Polymer–metal coating for high contrast SEM cross sections at the deep nanoscale

Staaks, Daniel; Olynick, Deirdre L.; Rangelow, Ivo W.; Altoe, M. Virginia P.

doi:10.1039/C8NR06669H

Title: Polymer–metal coating for high contrast SEM cross sections at the deep nanoscale

Abstract

A new composite sample preparation method for high contrast cross-sectional SEM imaging.

Authors:

^[1]; Olynick, Deirdre L. ^[2];

^[3];

^[2]

Molecular Foundry, Lawrence Berkeley National Laboratory, Berkeley, USA, Ilmenau Univ. of Technology
Molecular Foundry, Lawrence Berkeley National Laboratory, Berkeley, USA
Ilmenau Univ. of Technology, Dept. of Micro- and Nanoelectronic Systems, 98684, Germany

Publication Date:: 2018-12-13

Sponsoring Org.:: USDOE

OSTI Identifier:: 1483903

Grant/Contract Number:: AC02-05CH11231

Resource Type:: Publisher's Accepted Manuscript

Journal Name:: Nanoscale

Additional Journal Information:: Journal Name: Nanoscale Journal Volume: 10 Journal Issue: 48; Journal ID: ISSN 2040-3364

Publisher:: Royal Society of Chemistry (RSC)

Country of Publication:: United Kingdom

Language:: English

Citation Formats


                    Staaks, Daniel, Olynick, Deirdre L., Rangelow, Ivo W., and Altoe, M. Virginia P.. Polymer–metal coating for high contrast SEM cross sections at the deep nanoscale.  United Kingdom: N. p., 2018. 
Web.  doi:10.1039/C8NR06669H.

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                    Staaks, Daniel, Olynick, Deirdre L., Rangelow, Ivo W., & Altoe, M. Virginia P.. Polymer–metal coating for high contrast SEM cross sections at the deep nanoscale.  United Kingdom.  https://doi.org/10.1039/C8NR06669H

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                    Staaks, Daniel, Olynick, Deirdre L., Rangelow, Ivo W., and Altoe, M. Virginia P.. Thu .  
"Polymer–metal coating for high contrast SEM cross sections at the deep nanoscale".  United Kingdom.  https://doi.org/10.1039/C8NR06669H.

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@article{osti_1483903,

  title        = {Polymer–metal coating for high contrast SEM cross sections at the deep nanoscale},

  author       = {Staaks, Daniel and Olynick, Deirdre L. and Rangelow, Ivo W. and Altoe, M. Virginia P.},

  abstractNote = {A new composite sample preparation method for high contrast cross-sectional SEM imaging.},

  doi          = {10.1039/C8NR06669H},

  journal      = {Nanoscale},

  number       = 48,

  volume       = 10,

  place        = {United Kingdom},

  year         = {2018},

  month        = {12}

}

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Works referenced in this record:

Secondary electron emission yield behaviour of polymers
journal, September 1973

Willis, R. F.; Skinner, D. K.
Solid State Communications, Vol. 13, Issue 6
DOI: 10.1016/0038-1098(73)90459-6

Advanced scanning probe lithography
journal, August 2014

Garcia, Ricardo; Knoll, Armin W.; Riedo, Elisa
Nature Nanotechnology, Vol. 9, Issue 8
DOI: 10.1038/nnano.2014.157

Contrast in complex images
journal, January 1990

Peli, Eli
Journal of the Optical Society of America A, Vol. 7, Issue 10
DOI: 10.1364/JOSAA.7.002032

Theoretical study of the ultimate resolution of SEM
journal, June 1989

Ze-Jun, Ding; Shimizu, Ryuichi
Journal of Microscopy, Vol. 154, Issue 3
DOI: 10.1111/j.1365-2818.1989.tb00582.x

The surface potential barrier in secondary emission from semiconductors
journal, October 1980

Bouchard, C.; Carette, J. D.
Surface Science, Vol. 100, Issue 1
DOI: 10.1016/0039-6028(80)90456-2

Multigate transistors as the future of classical metal–oxide–semiconductor field-effect transistors
journal, November 2011

Ferain, Isabelle; Colinge, Cynthia A.; Colinge, Jean-Pierre
Nature, Vol. 479, Issue 7373
DOI: 10.1038/nature10676

Advanced Lithography for Bit Patterned Media
journal, February 2009

XiaoMin Yang,
IEEE Transactions on Magnetics, Vol. 45, Issue 2
DOI: 10.1109/TMAG.2008.2010647

Atomic Layer Deposition Assisted Pattern Multiplication of Block Copolymer Lithography for 5 nm Scale Nanopatterning
journal, April 2014

Moon, Hyoung-Seok; Kim, Ju Young; Jin, Hyeong Min
Advanced Functional Materials, Vol. 24, Issue 27
DOI: 10.1002/adfm.201304248

Secondary electron emission due to primary and backscattered electrons
journal, September 1972

Kanaya, K.; Kawakatsu, H.
Journal of Physics D: Applied Physics, Vol. 5, Issue 9
DOI: 10.1088/0022-3727/5/9/330

Single digit nanofabrication by step-and-repeat nanoimprint lithography
journal, December 2011

Peroz, C.; Dhuey, S.; Cornet, M.
Nanotechnology, Vol. 23, Issue 1
DOI: 10.1088/0957-4484/23/1/015305

A new examination of secondary electron yield data
journal, January 2005

Lin, Yinghong; Joy, David C.
Surface and Interface Analysis, Vol. 37, Issue 11
DOI: 10.1002/sia.2107

Low-voltage, high-resolution scanning electron microscopy: a new characterization technique for polymer morphology
journal, April 1995

Vezie, Deborah L.; Thomas, Edwin L.; Adams, W. Wade
Polymer, Vol. 36, Issue 9
DOI: 10.1016/0032-3861(95)90923-P

Charging Effect of Specimen in Scanning Electron Microscopy
journal, August 1974

Ichinokawa, Takeo; Iiyama, Masato; Onoguchi, Akira
Japanese Journal of Applied Physics, Vol. 13, Issue 8
DOI: 10.1143/JJAP.13.1272

The scanning electron microscope and its fields of application
journal, November 1955

Smith, K. C. A.; Oatley, C. W.
British Journal of Applied Physics, Vol. 6, Issue 11
DOI: 10.1088/0508-3443/6/11/304

Block Copolymer Lithography: Periodic Arrays of 10¹¹ Holes in 1 Square Centimeter
journal, May 1997

Park, Miri; Harrison, Christopher; Chaikin, Paul M.
Science, Vol. 276, Issue 5317, p. 1401-1404
DOI: 10.1126/science.276.5317.1401

Sub-10-nm patterning via directed self-assembly of block copolymer films with a vapour-phase deposited topcoat
journal, March 2017

Suh, Hyo Seon; Kim, Do Han; Moni, Priya
Nature Nanotechnology, Vol. 12, Issue 6
DOI: 10.1038/nnano.2017.34

Epitaxial self-assembly of block copolymers on lithographically defined nanopatterned substrates
journal, July 2003

Ouk Kim, Sang; Solak, Harun H.; Stoykovich, Mark P.
Nature, Vol. 424, Issue 6947, p. 411-414
DOI: 10.1038/nature01775

Low temperature dry etching of chromium towards control at sub-5 nm dimensions
journal, September 2016

Staaks, Daniel; Yang, XiaoMin; Lee, Kim Y.
Nanotechnology, Vol. 27, Issue 41
DOI: 10.1088/0957-4484/27/41/415302

Measuring contrast sensitivity
journal, September 2013

Pelli, Denis G.; Bex, Peter
Vision Research, Vol. 90
DOI: 10.1016/j.visres.2013.04.015

Alternative Sample Preparation Method for Large-Area Cross-Section View Observation of Lithium Ion Battery
journal, June 2017

Kim, Ji-Young; Jeong, Young Woo; Cho, Hye Young
Applied Microscopy, Vol. 47, Issue 2
DOI: 10.9729/AM.2017.47.2.77

Range of 1-10 kev Electrons in Solids
journal, January 1960

Feldman, Charles
Physical Review, Vol. 117, Issue 2
DOI: 10.1103/PhysRev.117.455

Three-dimensional electron microscopy simulation with the CASINO Monte Carlo software
journal, May 2011

Demers, Hendrix; Poirier-Demers, Nicolas; Couture, Alexandre Réal
Scanning, Vol. 33, Issue 3
DOI: 10.1002/sca.20262

Secondary electron emission from insulators
journal, December 1978

Kanaya, K.; Ono, S.; Ishigaki, F.
Journal of Physics D: Applied Physics, Vol. 11, Issue 17
DOI: 10.1088/0022-3727/11/17/015

Sub-10 nm patterning using EUV interference lithography
journal, August 2011

Päivänranta, Birgit; Langner, Andreas; Kirk, Eugenie
Nanotechnology, Vol. 22, Issue 37
DOI: 10.1088/0957-4484/22/37/375302

Scanning electron microscope metrology
conference, July 2017

Postek, Michael T.
Critical Review Collection, SPIE Proceedings
DOI: 10.1117/12.187461

Escape depth of secondary electrons from electron-irradiated polymers
journal, January 1992

Hessel, R.; Gross, B.
IEEE Transactions on Electrical Insulation, Vol. 27, Issue 4
DOI: 10.1109/14.155806

Secondary electron emission in the scanning electron microscope
journal, November 1983

Seiler, H.
Journal of Applied Physics, Vol. 54, Issue 11
DOI: 10.1063/1.332840

Overview of CD-SEM — and beyond
conference, January 2003

Joy, David C.
CHARACTERIZATION AND METROLOGY FOR ULSI TECHNOLOGY: 2003 International Conference on Characterization and Metrology for ULSI Technology, AIP Conference Proceedings
DOI: 10.1063/1.1622536

The theory and practice of high-resolution scanning electron microscopy
journal, August 1991

Joy, David C.
Ultramicroscopy, Vol. 37, Issue 1-4
DOI: 10.1016/0304-3991(91)90020-7

Solid-State Protonation and Electrical Conductivity of Polyaniline
journal, April 1998

Stejskal, Jaroslav; Sapurina, Irina; Trchová, Miroslava
Macromolecules, Vol. 31, Issue 7
DOI: 10.1021/ma970823h

Spatial frequency, phase, and the contrast of natural images
journal, January 2002

Bex, Peter J.; Makous, Walter
Journal of the Optical Society of America A, Vol. 19, Issue 6
DOI: 10.1364/JOSAA.19.001096

Photographic tone reproduction for digital images
journal, July 2002

Reinhard, Erik; Stark, Michael; Shirley, Peter
ACM Transactions on Graphics, Vol. 21, Issue 3
DOI: 10.1145/566654.566575

Pushing the limits of lithography
journal, August 2000

Ito, Takashi; Okazaki, Shinji
Nature, Vol. 406, Issue 6799
DOI: 10.1038/35023233

Critical tasks in high aspect ratio silicon dry etching for microelectromechanical systems
journal, July 2003

Rangelow, Ivo W.
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Vol. 21, Issue 4
DOI: 10.1116/1.1580488

Technique for preparation of precise wafer cross sections and applications to electron beam lithography of poly(methylmethacrylate) resist
journal, January 2002

Hu, Wenchuang; Orlova, Tatyana; Bernstein, Gary H.
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, Vol. 20, Issue 6
DOI: 10.1116/1.1518020

Low voltage scanning electron microscopy
journal, June 1996

Joy, David C.; Joy, Carolyn S.
Micron, Vol. 27, Issue 3-4
DOI: 10.1016/0968-4328(96)00023-6

Triblock Copolymer Syntheses of Mesoporous Silica with Periodic 50 to 300 Angstrom Pores
journal, January 1998

Zhao, Dongyuan; Feng, Jianglin; Huo, Qisheng
Science, Vol. 279, Issue 5350, p. 548-552
DOI: 10.1126/science.279.5350.548

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Title: Polymer–metal coating for high contrast SEM cross sections at the deep nanoscale

Abstract

Citation Formats

Secondary electron emission yield behaviour of polymers journal, September 1973

Advanced scanning probe lithography journal, August 2014

Contrast in complex images journal, January 1990

Theoretical study of the ultimate resolution of SEM journal, June 1989

The surface potential barrier in secondary emission from semiconductors journal, October 1980

Multigate transistors as the future of classical metal–oxide–semiconductor field-effect transistors journal, November 2011

Advanced Lithography for Bit Patterned Media journal, February 2009

Atomic Layer Deposition Assisted Pattern Multiplication of Block Copolymer Lithography for 5 nm Scale Nanopatterning journal, April 2014

Secondary electron emission due to primary and backscattered electrons journal, September 1972

Single digit nanofabrication by step-and-repeat nanoimprint lithography journal, December 2011

A new examination of secondary electron yield data journal, January 2005

Low-voltage, high-resolution scanning electron microscopy: a new characterization technique for polymer morphology journal, April 1995

Charging Effect of Specimen in Scanning Electron Microscopy journal, August 1974

The scanning electron microscope and its fields of application journal, November 1955

Block Copolymer Lithography: Periodic Arrays of 1011 Holes in 1 Square Centimeter journal, May 1997

Sub-10-nm patterning via directed self-assembly of block copolymer films with a vapour-phase deposited topcoat journal, March 2017

Epitaxial self-assembly of block copolymers on lithographically defined nanopatterned substrates journal, July 2003

Low temperature dry etching of chromium towards control at sub-5 nm dimensions journal, September 2016

Measuring contrast sensitivity journal, September 2013

Alternative Sample Preparation Method for Large-Area Cross-Section View Observation of Lithium Ion Battery journal, June 2017

Range of 1-10 kev Electrons in Solids journal, January 1960

Three-dimensional electron microscopy simulation with the CASINO Monte Carlo software journal, May 2011

Secondary electron emission from insulators journal, December 1978

Sub-10 nm patterning using EUV interference lithography journal, August 2011

Scanning electron microscope metrology conference, July 2017

Escape depth of secondary electrons from electron-irradiated polymers journal, January 1992

Secondary electron emission in the scanning electron microscope journal, November 1983

Overview of CD-SEM — and beyond conference, January 2003

The theory and practice of high-resolution scanning electron microscopy journal, August 1991

Solid-State Protonation and Electrical Conductivity of Polyaniline journal, April 1998

Spatial frequency, phase, and the contrast of natural images journal, January 2002

Photographic tone reproduction for digital images journal, July 2002

Pushing the limits of lithography journal, August 2000

Critical tasks in high aspect ratio silicon dry etching for microelectromechanical systems journal, July 2003

Technique for preparation of precise wafer cross sections and applications to electron beam lithography of poly(methylmethacrylate) resist journal, January 2002

Low voltage scanning electron microscopy journal, June 1996

Triblock Copolymer Syntheses of Mesoporous Silica with Periodic 50 to 300 Angstrom Pores journal, January 1998

Secondary electron emission yield behaviour of polymers
journal, September 1973

Advanced scanning probe lithography
journal, August 2014

Contrast in complex images
journal, January 1990

Theoretical study of the ultimate resolution of SEM
journal, June 1989

The surface potential barrier in secondary emission from semiconductors
journal, October 1980

Multigate transistors as the future of classical metal–oxide–semiconductor field-effect transistors
journal, November 2011

Advanced Lithography for Bit Patterned Media
journal, February 2009

Atomic Layer Deposition Assisted Pattern Multiplication of Block Copolymer Lithography for 5 nm Scale Nanopatterning
journal, April 2014

Secondary electron emission due to primary and backscattered electrons
journal, September 1972

Single digit nanofabrication by step-and-repeat nanoimprint lithography
journal, December 2011

A new examination of secondary electron yield data
journal, January 2005

Low-voltage, high-resolution scanning electron microscopy: a new characterization technique for polymer morphology
journal, April 1995

Charging Effect of Specimen in Scanning Electron Microscopy
journal, August 1974

The scanning electron microscope and its fields of application
journal, November 1955

Block Copolymer Lithography: Periodic Arrays of 10¹¹ Holes in 1 Square Centimeter
journal, May 1997

Sub-10-nm patterning via directed self-assembly of block copolymer films with a vapour-phase deposited topcoat
journal, March 2017

Epitaxial self-assembly of block copolymers on lithographically defined nanopatterned substrates
journal, July 2003

Low temperature dry etching of chromium towards control at sub-5 nm dimensions
journal, September 2016

Measuring contrast sensitivity
journal, September 2013

Alternative Sample Preparation Method for Large-Area Cross-Section View Observation of Lithium Ion Battery
journal, June 2017

Range of 1-10 kev Electrons in Solids
journal, January 1960

Three-dimensional electron microscopy simulation with the CASINO Monte Carlo software
journal, May 2011

Secondary electron emission from insulators
journal, December 1978

Sub-10 nm patterning using EUV interference lithography
journal, August 2011

Scanning electron microscope metrology
conference, July 2017

Escape depth of secondary electrons from electron-irradiated polymers
journal, January 1992

Secondary electron emission in the scanning electron microscope
journal, November 1983

Overview of CD-SEM — and beyond
conference, January 2003

The theory and practice of high-resolution scanning electron microscopy
journal, August 1991

Solid-State Protonation and Electrical Conductivity of Polyaniline
journal, April 1998

Spatial frequency, phase, and the contrast of natural images
journal, January 2002

Photographic tone reproduction for digital images
journal, July 2002

Pushing the limits of lithography
journal, August 2000

Critical tasks in high aspect ratio silicon dry etching for microelectromechanical systems
journal, July 2003

Technique for preparation of precise wafer cross sections and applications to electron beam lithography of poly(methylmethacrylate) resist
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Low voltage scanning electron microscopy
journal, June 1996

Triblock Copolymer Syntheses of Mesoporous Silica with Periodic 50 to 300 Angstrom Pores
journal, January 1998