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This content will become publicly available on September 25, 2019

Title: Optimization of electrical treatment strategy for surface roughness reduction in conducting thin films

Authors:
ORCiD logo [1] ; ORCiD logo [1]
  1. Department of Chemical Engineering, University of Massachusetts, Amherst, Massachusetts 01003-9303, USA
Publication Date:
Grant/Contract Number:
FG02-07ER46407
Type:
Publisher's Accepted Manuscript
Journal Name:
Journal of Applied Physics
Additional Journal Information:
Journal Name: Journal of Applied Physics Journal Volume: 124 Journal Issue: 12; Journal ID: ISSN 0021-8979
Publisher:
American Institute of Physics
Sponsoring Org:
USDOE
Country of Publication:
United States
Language:
English
OSTI Identifier:
1473736

Du, Lin, and Maroudas, Dimitrios. Optimization of electrical treatment strategy for surface roughness reduction in conducting thin films. United States: N. p., Web. doi:10.1063/1.5047405.
Du, Lin, & Maroudas, Dimitrios. Optimization of electrical treatment strategy for surface roughness reduction in conducting thin films. United States. doi:10.1063/1.5047405.
Du, Lin, and Maroudas, Dimitrios. 2018. "Optimization of electrical treatment strategy for surface roughness reduction in conducting thin films". United States. doi:10.1063/1.5047405.
@article{osti_1473736,
title = {Optimization of electrical treatment strategy for surface roughness reduction in conducting thin films},
author = {Du, Lin and Maroudas, Dimitrios},
abstractNote = {},
doi = {10.1063/1.5047405},
journal = {Journal of Applied Physics},
number = 12,
volume = 124,
place = {United States},
year = {2018},
month = {9}
}

Works referenced in this record:

Electromigration—A brief survey and some recent results
journal, April 1969

Subwavelength Plasmonic Lasing from a Semiconductor Nanodisk with Silver Nanopan Cavity
journal, September 2010
  • Kwon, Soon-Hong; Kang, Ju-Hyung; Seassal, Christian
  • Nano Letters, Vol. 10, Issue 9, p. 3679-3683
  • DOI: 10.1021/nl1021706