Mechanical, thermal, and electrochemical properties of Pr doped ceria from wafer curvature measurements

Ma, Yuxi; Nicholas, Jason D.

doi:10.1039/C8CP04802A

Title: Mechanical, thermal, and electrochemical properties of Pr doped ceria from wafer curvature measurements

Journal Article · 07 November 2018 · Physical Chemistry Chemical Physics. PCCP

DOI: https://doi.org/10.1039/C8CP04802A · OSTI ID:1479831

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Department of Chemical Engineering and Materials Science, Michigan State University, East Lansing, USA

This work demonstrates, for the first time, that a variety of disparate and technologically-relevent thermal, mechanical, and electrochemical oxygen-exchange material properties can all be obtained from in situ , current-collector-free wafer curvature measurements.

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Sponsoring Organization:: USDOE Office of Fossil Energy and Carbon Management (FECM)

Grant/Contract Number:: FE0023315

OSTI ID:: 1479831

Journal Information:: Physical Chemistry Chemical Physics. PCCP, Journal Name: Physical Chemistry Chemical Physics. PCCP Vol. 20 Journal Issue: 43; ISSN 1463-9076

Publisher:: Royal Society of Chemistry (RSC)Copyright Statement

Country of Publication:: United Kingdom

Language:: English

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Cited by: 7 works

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