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Title: Rhenium-Doped and Stabilized MoS 2 Atomic Layers with Basal-Plane Catalytic Activity

Authors:
 [1] ;  [2] ;  [3] ;  [4] ;  [5] ;  [6] ;  [6] ;  [7] ;  [5] ;  [1] ; ORCiD logo [8]
  1. Materials Science and Technology Division, Oak Ridge National Laboratory, Oak Ridge TN 37831 USA
  2. School of Materials Science & Engineering, Beihang University, Beijing 100191 China, Department of Materials Science & NanoEngineering, Rice University, Houston TX 77005 USA
  3. Department of Physics and Astronomy, Vanderbilt University, Nashville TN 37235 USA
  4. Department of Physics and Astronomy, Vanderbilt University, Nashville TN 37235 USA, School of Physical Sciences and CAS Center for Excellence in Topological Quantum Computation, University of Chinese Academy of Sciences, Beijing 100049 China
  5. Department of Materials Science & NanoEngineering, Rice University, Houston TX 77005 USA
  6. National Synchrotron Radiation Laboratory, CAS Center for Excellence in Nanoscience, University of Science and Technology of China, Hefei Anhui 230029 China
  7. Materials Science and Technology Division, Oak Ridge National Laboratory, Oak Ridge TN 37831 USA, Department of Physics and Astronomy, Vanderbilt University, Nashville TN 37235 USA
  8. Materials Science and Technology Division, Oak Ridge National Laboratory, Oak Ridge TN 37831 USA, School of Physical Sciences and CAS Center for Excellence in Topological Quantum Computation, University of Chinese Academy of Sciences, Beijing 100049 China
Publication Date:
Grant/Contract Number:
FG02-09ER46554; AC02-05CH11231
Type:
Publisher's Accepted Manuscript
Journal Name:
Advanced Materials
Additional Journal Information:
Journal Name: Advanced Materials; Journal ID: ISSN 0935-9648
Publisher:
Wiley Blackwell (John Wiley & Sons)
Sponsoring Org:
USDOE
Country of Publication:
Germany
Language:
English
OSTI Identifier:
1479536

Yang, Shi-Ze, Gong, Yongji, Manchanda, Priyanka, Zhang, Yu-Yang, Ye, Gonglan, Chen, Shuangming, Song, Li, Pantelides, Sokrates T., Ajayan, Pulickel M., Chisholm, Matthew F., and Zhou, Wu. Rhenium-Doped and Stabilized MoS 2 Atomic Layers with Basal-Plane Catalytic Activity. Germany: N. p., Web. doi:10.1002/adma.201803477.
Yang, Shi-Ze, Gong, Yongji, Manchanda, Priyanka, Zhang, Yu-Yang, Ye, Gonglan, Chen, Shuangming, Song, Li, Pantelides, Sokrates T., Ajayan, Pulickel M., Chisholm, Matthew F., & Zhou, Wu. Rhenium-Doped and Stabilized MoS 2 Atomic Layers with Basal-Plane Catalytic Activity. Germany. doi:10.1002/adma.201803477.
Yang, Shi-Ze, Gong, Yongji, Manchanda, Priyanka, Zhang, Yu-Yang, Ye, Gonglan, Chen, Shuangming, Song, Li, Pantelides, Sokrates T., Ajayan, Pulickel M., Chisholm, Matthew F., and Zhou, Wu. 2018. "Rhenium-Doped and Stabilized MoS 2 Atomic Layers with Basal-Plane Catalytic Activity". Germany. doi:10.1002/adma.201803477.
@article{osti_1479536,
title = {Rhenium-Doped and Stabilized MoS 2 Atomic Layers with Basal-Plane Catalytic Activity},
author = {Yang, Shi-Ze and Gong, Yongji and Manchanda, Priyanka and Zhang, Yu-Yang and Ye, Gonglan and Chen, Shuangming and Song, Li and Pantelides, Sokrates T. and Ajayan, Pulickel M. and Chisholm, Matthew F. and Zhou, Wu},
abstractNote = {},
doi = {10.1002/adma.201803477},
journal = {Advanced Materials},
number = ,
volume = ,
place = {Germany},
year = {2018},
month = {10}
}

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