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Title: The high- k poloidal scattering system for NSTX-U

Authors:
 [1]; ORCiD logo [1];  [2];  [2];  [1];  [2]; ORCiD logo [2];  [2];  [1];  [1];  [1]
  1. Department of Electrical and Computer Engineering, University of California, Davis, California 95616, USA
  2. Princeton Plasma Physics Laboratory, Princeton, New Jersey 08543, USA
Publication Date:
Sponsoring Org.:
USDOE
OSTI Identifier:
1476685
Grant/Contract Number:  
FG02-99ER54518; DEAC02-09CH11466
Resource Type:
Publisher's Accepted Manuscript
Journal Name:
Review of Scientific Instruments
Additional Journal Information:
Journal Name: Review of Scientific Instruments Journal Volume: 89 Journal Issue: 10; Journal ID: ISSN 0034-6748
Publisher:
American Institute of Physics
Country of Publication:
United States
Language:
English

Citation Formats

Barchfeld, R., Domier, C. W., Ren, Y., Ellis, R., Riemenschneider, P., Allen, N., Kaita, R., Stratton, B., Dannenberg, J., Zhu, Y., and Luhmann, Jr., N. C. The high- k poloidal scattering system for NSTX-U. United States: N. p., 2018. Web. doi:10.1063/1.5035410.
Barchfeld, R., Domier, C. W., Ren, Y., Ellis, R., Riemenschneider, P., Allen, N., Kaita, R., Stratton, B., Dannenberg, J., Zhu, Y., & Luhmann, Jr., N. C. The high- k poloidal scattering system for NSTX-U. United States. doi:10.1063/1.5035410.
Barchfeld, R., Domier, C. W., Ren, Y., Ellis, R., Riemenschneider, P., Allen, N., Kaita, R., Stratton, B., Dannenberg, J., Zhu, Y., and Luhmann, Jr., N. C. Mon . "The high- k poloidal scattering system for NSTX-U". United States. doi:10.1063/1.5035410.
@article{osti_1476685,
title = {The high- k poloidal scattering system for NSTX-U},
author = {Barchfeld, R. and Domier, C. W. and Ren, Y. and Ellis, R. and Riemenschneider, P. and Allen, N. and Kaita, R. and Stratton, B. and Dannenberg, J. and Zhu, Y. and Luhmann, Jr., N. C.},
abstractNote = {},
doi = {10.1063/1.5035410},
journal = {Review of Scientific Instruments},
number = 10,
volume = 89,
place = {United States},
year = {2018},
month = {10}
}

Journal Article:
Free Publicly Available Full Text
Publisher's Version of Record
DOI: 10.1063/1.5035410

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