Resolution in Carrier Profiling Semiconductors by Scanning Spreading Resistance Microscopy and Scanning Frequency Comb Microscopy
- NewPath Research L.L.C., Salt Lake City, UT (United States)
- Mu’tah University, Al-Karak (Jordan)
- Los Alamos National Lab. (LANL), Los Alamos, NM (United States)
High resolution measurements of the carrier profile in semiconductor devices is required as the semiconductor industry progresses from the 10-nm lithography node to 7-nm and beyond. We examine the factors which determine the resolution of the present method of scanning spreading resistance microscopy as well as such factors for the newer method of scanning frequency comb microscopy that is now under development. Also, for the first time, we consider the sensitivity of both methods to the location of heterogeneities in the semiconductor. In addition, mesoscopic effects on these measurements are considered for the first time. Two simple analytical models are extended to study the sensitivity to heterogeneities as well as mesoscopic effects.
- Research Organization:
- Los Alamos National Laboratory (LANL), Los Alamos, NM (United States)
- Sponsoring Organization:
- USDOE Office of Science (SC), Basic Energy Sciences (BES); USDOE National Nuclear Security Administration (NNSA)
- Grant/Contract Number:
- AC52-06NA25396; SC0006339
- OSTI ID:
- 1479944
- Report Number(s):
- LA-UR-18-29738
- Journal Information:
- Applied Microscopy, Vol. 47, Issue 3; ISSN 2287-5123
- Publisher:
- Korean Society of MicroscopyCopyright Statement
- Country of Publication:
- United States
- Language:
- English
Simulation of sub-nm carrier profiling by scanning frequency comb microscopy
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journal | May 2019 |
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