hf0.58Zr0.42O2 films with TaN electrodes was characterized. Reduction in thickness from 20 nm to 5 nm resulted in a decreased remanent polarization from 17 to 2.8 μC cm-2. Accompanying the decreased remanent polarization was an increased absolute pyroelectric coefficient, from 30 to 58 μC m-2 K-1. The pyroelectric response of the 5 nm film was unstable and decreased logarithmically with time, while that of 10 nm and thicker films was stable over a time scale of >300 h at room temperature. Finally, the sign of the pyroelectric response was irreversible with differing polarity of poling bias for the 5 nm thick film, indicating that the enhanced pyroelectric response was of electret origins, whereas the pyroelectric response in thicker films was consistent with a crystallographic origin.

Authors:
 [1];  [1];  [1];  [1]; ORCiD logo [2]
  1. Sandia National Lab. (SNL-NM), Albuquerque, NM (United States)
  2. Sandia National Lab. (SNL-NM), Albuquerque, NM (United States); Univ. of Virginia, Charlottesville, VA (United States). Department of Materials Science and Engineering and Charles L. Brown Department of Electrical and Computer Engineering
Publication Date:
Research Org.:
Sandia National Lab. (SNL-NM), Albuquerque, NM (United States)
Sponsoring Org.:
USDOE National Nuclear Security Administration (NNSA)
OSTI Identifier:
1483977
Report Number(s):
SAND-2018-12973J
Journal ID: ISSN 0003-6951; 669783
Grant/Contract Number:  
AC04-94AL85000; NA0003525
Resource Type:
Accepted Manuscript
Journal Name:
Applied Physics Letters
Additional Journal Information:
Journal Volume: 113; Journal Issue: 18; Journal ID: ISSN 0003-6951
Publisher:
American Institute of Physics (AIP)
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE

Citation Formats

Smith, Sean W., Henry, M. David, Brumbach, Michael T., Rodriguez, Mark A., and Ihlefeld, Jon F. Thickness scaling of pyroelectric response in thin ferroelectric Hf 1-xZr xO2 films. United States: N. p., 2018. Web. doi:10.1063/1.5045635.
Smith, Sean W., Henry, M. David, Brumbach, Michael T., Rodriguez, Mark A., & Ihlefeld, Jon F. Thickness scaling of pyroelectric response in thin ferroelectric Hf 1-xZr xO2 films. United States. doi:https://doi.org/10.1063/1.5045635
Smith, Sean W., Henry, M. David, Brumbach, Michael T., Rodriguez, Mark A., and Ihlefeld, Jon F. Thu . "Thickness scaling of pyroelectric response in thin ferroelectric Hf 1-xZr xO2 films". United States. doi:https://doi.org/10.1063/1.5045635. https://www.osti.gov/servlets/purl/1483977.
@article{osti_1483977,
title = {Thickness scaling of pyroelectric response in thin ferroelectric Hf 1-xZr xO2 films},
author = {Smith, Sean W. and Henry, M. David and Brumbach, Michael T. and Rodriguez, Mark A. and Ihlefeld, Jon F.},
abstractNote = {In this study, the scaling of polarization and pyroelectric response across a thickness series (5–20 nm) of Hf0.58Zr0.42O2 films with TaN electrodes was characterized. Reduction in thickness from 20 nm to 5 nm resulted in a decreased remanent polarization from 17 to 2.8 μC cm-2. Accompanying the decreased remanent polarization was an increased absolute pyroelectric coefficient, from 30 to 58 μC m-2 K-1. The pyroelectric response of the 5 nm film was unstable and decreased logarithmically with time, while that of 10 nm and thicker films was stable over a time scale of >300 h at room temperature. Finally, the sign of the pyroelectric response was irreversible with differing polarity of poling bias for the 5 nm thick film, indicating that the enhanced pyroelectric response was of electret origins, whereas the pyroelectric response in thicker films was consistent with a crystallographic origin.},
doi = {10.1063/1.5045635},
journal = {Applied Physics Letters},
number = 18,
volume = 113,
place = {United States},
year = {2018},
month = {11}
}

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    Works referencing / citing this record:

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