Title: Highly parallel scanning tunneling microscope based hydrogen depassivation lithography

Journal Article · · Journal of Vacuum Science and Technology B
DOI: https://doi.org/10.1116/1.5047939 · OSTI ID:1479598
 [1];  [1];  [1];  [1];  [1];  [2];  [2];  [3]
  1. Zyvex Labs, 1301 North Plano Road, Richardson, Texas 75081
  2. Systems Engineering Department, University of Texas at Dallas, 800 W. Campbell Road, Richardson, Texas 75080
  3. Electrical Engineering Department, University of Texas at Dallas, 800 W. Campbell Road, Richardson, Texas 75080

Not Available

Sponsoring Organization:
USDOE
Grant/Contract Number:
EE0008322
OSTI ID:
1479598
Journal Information:
Journal of Vacuum Science and Technology B, Journal Name: Journal of Vacuum Science and Technology B Journal Issue: 6 Vol. 36; ISSN 2166-2746
Publisher:
American Vacuum SocietyCopyright Statement
Country of Publication:
United States
Language:
English

References (15)

Space-charge limitations to throughput in projection electron-beam lithography (SCALPEL) journal March 1998
Atomic precision patterning on Si: An opportunity for a digitized process journal May 2010
Field-directed sputter sharpening for tailored probe materials and atomic-scale lithography journal January 2012
Tungsten nanotip fabrication by spatially controlled field-assisted reaction with nitrogen journal May 2006
Scanning tunneling microscopy journal January 1987
On the effect of local barrier height in scanning tunneling microscopy: Measurement methods and control implications journal January 2018
Cryogenic UHV-STM Study of Hydrogen and Deuterium Desorption from Si(100) journal February 1998
Quilt Packaging: High-Density, High-Speed Interchip Communications journal November 2007
Scanning Tunneling Microscope Control: A Self-Tuning PI Controller Based on Online Local Barrier Height Estimation* journal September 2019
Atomic precision lithography on Si
  • Randall, J. N.; Lyding, J. W.; Schmucker, S.
  • Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, Vol. 27, Issue 6 https://doi.org/10.1116/1.3237096
journal January 2009
Controlled formation of atomic step morphology on micropatterned Si (100)
  • Li, K.; Pradeep, N.; Chikkamaranahalli, S.
  • Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena, Vol. 29, Issue 4 https://doi.org/10.1116/1.3610955
journal July 2011
Progress and issues in e-beam and other top down nanolithography journal September 2013
Multimode hydrogen depassivation lithography: A method for optimizing atomically precise write times
  • Ballard, Joshua B.; Sisson, Thomas W.; Owen, James H. G.
  • Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena, Vol. 31, Issue 6 https://doi.org/10.1116/1.4823756
journal November 2013
Noble Metal/W(111) Single-Atom Tips and Their Field Electron and Ion Emission Characteristics journal November 2006
Mono-atomic tips for scanning tunneling microscopy journal September 1986

Similar Records

Related Subjects