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This content will become publicly available on October 19, 2019

Title: Fundamental understanding of chemical processes in extreme ultraviolet resist materials

Authors:
ORCiD logo [1] ;  [1] ; ORCiD logo [1] ; ORCiD logo [1] ; ORCiD logo [2] ;  [2] ;  [2] ;  [3] ;  [2] ; ORCiD logo [2] ;  [2] ;  [4] ;  [5]
  1. Chemical Sciences Division, Lawrence Berkeley National Laboratory, Berkeley, California 94720, USA
  2. Molecular Foundry, Lawrence Berkeley National Laboratory, Berkeley, California 94720, USA
  3. Center for X-Ray Optics, Lawrence Berkeley National Laboratory, Berkeley, California 94720, USA
  4. Columbia Hill Technical Consulting, Fremont, California 94539, USA
  5. IBM Almaden, San Jose, California 95120, USA
Publication Date:
Grant/Contract Number:
AC02-05CH11231
Type:
Publisher's Accepted Manuscript
Journal Name:
Journal of Chemical Physics
Additional Journal Information:
Journal Name: Journal of Chemical Physics Journal Volume: 149 Journal Issue: 15; Journal ID: ISSN 0021-9606
Publisher:
American Institute of Physics
Sponsoring Org:
USDOE
Country of Publication:
United States
Language:
English
OSTI Identifier:
1478273

Kostko, Oleg, Xu, Bo, Ahmed, Musahid, Slaughter, Daniel S., Ogletree, D. Frank, Closser, Kristina D., Prendergast, David G., Naulleau, Patrick, Olynick, Deirdre L., Ashby, Paul D., Liu, Yi, Hinsberg, William D., and Wallraff, Gregory M.. Fundamental understanding of chemical processes in extreme ultraviolet resist materials. United States: N. p., Web. doi:10.1063/1.5046521.
Kostko, Oleg, Xu, Bo, Ahmed, Musahid, Slaughter, Daniel S., Ogletree, D. Frank, Closser, Kristina D., Prendergast, David G., Naulleau, Patrick, Olynick, Deirdre L., Ashby, Paul D., Liu, Yi, Hinsberg, William D., & Wallraff, Gregory M.. Fundamental understanding of chemical processes in extreme ultraviolet resist materials. United States. doi:10.1063/1.5046521.
Kostko, Oleg, Xu, Bo, Ahmed, Musahid, Slaughter, Daniel S., Ogletree, D. Frank, Closser, Kristina D., Prendergast, David G., Naulleau, Patrick, Olynick, Deirdre L., Ashby, Paul D., Liu, Yi, Hinsberg, William D., and Wallraff, Gregory M.. 2018. "Fundamental understanding of chemical processes in extreme ultraviolet resist materials". United States. doi:10.1063/1.5046521.
@article{osti_1478273,
title = {Fundamental understanding of chemical processes in extreme ultraviolet resist materials},
author = {Kostko, Oleg and Xu, Bo and Ahmed, Musahid and Slaughter, Daniel S. and Ogletree, D. Frank and Closser, Kristina D. and Prendergast, David G. and Naulleau, Patrick and Olynick, Deirdre L. and Ashby, Paul D. and Liu, Yi and Hinsberg, William D. and Wallraff, Gregory M.},
abstractNote = {},
doi = {10.1063/1.5046521},
journal = {Journal of Chemical Physics},
number = 15,
volume = 149,
place = {United States},
year = {2018},
month = {10}
}

Works referenced in this record:

X-Ray Interactions: Photoabsorption, Scattering, Transmission, and Reflection at E = 50-30,000 eV, Z = 1-92
journal, July 1993
  • Henke, B. L.; Gullikson, E. M.; Davis, J. C.
  • Atomic Data and Nuclear Data Tables, Vol. 54, Issue 2, p. 181-342
  • DOI: 10.1006/adnd.1993.1013