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Title: Atomic layer deposition for membrane interface engineering

Atomic layer deposition represents a burgeoning and appealing technique for membrane interface engineering.
Authors:
ORCiD logo [1] ; ORCiD logo [2] ; ORCiD logo [3] ; ORCiD logo [2]
  1. School of Chemical Engineering and Technology, Sun Yat-Sen University, Zhuhai, China
  2. Institute for Molecular Engineering, University of Chicago, Chicago, USA, Chemical Sciences and Engineering Division
  3. Center for Nanoscale Materials, Argonne National Laboratory, Lemont, USA
Publication Date:
Type:
Publisher's Accepted Manuscript
Journal Name:
Nanoscale
Additional Journal Information:
Journal Name: Nanoscale Journal Volume: 10 Journal Issue: 44; Journal ID: ISSN 2040-3364
Publisher:
Royal Society of Chemistry (RSC)
Sponsoring Org:
USDOE Office of Science (SC), Basic Energy Sciences (BES) (SC-22)
Country of Publication:
United Kingdom
Language:
English
OSTI Identifier:
1481029

Yang, Hao-Cheng, Waldman, Ruben Z., Chen, Zhaowei, and Darling, Seth B.. Atomic layer deposition for membrane interface engineering. United Kingdom: N. p., Web. doi:10.1039/C8NR08114J.
Yang, Hao-Cheng, Waldman, Ruben Z., Chen, Zhaowei, & Darling, Seth B.. Atomic layer deposition for membrane interface engineering. United Kingdom. doi:10.1039/C8NR08114J.
Yang, Hao-Cheng, Waldman, Ruben Z., Chen, Zhaowei, and Darling, Seth B.. 2018. "Atomic layer deposition for membrane interface engineering". United Kingdom. doi:10.1039/C8NR08114J.
@article{osti_1481029,
title = {Atomic layer deposition for membrane interface engineering},
author = {Yang, Hao-Cheng and Waldman, Ruben Z. and Chen, Zhaowei and Darling, Seth B.},
abstractNote = {Atomic layer deposition represents a burgeoning and appealing technique for membrane interface engineering.},
doi = {10.1039/C8NR08114J},
journal = {Nanoscale},
number = 44,
volume = 10,
place = {United Kingdom},
year = {2018},
month = {11}
}

Works referenced in this record:

Atomic layer deposition (ALD): from precursors to thin film structures
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A Route to Nanoscopic Materials via Sequential Infiltration Synthesis on Block Copolymer Templates
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  • Peng, Qing; Tseng, Yu-Chih; Darling, Seth B.
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  • DOI: 10.1021/nn2003234

Atomic Layer Deposition Chemistry Recent Developments and Future Challenges
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  • DOI: 10.1002/anie.200301652

Enhanced Block Copolymer Lithography Using Sequential Infiltration Synthesis
journal, July 2011
  • Tseng, Yu-Chih; Peng, Qing; Ocola, Leonidas E.
  • The Journal of Physical Chemistry C, Vol. 115, Issue 36, p. 17725-17729
  • DOI: 10.1021/jp205532e

Atomic Layer Deposition: An Overview
journal, January 2010
  • George, Steven M.
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  • DOI: 10.1021/cr900056b